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Qiao Y, He Q, Huang HH, Mastropietro D, Jiang Z, Zhou H, Liu Y, Tirrell MV, Chen W. Stretching of immersed polyelectrolyte brushes in shear flow. NANOSCALE 2023; 15:19282-19291. [PMID: 37997161 DOI: 10.1039/d3nr04187e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/25/2023]
Abstract
The way that polymer brushes respond to shear flow has important implications in various applications, including antifouling, corrosion protection, and stimuli-responsive materials. However, there is still much to learn about the behaviours and mechanisms that govern these responses. To address this gap in knowledge, our study uses in situ X-ray reflectivity to investigate how poly(styrene sulfonate) (PSS) brushes stretch and change in different environments, such as isopropanol (a poor solvent), water (a good solvent), and aqueous solutions containing various cations (Cs+, Ba2+, La3+, and Y3+). We have designed a custom apparatus that exposes the PSS brushes to both tangential shear forces from the primary flow and upward drag forces from a secondary flow. Our experimental findings clearly show that shear forces have a significant impact on how the chains in PSS brushes are arranged. At low shear rates, the tangential shear force causes the chains to tilt, leading to brush contraction. In contrast, higher shear rates generate an upward shear force that stretches and expands the chains. By analysing electron density profiles obtained from X-ray reflectivity, we gain valuable insights into how the PSS brushes respond structurally, especially the role of the diffuse layer in this dynamic behaviour. Our results highlight the importance of the initial chain configuration, which is influenced by the solvent and cations present, in shaping how polymer brushes respond to shear flow. The strength of the salt bridge network also plays a crucial role in determining how easily the brushes can stretch, with stronger networks offering more resistance to stretching. Ultimately, our study aims to enhance our understanding of polymer physics at interfaces, with a particular focus on practical applications involving polymer brushes.
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Affiliation(s)
- Yijun Qiao
- Materials Science Division and Centre for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, USA.
- State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China.
| | - Qiming He
- Materials Science Division and Centre for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, USA.
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, 60637, USA
| | - Hsin-Hsiang Huang
- Materials Science Division and Centre for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, USA.
| | - Dean Mastropietro
- Materials Science Division and Centre for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, USA.
| | - Zhang Jiang
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Hua Zhou
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Yuhong Liu
- State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China.
| | - Matthew V Tirrell
- Materials Science Division and Centre for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, USA.
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, 60637, USA
| | - Wei Chen
- Materials Science Division and Centre for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois 60439, USA.
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, 60637, USA
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Jiang Z, Wang J, Tirrell MV, de Pablo JJ, Chen W. Parameter estimation for X-ray scattering analysis with Hamiltonian Markov Chain Monte Carlo. JOURNAL OF SYNCHROTRON RADIATION 2022; 29:721-731. [PMID: 35511005 PMCID: PMC9070694 DOI: 10.1107/s1600577522003034] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 12/03/2021] [Accepted: 03/19/2022] [Indexed: 06/14/2023]
Abstract
Bayesian-inference-based approaches, in particular the random-walk Markov Chain Monte Carlo (MCMC) method, have received much attention recently for X-ray scattering analysis. Hamiltonian MCMC, a state-of-the-art development in the field of MCMC, has become popular in recent years. It utilizes Hamiltonian dynamics for indirect but much more efficient drawings of the model parameters. We described the principle of the Hamiltonian MCMC for inversion problems in X-ray scattering analysis by estimating high-dimensional models for several motivating scenarios in small-angle X-ray scattering, reflectivity, and X-ray fluorescence holography. Hamiltonian MCMC with appropriate preconditioning can deliver superior performance over the random-walk MCMC, and thus can be used as an efficient tool for the statistical analysis of the parameter distributions, as well as model predictions and confidence analysis.
