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Number Cited by Other Article(s)
1
A nanoporous ruthenium oxide framework for amperometric sensing of glucose and potentiometric sensing of pH. Mikrochim Acta 2012. [DOI: 10.1007/s00604-012-0774-9] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/14/2022]
2
Ruthenium electrodeposition on silicon from a room-temperature ionic liquid. Electrochim Acta 2009. [DOI: 10.1016/j.electacta.2009.01.012] [Citation(s) in RCA: 30] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/22/2022]
3
Bjelkevig C, Kelber J. Stability of iodine on ruthenium during copper electrodeposition and its effects on the nucleation behavior of electrodeposited copper. Electrochim Acta 2009. [DOI: 10.1016/j.electacta.2009.02.008] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
4
Barrios Eguiluz KI, Salazar-Banda GR, Funes-Huacca ME, Alberice JV, Carrilho E, Spinola Machado SA, Avaca LA. Sequence-specific electrochemical detection of Alicyclobacillus acidoterrestrisDNA using electroconductive polymer-modified fluorine tin oxide electrodes. Analyst 2009;134:314-9. [DOI: 10.1039/b809080g] [Citation(s) in RCA: 18] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
5
Thambidurai C, Kim YG, Stickney JL. Electrodeposition of Ru by atomic layer deposition (ALD). Electrochim Acta 2008. [DOI: 10.1016/j.electacta.2008.01.003] [Citation(s) in RCA: 58] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
6
Burke LD, Naser NS, Sharna R. The oxide electrochemistry of ruthenium and its relevance to trench liner applications in damascene copper plating. J APPL ELECTROCHEM 2007. [DOI: 10.1007/s10800-007-9449-3] [Citation(s) in RCA: 10] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/22/2022]
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