Electrochemical Nanolithography on Silicon: An Easy and Scalable Method to Control Pore Formation at the Nanoscale

Lithography on a sub-100 nm scale is beyond the diffraction limits of standard optical lithography but is nonetheless a key step in many modern technological applications. At this length scale, there are several possible approaches that require either the preliminary surface deposition of materials or the use of expensive and time-consuming techniques. In our approach, we demonstrate a simple process, easily scalable to large surfaces, where the surface patterning that controls pore formation on highly doped silicon wafers is obtained by an electrochemical process. This method joins the advantages of the low cost of an electrochemical approach with its immediate scalability to large wafers.

Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography

Thermoplastic polymer micro- and nanostructures suffer pattern decay when heated to a temperature close to or above the polymer’s glass transition temperature. In this work, we report enhanced thermal stability of polycarbonate nanostructures at temperatures well above their glass transition temperatures. Based on this observation, we develop a unique technique for high-resolution polymer patterning by polymer reflows. This technique is characterized as the precise control of polymer reflows regardless of the annealing time, which avoids the time-domain nonlinear reflow of the polymer melt. We also implement thermal nanoimprinting in a step-and-repeat fashion, which dramatically increases the throughput of the thermal nanoimprint. The enhanced pattern stability against thermal reflow also allows for multiple imprinting at the same location to generate complex resist patterns from a simple mold structure. Since modern lithography often uses thin resist films (sub-100 nm) due to the restraint from the pattern aspect ratio, the unusual annealing behavior of thin polymer films is highly relevant in sub-100 nm lithographic processing.

Development of an automatic approaching system for electrochemical nanofabrication using visual and force-displacement sensing

In this paper, a fast automatic precision approaching system is developed for electrochemical nanofabrication using visual and force-displacement sensing. Before the substrate is fabricated, the template should approach the substrate accurately to establish the initial gap between the template and substrate. During the approaching process, the template is first quickly moved towards the substrate by the stepping motor until a specified gap is detected by the visual feedback. Then, the successive approach using the switch of macro-micro motion with a force-displacement sensing module is triggered to make the template contact with the substrate to nanometre accuracy. The contact force is measured by the force-displacement sensing module which employs the high-resolution capacitive displacement sensor and flexure compliant mechanism. The high sensitivity of this capacitive displacement sensor ensures high accuracy of the template-substrate contact. The experimental results show that the template can reach the substrate accurately and smoothly, which verifies the effectiveness of the proposed approaching system with the visual and the force-displacement sensing modules.

Nanoimprint lithography using vertically aligned carbon nanostructures as stamps

Nanoimprint lithography using vertically aligned carbon nanostructures as stamps is reported. The functionality of the stamp is demonstrated through lift-off and etch-back processes after pattern replication. The imprint process is robust and the stamp structures survived more than 50 consecutive imprints. In this paper we demonstrate this for feature sizes ranging from 80 nm to 200 microm where the aspect ratio of the individual nanostructures surpasses 1:5 with a pitch down to 100 nm. This demonstration opens up the possibility of utilizing vertically grown carbon nanostructures for manufacturing extremely high aspect ratio and small pitch stamps for nanoimprint lithography.