Far-UVC Photolysis of Peroxydisulfate for Micropollutant Degradation in Water

Increasing radical yields to reduce UV fluence requirement for achieving targeted removal of micropollutants in water would make UV-based advanced oxidation processes (AOPs) less energy demanding in the context of United Nations' Sustainable Development Goals and carbon neutrality. We herein demonstrate that, by switching the UV radiation source from conventional low-pressure UV at 254 nm (UV254) to emerging Far-UVC at 222 nm (UV222), the fluence-based concentration of HO• in the UV/peroxydisulfate (UV/PDS) AOP increases by 6.40, 2.89, and 6.00 times in deionized water, tap water, and surface water, respectively, with increases in the fluence-based concentration of SO4•- also by 5.06, 5.81, and 55.47 times, respectively. The enhancement to radical generation is confirmed using a kinetic model. The pseudo-first-order degradation rate constants of 16 micropollutants by the UV222/PDS AOP in surface water are predicted to be 1.94-13.71 times higher than those by the UV254/PDS AOP. Among the tested water matrix components, chloride and nitrate decrease SO4•- but increase HO• concentration in the UV222/PDS AOP. Compared to the UV254/PDS AOP, the UV222/PDS AOP decreases the formation potentials of carbonaceous disinfection byproducts (DBPs) but increases the formation potentials of nitrogenous DBPs.

Enhanced Direct Photolysis of Organic Micropollutants by Far-UVC Light at 222 nm from KrCl* Excilamps

Krypton chloride (KrCl*) excilamps emitting at far-UVC 222 nm represent a promising technology for microbial disinfection and advanced oxidation of organic micropollutants (OMPs) in water treatment. However, direct photolysis rates and photochemical properties at 222 nm are largely unknown for common OMPs. In this study, we evaluated photolysis for 46 OMPs by a KrCl* excilamp and compared it with a low-pressure mercury UV lamp. Generally, OMP photolysis was greatly enhanced at 222 nm with fluence rate-normalized rate constants of 0.2-21.6 cm²·μEinstein^-1, regardless of whether they feature higher or lower absorbance at 222 nm than at 254 nm. The photolysis rate constants and quantum yields were 10-100 and 1.1-47 times higher, respectively, than those at 254 nm for most OMPs. The enhanced photolysis at 222 nm was mainly caused by strong light absorbance for non-nitrogenous, aniline-like, and triazine OMPs, while notably higher quantum yield (4-47 times of that at 254 nm) occurred for nitrogenous OMPs. At 222 nm, humic acid can inhibit OMP photolysis by light screening and potentially by quenching intermediates, while nitrate/nitrite may contribute more than others to screen light. Overall, KrCl* excilamps are promising in achieving effective OMP photolysis and merit further research.