Efficient high-order suppression system for a metrology beamline

Synchrotron radiation transmission by two coupled flat microchannel plates: new opportunities to control the focal spot characteristics

An improved theoretical model to calculate the focal spot properties of coherent synchrotron radiation (SR) soft X-ray beams by combining and aligning two microchannel plates (MCPs) is presented. The diffraction patterns of the radiation behind the MCP system are simulated in the framework of the electrodynamical model of the radiation emission from two-dimensional finite antenna arrays. Simulations show that this particular optical device focuses the soft X-ray radiation in a circular central spot with a radius of ∼4 µm. The study points out that such MCP-based devices may achieve micrometre and sub-micrometre spot sizes as required by many applications in the soft X-ray range. Finally, based on experimental and theoretical results of the radiation transmission by this MCP-based device, a new method to characterize the spatial properties of brilliant SR sources is discussed.

Wave propagation and focusing of soft X-rays by spherical bent microchannel plates

Synchrotron radiation sources have been used to study the focusing properties and angular distribution of X-ray radiation at the exit of spherically bent microchannel plates (MCPs). In this contribution it is shown how soft X-ray radiation at energies up to 1.5 keV can be focused by spherically bent MCPs with curvature radii R of 30 mm and 50 mm. For these devices, a focus spot is detectable at a distance between the detector and the MCP of less than R/2, with a maximum focusing efficiency up to 23% of the flux illuminating the MCP. The soft X-ray radiation collected at the exit of microchannels of spherically bent MCPs are analyzed in the framework of a wave approximation. A theoretical model for the wave propagation of radiation through MCPs has been successfully introduced to explain the experimental results. Experimental data and simulations of propagating radiation represent a clear confirmation of the wave channeling phenomenon for the radiation in spherically bent MCPs.

Investigation of boron carbide and iridium thin films, an enabling technology for future x-ray telescopes

We present an experimental examination of iridium and boron carbide thin-film coatings for the purpose of fabricating x-ray optics. We use a combination of x-ray reflectometry and x-ray photoelectron spectroscopy to model the structure, composition, density, thickness, and micro-roughness of the thin films. We demonstrate in our analyses how the two characterization techniques are complementary, and from this we derive that an overlayer originating from atmospheric contamination with a thickness between 1.0-1.6 nm is present on the surface. The magnetron sputtered iridium films are measured to have a density of 22.4g/cm³. The boron carbide film exhibits a change in chemical composition in the top ∼2nm of the film surface when exposed to the ambient atmosphere. The chemical reaction occurring on the surface is due to an incorporation of oxygen and hydrogen present in the ambient atmosphere. Lastly, we present a correlation between the absorption edges and the emission lines exhibited by the thin films in an energy range from 50-800 eV and the impact on the reflectivity performance due to contamination in thin films.

A high-efficiency and high-spectral-resolution EUV/soft X-ray monochromator based on off-plane diffraction

The most efficient diffraction at a periodic grating structure is expected to take place when the incident radiation can be considered to have been specularly reflected off the inclined part of grooves that are positioned parallel to the trajectory of the incident beam. Very encouraging results for this configuration, in which the diffraction takes place off-plane, have been reported recently for a grating to be used in a spectrometer for space science investigations. This grating provided high efficiency for a relatively large groove density and a large blaze angle. High efficiency was observed even in higher diffraction orders up to the fourth order. Here the performance parameters, especially for the combination of diffraction efficiency and achievable spectral resolution, will be discussed for a grating used in a grazing-incidence plane-grating monochromator for monochromatization of synchrotron radiation in the extreme ultraviolet (EUV) and soft X-ray range with photon energies between 30 eV and 2000 eV. It is found that the instrument can provide competitive spectral resolution in comparison with the use of in-plane diffraction. In the case of comparable spectral resolution, the off-plane diffraction is found to provide superior efficiency.

Single-channel method for measuring the reflectance spectra of grazing incidence mirrors in the extreme ultraviolet range

This Letter presents a one-channel method of measurements of a grazing incidence reflection coefficient. The idea is to use the quasi-flat field extreme ultraviolet spectrometer to produce direct and reflected from the sample images of the spectral lines simultaneously at the same detector matrix. The analysis of a set of spectral lines in the working spectral range of the spectrometer gives the spectral dependence of the reflection coefficient. The results of the refection coefficient measurements for a plane ruthenium mirror for grazing angles of 6° and 10° in the spectral range 15-40 nm are presented.

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Blazed gratings are of dedicated interest for the monochromatization of synchrotron radiation when a high photon flux is required, such as, for example, in resonant inelastic X-ray scattering experiments or when the use of laminar gratings is excluded due to too high flux densities and expected damage, for example at free-electron laser beamlines. Their availability became a bottleneck since the decommissioning of the grating manufacture facility at Carl Zeiss in Oberkochen. To resolve this situation a new technological laboratory was established at the Helmholtz Zentrum Berlin, including instrumentation from Carl Zeiss. Besides the upgraded ZEISS equipment, an advanced grating production line has been developed, including a new ultra-precise ruling machine, ion etching technology as well as laser interference lithography. While the old ZEISS ruling machine GTM-6 allows ruling for a grating length up to 170 mm, the new GTM-24 will have the capacity for 600 mm (24 inch) gratings with groove densities between 50 lines mm-1 and 1200 lines mm-1. A new ion etching machine with a scanning radiofrequency excited ion beam (HF) source allows gratings to be etched into substrates of up to 500 mm length. For a final at-wavelength characterization, a new reflectometer at a new Optics beamline at the BESSY-II storage ring is under operation. This paper reports on the status of the grating fabrication, the measured quality of fabricated items by ex situ and in situ metrology, and future development goals.