Extended model for the reconstruction of periodic multilayers from extreme ultraviolet and X-ray reflectivity data

Investigation of structural and reflective characteristics of short-period Mo/B4C multilayer X-ray mirrors

The results of a study of the structural and reflective characteristics of short-period multilayer X-ray mirrors based on Mo/B4C at wavelengths 1.54 Å, 9.89 Å and 17.59 Å are presented. The period of the samples varied in the range 8-35 Å. The average widths of the interfaces were ∼3.5 and 2.2 Å at one and the other boundaries, with a tendency for weak growth with any decrease in the period. The interlayer roughness was ∼1 Å. The research results indicate promising prospects for the use of multilayer Mo/B4C mirrors for synchrotron applications.

Experimental and simulation study of self-assembly and adsorption of glycerol monooleate in n-dodecane with varying water content onto iron oxide

The self-assembly and surface adsorption of glycerol monooleate (GMO) in n-dodecane are studied using a combination of experimental and molecular dynamics simulation techniques. The self-assembly of GMO to form reverse micelles, with and without added water, is studied using small-angle neutron scattering and simulations. A large-scale simulation is also used to investigate the self-assembly kinetics. GMO adsorption onto iron oxide is studied using depletion isotherms, neutron reflectometry, and simulations. The adsorbed amounts of GMO, and any added water, are determined experimentally, and the structures of the adsorbed films are investigated using reflectometry. Detailed fitting and analysis of the reflectometry measurements are presented, taking into account various factors such as surface roughness, and the presence of impurities. The reflectometry measurements are complemented by molecular dynamics simulations, and good consistency between both approaches is demonstrated by direct comparison of measured and simulated reflectivity and scattering length density profiles. The results of this analysis are that in dry systems, GMO adsorbs as self-assembled reverse micelles with some molecules adsorbing directly to the surface through the polar head groups, while in wet systems, the GMO is adsorbed onto a thin layer of water. Only at high surface coverage is some water trapped inside a reverse-micelle structure; at lower surface coverages, the GMO molecules associate primarily with the water layer, rather than self-assemble.

Depth-resolved oxidational studies of Be/Al periodic multilayers investigated by X-ray photoelectron spectroscopy

The quantification of surface and subsurface oxidation of Be/Al periodic multilayer mirrors due to exposure in the ambient atmosphere was investigated by depth-resolved X-ray photoelectron spectroscopy. The contribution of oxidation was lower for the thicker layer of Al in the periodic structures since the surface was less chemically reactive for the oxidation. This was investigated by finding the depth-resolved slope of the intensity ratio of metal/oxides (Be/BeO_x and Al/AlO_x) by analyzing the chemical shift of Al 1s and Be 1s photoelectrons. Furthermore, a well-resolved doublet chemical shift in the O 1s spectra indicated the formation of BeO_x/AlO_x and BeOH/AlOH oxides. The investigation showed that the subsurface and surface regions were dominated by metal-hydroxide (BeOH/AlOH) and metal-oxide (BeO_x/AlO_x) bonding, respectively, analyzed by the depth-resolved chemical shifts.

A volume plasmon blueshift in thin silicon films embedded within Be/Si periodic multilayer mirrors

Microstructural properties of the beryllium (Be) and silicon (Si) in periodic multilayer mirrors Be/Si with the variation of film thickness were comprehensively determined by Raman scattering. For the thinner films, the structure of Be evolved in the amorphous phase, and it was transformed into the polycrystalline phase for thicker films. The Si films in the periodic structure were condensed into the amorphous phase. The small fraction of nanocrystalline Si particles was distributed within the amorphous phase. A shake-up satellite peak of Si 2s photoelectrons was observed in X-ray photoelectron spectroscopy which suggested the excitation of a plasmon in Si films embedded within Be/Si periodic multilayers. The energy of plasmons was sensitive to the film thickness of Si in the periods which directly corresponds to the particle size. The binding energy of the satellite peak of Si 2s photoelectrons was blueshifted (higher energy) with a decrease in the particle size. This was explained by size dependent quantum confinement of particles.

Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nm

The results of the investigation of the reflective characteristics of multilayer mirrors based on Ru/Y are presented. Reflection coefficients at the level of 38.5% at an operating wavelength of 9.4 nm. It is shown that the deposition of B₄C barrier layers onto Y layers makes it possible to significantly increase the reflection coefficient compared to structures without barrier layers. A reflectance of 54% was obtained for mirrors optimized for 11.4 nm, which is close to the theoretical limit for these materials.

