Skorb EV, Grützmacher D, Dais C, Guzenko VA, Sokolov VG, Gaevskaya TV, Sviridov DV. Titania-assisted electron-beam and synchrotron lithography.
NANOTECHNOLOGY 2010;
21:315301. [PMID:
20634573 DOI:
10.1088/0957-4484/21/31/315301]
[Citation(s) in RCA: 2] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm.
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