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Liddle JA, Hoskins BD, Vladár AE, Villarrubia JS. Electron beam-based metrology after CMOS. APL MATERIALS 2018; 6:10.1063/1.5038249. [PMID: 30984475 PMCID: PMC6459207 DOI: 10.1063/1.5038249] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Abstract
The magnitudes of the challenges facing electron-based metrology for post-CMOS technology are reviewed. Directed selfassembly, nanophotonics/plasmonics, and resistive switches and selectors, are examined as exemplars of important post-CMOS technologies. Materials, devices, and architectures emerging from these technologies pose new metrology requirements: defect detection, possibly subsurface, in soft materials, accurate measurement of size, shape, and roughness of structures for nanophotonic devices, contamination-free measurement of surface-sensitive structures, and identification of subtle structural, chemical, or electronic changes of state associated with switching in non-volatile memory elements. Electron-beam techniques are examined in the light of these emerging requirements. The strong electron-matter interaction provides measurable signal from small sample features, rendering electron-beam methods more suitable than most for nanometer-scale metrology, but as is to be expected, solutions to many of the measurement challenges are yet to be demonstrated. The seeds of possible solutions are identified when they are available.
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Affiliation(s)
- J A Liddle
- National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA
| | - B D Hoskins
- National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA
| | - A E Vladár
- National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA
| | - J S Villarrubia
- National Institute of Standards and Technology, Gaithersburg, Maryland, 20899, USA
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Khaira G, Doxastakis M, Bowen A, Ren J, Suh HS, Segal-Peretz T, Chen X, Zhou C, Hannon AF, Ferrier NJ, Vishwanath V, Sunday DF, Gronheid R, Kline RJ, de Pablo JJ, Nealey PF. Derivation of Multiple Covarying Material and Process Parameters Using Physics-Based Modeling of X-ray Data. Macromolecules 2017. [DOI: 10.1021/acs.macromol.7b00691] [Citation(s) in RCA: 20] [Impact Index Per Article: 2.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/29/2023]
Affiliation(s)
- Gurdaman Khaira
- Mentor: A Siemens Business, Wilsonville, Oregon 97070, United States
| | - Manolis Doxastakis
- Department
of Chemical and Biomolecular Engineering, University of Tennessee, Knoxville, Tennessee 37996, United States
| | - Alec Bowen
- Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States
| | - Jiaxing Ren
- Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States
| | - Hyo Seon Suh
- Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States
| | - Tamar Segal-Peretz
- Department
of Chemical Engineering, Technion - Israel Institute of Technology, Haifa 32000, Israel
| | - Xuanxuan Chen
- Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States
| | - Chun Zhou
- Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States
| | - Adam F. Hannon
- Material
Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | | | | | - Daniel F. Sunday
- Material
Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | | | - R. Joseph Kline
- Material
Science and Engineering Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States
| | - Juan J. de Pablo
- Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States
- Argonne National Laboratory, Argonne, Illinois 60439, United States
| | - Paul F. Nealey
- Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States
- Argonne National Laboratory, Argonne, Illinois 60439, United States
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Segal-Peretz T, Ren J, Xiong S, Khaira G, Bowen A, Ocola LE, Divan R, Doxastakis M, Ferrier NJ, de Pablo J, Nealey PF. Quantitative Three-Dimensional Characterization of Block Copolymer Directed Self-Assembly on Combined Chemical and Topographical Prepatterned Templates. ACS NANO 2017; 11:1307-1319. [PMID: 28005329 DOI: 10.1021/acsnano.6b05657] [Citation(s) in RCA: 29] [Impact Index Per Article: 4.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Abstract
Characterization of the three-dimensional (3D) structure in directed self-assembly (DSA) of block copolymers is crucial for understanding the complex relationships between the guiding template and the resulting polymer structure so DSA could be successfully implemented for advanced lithography applications. Here, we combined scanning transmission electron microscopy (STEM) tomography and coarse-grain simulations to probe the 3D structure of P2VP-b-PS-b-P2VP assembled on prepatterned templates using solvent vapor annealing. The templates consisted of nonpreferential background and raised guiding stripes that had PS-preferential top surfaces and P2VP-preferential sidewalls. The full 3D characterization allowed us to quantify the shape of the polymer domains and the interface between domains as a function of depth in the film and template geometry and offered important insights that were not accessible with 2D metrology. Sidewall guiding was advantageous in promoting the alignment and lowering the roughness of the P2VP domains over the sidewalls, but incommensurate confinement from the increased topography could cause roughness and intermittent dislocations in domains over the background region at the bottom of the film. The 3D characterization of bridge structures between domains over the background and breaks within domains on guiding lines sheds light on possible origins of common DSA defects. The positional fluctuations of the PS/P2VP interface between domains showed a depth-dependent behavior, with high levels of fluctuations near both the free surface of the film and the substrate and lower fluctuation levels in the middle of the film. This research demonstrates how 3D characterization offers a better understanding of DSA processes, leading to better design and fabrication of directing templates.
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Affiliation(s)
- Tamar Segal-Peretz
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
- Department of Chemical Engineering, Technion - Institute of Technology , Haifa 3200003, Israel
| | - Jiaxing Ren
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Shisheng Xiong
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Gurdaman Khaira
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Alec Bowen
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | | | | | - Manolis Doxastakis
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Nicola J Ferrier
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Juan de Pablo
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
| | - Paul F Nealey
- Institute for Molecular Engineering, University of Chicago , 5640 South Ellis Avenue, Chicago, Illinois 60637, United States
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Segal-Peretz T, Zhou C, Ren J, Dazai T, Ocola LE, Divan RNS, Nealey PF. Three Dimensional Assembly in Directed Self-assembly of Block Copolymers. J PHOTOPOLYM SCI TEC 2016. [DOI: 10.2494/photopolymer.29.653] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Tamar Segal-Peretz
- Institute for Molecular Engineering, University of Chicago
- Materials Science Division, Argonne National Laboratory
| | - Chun Zhou
- Institute for Molecular Engineering, University of Chicago
| | - Jiaxing Ren
- Institute for Molecular Engineering, University of Chicago
| | | | | | | | - Paul F. Nealey
- Institute for Molecular Engineering, University of Chicago
- Materials Science Division, Argonne National Laboratory
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