Rapid In-Plane Pattern Growth for Large-Area Inverse Replication Through Electrohydrodynamic Instability of Polymer Films

Nanopatterning driven by electrohydrodynamic (EHD) instability can aid in the resolution of the drawbacks inherent in conventional imprinting or other molding methods. This is because EHD force negates the requirement of physical contact and is easily tuned. However, its potential has not examined owing to the limited size of the pattern replica (several to tens of micrometers). Thus, this study proposes a new route for large-area patterning through high-speed evolution of EHD-driven pattern growth along the in-plane axis. Through the acceleration of the in-plane growth, while selectively controlling a specific edge growth, the pattern replica area can be extended from the micro- to centimeter scale with high fidelity. Moreover, even in the case of nonuniform contact mode, the proposed rapid in-plane growth mode facilitates uniform large-scale replication, which is not possible in conventional imprinting or other molding methods.

Metal-Halide Perovskite Lasers: Cavity Formation and Emission Characteristics

Hybrid metal-halide perovskites (MHPs) have shown remarkable optoelectronic properties as well as facile and cost-effective processability. With the success of MHP solar cells and light-emitting diodes, MHPs have also exhibited great potential as gain media for on-chip lasers. However, to date, stable operation of optically pumped MHP lasers and electrically driven MHP lasers-an essential requirement for MHP laser's insertion into chip-scale photonic integrated circuits-is not yet demonstrated. The main obstacles include the instability of MHPs in the atmosphere, rudimentary MHP laser cavity patterning methods, and insufficient understanding of emission mechanisms in MHP materials and cavities. This review aims to provide a detailed overview of different strategies to improve the intrinsic properties of MHPs in the atmosphere and to establish an optimal MHP cavity patterning method. In addition, this review discusses different emission mechanisms in MHP materials and cavities and how to distinguish them.

Photochemically Activated 3D Printing Inks: Current Status, Challenges, and Opportunities

3D printing with light is enabled by the photochemistry underpinning it. Without fine control over the ability to photochemically gate covalent bond formation by the light at a certain wavelength and intensity, advanced photoresists with functions spanning from on-demand degradability, adaptability, rapid printing speeds, and tailored functionality are impossible to design. Herein, recent advances in photoresist design for light-driven 3D printing applications are critically assessed, and an outlook of the outstanding challenges and opportunities is provided. This is achieved by classing the discussed photoresists in chemistries that function photoinitiator-free and those that require a photoinitiator to proceed. Such a taxonomy is based on the efficiency with which photons are able to generate covalent bonds, with each concept featuring distinct advantages and drawbacks.

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Nano-fabrication techniques have demonstrated their vital importance in technological innovation. However, low-throughput, high-cost and intrinsic resolution limits pose significant restrictions, it is, therefore, paramount to continue improving existing methods as well as developing new techniques to overcome these challenges. This is particularly applicable within the area of biomedical research, which focuses on sensing, increasingly at the point-of-care, as a way to improve patient outcomes. Within this context, this review focuses on the latest advances in the main emerging patterning methods including the two-photon, stereo, electrohydrodynamic, near-field electrospinning-assisted, magneto, magnetorheological drawing, nanoimprint, capillary force, nanosphere, edge, nano transfer printing and block copolymer lithographic technologies for micro- and nanofabrication. Emerging methods enabling structural and chemical nano fabrication are categorised along with prospective chemical and physical patterning techniques. Established lithographic techniques are briefly outlined and the novel lithographic technologies are compared to these, summarising the specific advantages and shortfalls alongside the current lateral resolution limits and the amenability to mass production, evaluated in terms of process scalability and cost. Particular attention is drawn to the potential breakthrough application areas, predominantly within biomedical studies, laying the platform for the tangible paths towards the adoption of alternative developing lithographic technologies or their combination with the established patterning techniques, which depends on the needs of the end-user including, for instance, tolerance of inherent limits, fidelity and reproducibility.

