Quality Factor Measurements of Various Types of Quartz Crystal Resonators Operating Near 4 K

Micro/Nanostructure Engineering of Epitaxial Piezoelectric α-Quartz Thin Films on Silicon

The monolithic integration of sub-micron quartz structures on silicon substrates is a key issue for the future development of piezoelectric devices as prospective sensors with applications based on the operation in the high-frequency range. However, to date, it has not been possible to make existing quartz manufacturing methods compatible with integration on silicon and structuration by top-down lithographic techniques. Here, we report an unprecedented large-scale fabrication of ordered arrays of piezoelectric epitaxial quartz nanostructures on silicon substrates by the combination of soft-chemistry and three lithographic techniques: (i) laser interference lithography, (ii) soft nanoimprint lithography on Sr-doped SiO₂ sol-gel thin films, and (iii) self-assembled SrCO₃ nanoparticle reactive nanomasks. Epitaxial α-quartz nanopillars with different diameters (from 1 μm down to 50 nm) and heights (up to 2 μm) were obtained. This work demonstrates the complementarity of soft-chemistry and top-down lithographic techniques for the patterning of epitaxial quartz thin films on silicon while preserving its epitaxial crystallinity and piezoelectric properties. These results open up the opportunity to develop a cost-effective on-chip integration of nanostructured piezoelectric α-quartz MEMS with enhanced sensing properties of relevance in different fields of application.

Design and Fabrication of Capacitive Silicon Nanomechanical Resonators with Selective Vibration of a High-Order Mode

This paper reports the design and fabrication of capacitive silicon nanomechanical resonators with the selective vibration of a high-order mode. Fixed-fixed beam capacitive silicon resonators have been successfully produced by the use of electron beam lithography, photolithography, deep reactive ion etching, and anodic bonding methods. All resonators with different vibration modes are designed to have the same resonant frequency for performance comparison. Measurement results show that higher-order mode capacitive silicon resonators can achieve lower insertion loss compared to that of lower-order mode capacitive silicon resonators. The motional resistance of the fourth mode vibration resonator is improved by 83%, 90%, and 93% over the third, second, and first mode vibration resonators, respectively.

A new method of probing mechanical losses of coatings at cryogenic temperatures

A new method of probing mechanical losses and comparing the corresponding deposition processes of metallic and dielectric coatings in 1-100 MHz frequency range and cryogenic temperatures is presented. The method is based on the use of high-quality quartz acoustic cavities whose internal losses are orders of magnitude lower than any available coating nowadays. The approach is demonstrated for chromium, chromium/gold, and multilayer tantala/silica coatings. The Ta₂O₅/SiO₂ coating has been found to exhibit a loss angle lower than 1.6 × 10^-5 near 30 MHz at 4 K. The results are compared to the previous measurements.