Intrinsic roughness and interfaces of Cr/Be multilayers

The structures of Cr/Be multilayer mirror interfaces are investigated using X-ray reflectometry, diffuse X-ray scattering and atomic force microscopy. The combination of these methods makes it possible to separate the contributions of roughness and interlayer diffusion/intermixing for each sample. In the range of period thicknesses of 2.26–0.8 nm, it is found that the growth roughness of the Cr/Be multilayer mirrors does not depend on the period thickness and is ∼0.2 nm. The separation of roughness and diffuseness allows estimation of layer material intermixing and the resulting drop in the optical contrast, which is from 0.85 to 0.17 in comparison with an ideally sharp structure.

Phonon, plasmon and electronic properties of surfaces and interfaces of periodic W/Si and Si/W multilayers

The phonon and plasmon excitations and electronic properties of interfaces of periodic W/Si and Si/W multilayer structures were investigated. The Boson band originated from quasilocal surface acoustic phonons for ultrathin Si layers, excited by Raman scattering. In confined Si layers, a small fraction of crystalline Si nanoclusters were embedded within a large volume fraction of amorphous Si (a-Si) nanoclusters. The size of the a-Si nanoclusters was smaller for the thinner Si layer in the periodic layers. The plasmon energy in the Si layer was blueshifted with a decrease in the thickness of this layer. This was explained by the size-dependent quantization of plasmon shift. The valence band spectra comprised a substantial fine structure, which is associated with the interaction of valence orbitals of the W and Si atoms at the interface boundaries. For thinner Si layers, the binding interaction of W5d and Si3p states leads to the splitting of the density of states near the Fermi level in the energy range of 1.5-5 eV. However, the energy splitting with two maxima was observed at 0.7 and 2.4 eV for thicker layers. Thus, the results of X-ray photoelectron spectroscopy have indicated that the interface of W/Si multilayers consists of metal-enriched tungsten silicide. Both the atomic structure and the elemental composition of the silicide were modified with a change in the thickness of the Si layers. This novel investigation could be essential for designing nanomirrors with higher reflectivity.

Multifitting: software for the reflectometric reconstruction of multilayer nanofilms

Multifitting is a computer program designed specifically for modeling the optical properties (reflection, transmission, absorption) of multilayer films consisting of an arbitrary number of layers in a wide range of wavelengths. Multifitting allows a user to calculate the reflectometric curves for a given structure (direct problem) and to find the parameters of the films from the experimentally obtained curves (inverse problem), either manually or automatically. Key features of Multifitting are the ability to work simultaneously with an arbitrary number of experimental curves and an ergonomic graphical user interface that is designed for intensive daily use in the diagnosis of thin films. Multifitting is positioned by the author as the successor to the IMD program, which has become the standard tool in research and technology groups synthesizing and studying thin-film coatings.

Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm

The He-II (λ=30.4  nm) emission line is one of the spectral channels chosen to study solar corona. This Letter reports on investigations of novel beryllium (Be)/magnesium multilayer coatings which, when incorporated beneath a protective bilayer of aluminium and Be, ensure particularly high-reflection coefficients of up to 56%, a spectral width of Δλ=1.6  nm (λ/Δλ≈20), and high temporal stability.

Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography

A comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin B₄C, C and Si interlayers. It was demonstrated that Mo/Be mirrors show maximum reflectance at normal incidence, while maximum structural perfection is shown by Mo/Be/Si mirrors. The introduction of B₄C and C layers into the structure increases the interlayer roughness and reduces the sharpness of the interfaces, adversely affecting the target coating characteristics. Results are presented for studies using four techniques: X-ray reflectometry, small-angle X-ray scattering, atomic force microscopy, and transmission electron microscopy.

High-reflection Mo/Be/Si multilayers for EUV lithography

The effect of Be layers on the reflection coefficients of Mo/Be/Si multilayer mirrors in the extreme ultraviolet (EUV) region is reported. Samples were studied using laboratory and synchrotron based reflectometry, and high-resolution transmission electron microscopy. The samples under study have reflection coefficients above 71% at 13.5 nm and more than 72% at 12.9 nm in a near normal incidence mode. Calculations show that by optimizing the thickness of the Be layer it should be possible to increase the reflection coefficient by another 0.5-1%. These results are of considerable interest for EUV lithography.