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Affiliation(s)
- Zhang Jiang
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, 9700 South Cass Avenue, Lemont, IL 60439, USA
| | - Jin Wang
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, 9700 South Cass Avenue, Lemont, IL 60439, USA
| | - Matthew V. Tirrell
- Materials Science Division, Argonne National Laboratory, Lemont, IL 60439, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
| | - Juan J. de Pablo
- Materials Science Division, Argonne National Laboratory, Lemont, IL 60439, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
| | - Wei Chen
- Materials Science Division, Argonne National Laboratory, Lemont, IL 60439, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
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De Hoe GX, Mao J, Jiang Z, Darling SB, Tirrell MV, Chen W. Probing Diffuse Polymer Brush Interfaces Using Resonant Soft X-ray Scattering. ACTA ACUST UNITED AC 2020. [DOI: 10.1080/08940886.2020.1784698] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/23/2022]
Affiliation(s)
- Guilhem X. De Hoe
- Advanced Materials for Energy-Water Systems Center and Center for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois, USA
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois, USA
| | - Jun Mao
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois, USA
| | - Zhang Jiang
- Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois, USA
| | - Seth B. Darling
- Advanced Materials for Energy-Water Systems Center and Center for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois, USA
- Chemical Sciences and Engineering Division, Argonne National Laboratory, Lemont, Illinois, USA
| | - Matthew V. Tirrell
- Advanced Materials for Energy-Water Systems Center and Center for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois, USA
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois, USA
| | - Wei Chen
- Advanced Materials for Energy-Water Systems Center and Center for Molecular Engineering, Argonne National Laboratory, Lemont, Illinois, USA
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois, USA
- Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois, USA
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Yu J, Mao J, Nagao M, Bu W, Lin B, Hong K, Jiang Z, Liu Y, Qian S, Tirrell M, Chen W. Structure and dynamics of lipid membranes interacting with antivirulence end-phosphorylated polyethylene glycol block copolymers. SOFT MATTER 2020; 16:983-989. [PMID: 31851201 DOI: 10.1039/c9sm01642b] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
The structure and dynamics of lipid membranes in the presence of extracellular macromolecules are critical for cell membrane functions and many pharmaceutical applications. The pathogen virulence-suppressing end-phosphorylated polyethylene glycol (PEG) triblock copolymer (Pi-ABAPEG) markedly changes the interactions with lipid vesicle membranes and prevents PEG-induced vesicle phase separation in contrast to the unphosphorylated copolymer (ABAPEG). Pi-ABAPEG weakly absorbs on the surface of lipid vesicle membranes and slightly changes the structure of 1,2-dimyristoyl-sn-glycero-3-phosphocholine (DMPC) unilamellar vesicles at 37 °C, as evidenced by small angle neutron scattering. X-ray reflectivity measurements confirm the weak adsorption of Pi-ABAPEG on DMPC monolayer, resulting in a more compact DMPC monolayer structure. Neutron spin-echo results show that the adsorption of Pi-ABAPEG on DMPC vesicle membranes increases the membrane bending modulus κ.
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Affiliation(s)
- Jing Yu
- Centre for Molecular Engineering and Materials Science Division, Argonne National Laboratory, Lemont, IL 60439, USA. and Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA.
| | - Jun Mao
- Centre for Molecular Engineering and Materials Science Division, Argonne National Laboratory, Lemont, IL 60439, USA. and Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA.
| | - Michihiro Nagao
- NIST Centre for Neutron Research, National Institute of Standards and Technology, Gaithersburg, MD 20899-6102, USA and Centre for Exploration of Energy and Matter, Indiana University, Bloomington, IN 47408, USA
| | - Wei Bu
- Centre for Advanced Radiation Sources, University of Chicago, Chicago, IL 60637, USA
| | - Binhua Lin
- Centre for Advanced Radiation Sources, University of Chicago, Chicago, IL 60637, USA and James Franck Institute, University of Chicago, Chicago, IL 60637, USA
| | - Kunlun Hong
- Centre for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
| | - Zhang Jiang
- Advanced Photon Source, Argonne National Laboratory, Lemont, IL 60439, USA
| | - Yun Liu
- NIST Centre for Neutron Research, National Institute of Standards and Technology, Gaithersburg, MD 20899-6102, USA and Department of Chemical and Biomolecular Engineering, Centre for Neutron Science, University of Delaware, Newark, DE 19716, USA
| | - Shuo Qian
- Biology and Soft Matter Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
| | - Matthew Tirrell
- Centre for Molecular Engineering and Materials Science Division, Argonne National Laboratory, Lemont, IL 60439, USA. and Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA.
| | - Wei Chen
- Centre for Molecular Engineering and Materials Science Division, Argonne National Laboratory, Lemont, IL 60439, USA. and Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA.
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Qiao Y, Zhou H, Jiang Z, He Q, Gan S, Wang H, Wen S, de Pablo J, Liu Y, Tirrell MV, Chen W. An in situ shearing x-ray measurement system for exploring structures and dynamics at the solid-liquid interface. THE REVIEW OF SCIENTIFIC INSTRUMENTS 2020; 91:013908. [PMID: 32012592 DOI: 10.1063/1.5129819] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/02/2019] [Accepted: 01/05/2020] [Indexed: 06/10/2023]
Abstract
Revealing interfacial structure and dynamics has been one of the essential thematic topics in material science and condensed matter physics. Synchrotron-based x-ray scattering techniques can deliver unique and insightful probing of interfacial structures and dynamics, in particular, in reflection geometries with higher surface and interfacial sensitivity than transmission geometries. We demonstrate the design and implementation of an in situ shearing x-ray measurement system, equipped with both inline parallel-plate and cone-and-plate shearing setups and operated at the advanced photon source at Argonne National Laboratory, to investigate the structures and dynamics of end-tethered polymers at the solid-liquid interface. With a precise lifting motor, a micrometer-scale gap can be produced by aligning two surfaces of a rotating upper shaft and a lower sample substrate. A torsional shear flow forms in the gap and applies tangential shear forces on the sample surface. The technical combination with nanoscale rheology and the utilization of in situ x-ray scattering allow us to gain fundamental insights into the complex dynamics in soft interfaces under shearing. In this work, we demonstrate the technical scope and experimental capability of the in situ shearing x-ray system through the measurements of charged polymers at both flat and curved interfaces upon shearing. Through the in situ shearing x-ray scattering experiments integrated with theoretical simulations, we aim to develop a detailed understanding of the short-range molecular structure and mesoscale ionic aggregate morphology, as well as ion transport and dynamics in soft interfaces, thereby providing fundamental insight into a long-standing challenge in ionic polymer brushes with a significant technological impact.
