Nemec V, Cinčić D. The Halogen Bonding Proclivity of the sp
3 Sulfur Atom as a Halogen Bond Acceptor in Cocrystals of Tetrahydro-4
H-thiopyran-4-one and Its Derivatives.
CRYSTAL GROWTH & DESIGN 2022;
22:5796-5801. [PMID:
36248237 PMCID:
PMC9553023 DOI:
10.1021/acs.cgd.2c00793]
[Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/15/2022] [Revised: 09/04/2022] [Indexed: 06/16/2023]
Abstract
In this work, we present a systematic study of the capability of the sp3 hybridized sulfur atom for halogen bonding both in a small building block, tetrahydro-4H-thiopyran-4-one, and two larger ones derived from it, Schiff bases with a morpholine fragment on the other end of the molecule. These three building blocks were cocrystallized with six perhalogenated aromates: 1,4-diiodotetrafluorobenzene, 1,3,5-triiodotrifluorobenzene, 1,3-diiodotetrafluorobenzene, 1,2-diiodotetrafluorobenzene, iodopentafluorobenzene, and 1,4-dibromotetrafluorobenzene. Out of the 18 combinations, only 7 (39%) yielded cocrystals, although with a high occurrence of the targeted I···S halogen bonding motif in all cocrystals (71%), and in imine cocrystals the I···Omorpholine motif (100%) as well as, surprisingly, the I···Nimine motif (100%). The I···S halogen bonds presented in this work feature lower relative shortening values than those for other types of sulfur atoms; however, the sp3 sulfur atom could potentially be more specific an acceptor for halogen bonding.
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