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Affiliation(s)
- Yijun Qiao
- State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China
| | - Hua Zhou
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Zhang Jiang
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Qiming He
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Shenglong Gan
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Hongdong Wang
- State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China
| | - Shizhu Wen
- State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China
| | - Juan de Pablo
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Yuhong Liu
- State Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China
| | - Matthew V Tirrell
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA
| | - Wei Chen
- Materials Science Division, Argonne National Laboratory, Lemont, Illinois 60439, USA
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He Q, Qiao Y, Mandia DJ, Gan S, Zhang H, Zhou H, Elam JW, Darling SB, Tirrell MV, Chen W. Enrichment and Distribution of Pb 2+ Ions in Zwitterionic Poly(cysteine methacrylate) Brushes at the Solid-Liquid Interface. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2019; 35:17082-17089. [PMID: 31790593 DOI: 10.1021/acs.langmuir.9b02770] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Cysteine-based polyzwitterionic brushes have been prepared via a two-step route. First, poly(allyl methacrylate) (PAMA) brushes have been grown from the surface of silicon substrates using surface-initiated atom transfer radical polymerization. The obtained PAMA brushes with free pendant vinyl groups were further modified via radical thiol-ene addition reaction to attach l-cysteine moieties. Surface ζ potential investigations on pH-responsiveness of these poly(cysteine methacrylate) (PCysMA) brushes confirm their zwitterionic character at intermediate pH range, while at pH values either below pH 3.50 or above pH 8.59, they exhibit polyelectrolyte character. Under acid (pH < 3.50) or base (pH > 8.59) conditions, they possess either cationic or anionic character, respectively. In the zwitterionic region, these PCysMA brushes show positive surface ζ potential in the presence of Pb(CH3COO)2 solutions of various concentrations. The results are in line with microscopic investigations using anomalous X-ray reflectivity (AXRR) carried out along the absorption edge of Pb2+ ions. When the photon energies were varied around the absorption L3 edge of lead (13037 eV), the Pb2+ concentration normal to the silicon substrates, as a function of depth inside PCysMA brushes, could be revealed at the nanoscale. Both ζ potential and AXRR measurements confirm the enrichment of Pb2+ ions inside PCysMA brushes, indicating the potential of PCysMA to be used as a water purification material.
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Affiliation(s)
- Qiming He
- Advanced Materials for Energy-Water Systems Center , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Center for Molecular Engineering and Materials Science Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Pritzker School of Molecular Engineering , University of Chicago , 5640 S Ellis Ave , Chicago , Illinois 60637 , United States
| | - Yijun Qiao
- Advanced Materials for Energy-Water Systems Center , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Center for Molecular Engineering and Materials Science Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
| | - David J Mandia
- Applied Materials Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Chemical Sciences and Engineering Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
| | - Shenglong Gan
- Center for Molecular Engineering and Materials Science Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
| | - Huiru Zhang
- Advanced Materials for Energy-Water Systems Center , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Chemical Sciences and Engineering Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
| | - Hua Zhou
- Advanced Photon Source , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
| | - Jeffrey W Elam
- Advanced Materials for Energy-Water Systems Center , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Applied Materials Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
| | - Seth B Darling
- Advanced Materials for Energy-Water Systems Center , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Center for Molecular Engineering and Materials Science Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Pritzker School of Molecular Engineering , University of Chicago , 5640 S Ellis Ave , Chicago , Illinois 60637 , United States
- Chemical Sciences and Engineering Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
| | - Matthew V Tirrell
- Advanced Materials for Energy-Water Systems Center , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Center for Molecular Engineering and Materials Science Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Pritzker School of Molecular Engineering , University of Chicago , 5640 S Ellis Ave , Chicago , Illinois 60637 , United States
| | - Wei Chen
- Advanced Materials for Energy-Water Systems Center , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Center for Molecular Engineering and Materials Science Division , Argonne National Laboratory , 9700 S Cass Ave , Lemont , Illinois 60439 , United States
- Pritzker School of Molecular Engineering , University of Chicago , 5640 S Ellis Ave , Chicago , Illinois 60637 , United States
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