Fabrication of Nanogroove Arrays on Acrylic Film Using Micro-Embossing Technique

The fabrication of nanostructures is of great importance in producing biomedical devices. Significantly, the nanostructure of the polymeric film has a significant impact on the physical and biophysical behavior of the biomolecules. This study presents an efficient nanofabrication method of nanogroove structures on an acrylic film by the micro-embossing process. In this method, a master mold was made from a thermos oxide silicon substrate using photolithography and etching techniques. An isotropic optical polymethyl methacrylate (PMMA) film is used in the experiment. The acrylic film is known for its excellent optical properties in products such as optical lenses, medical devices, and various general purpose engineering plastics. Then, the micro-embossing process was realized to fabricate nanogroove patterns on an acrylic film by using a micro-embossing machine. However, the morphology of the nanopatterns on an acrylic film was characterized by using an atomic force microscope to measure the dimensions of the nanogroove patterns. The impact of embossing temperature on the morphology of nanogroove patterns on acrylic film is experimentally investigated. The results show that when the embossing temperature is too small, the pattern is not fully formed, and slipping occurs in nanopatterns on the acrylic film. On the other hand, the effect of increasing the embossing temperature on the morphology of nanogrooves agrees with the master mold, and the crests between the nanogrooves form straight edges. It should be noted that the micro-embossing temperature also strongly influences the transferability of nanopatterns on an acrylic film. The technique has great potential for rapidly fabricating nanostructure patterns on acrylic film.

Directional Amplified Photoluminescence through Large-Area Perovskite-Based Metasurfaces

Perovskite nanocrystals are high-performance, solution-processed materials with a high photoluminescence quantum yield. Due to these exceptional properties, perovskites can serve as building blocks for metasurfaces and are of broad interest for photonic applications. Here, we use a simple grating configuration to direct and amplify the perovskite nanocrystals' original omnidirectional emission. Thus far, controlling these radiation properties was only possible over small areas and at a high expense, including the risks of material degradation. Using a soft lithographic printing process, we can now reliably structure perovskite nanocrystals from the organic solution into light-emitting metasurfaces with high contrast on a large area. We demonstrate the 13-fold amplified directional radiation with an angle-resolved Fourier spectroscopy, which is the highest observed amplification factor for the perovskite-based metasurfaces. Our self-assembly process allows for scalable fabrication of gratings with predefined periodicities and tunable optical properties. We further show the influence of solution concentration on structural geometry. By increasing the perovskite concentration 10-fold, we can produce waveguide structures with a grating coupler in one printing process. We analyze our approach with numerical modeling, considering the physiochemical properties to obtain the desired geometry. This strategy makes the tunable radiative properties of such perovskite-based metasurfaces usable for nonlinear light-emitting devices and directional light sources.

Optical Fiber Grating-Prism Fabrication by Imprint Patterning of Ionic-Liquid-Based Resist

We present a method of microstructure fabrication on the tip of the optical fiber using a UV soft-imprint process of polymerizable ionic liquid-based optical resist. Ionic liquid with two UV-sensitive vinylbenzyl groups in the structure was diluted in non-hazardous propylene glycol (PG) to obtain liquid material for imprinting. No additional organic solvent was required. The impact of propylene glycol amount and exposure dose on optical and mechanical properties was investigated. The final procedure of the UV imprint on the optical fiber tip was developed, including the mold preparation, setup building, UV exposure and post-laser cure. As the IL-containing vinylbenzyl groups can also be polymerized by the radical rearrangement of double bonds through thermal heating, the influence of the addition of 1-2% BHT polymerization inhibitor was verified. As a result, we present the fabricated diffraction gratings and the optical fiber spectrometer component-grism (grating-prism), which allows obtaining a dispersion spectrum at the output of an optical in line with the optical fiber long axis, as the main component in an optical fiber spectrometer. The process is very simple due to the fact that its optimization already starts in the process of molecule design, which is part of the trend of sustainable technologies. The final material can be designed by the tailoring of the anion and/or cation molecule, which in turn can lead to a more efficient fabrication procedure and additional functionalities of the final structure.

Sub-5 nm Anisotropic Pattern Transfer via Colloidal Lithography of a Self-Assembled GdF3 Nanocrystal Monolayer

Patterning materials with nanoscale features opens many research opportunities ranging from fundamental science to technological applications. However, current nanofabrication methods are ill-suited for sub-5 nm patterning and pattern transfer. We demonstrate the use of colloidal lithography to transfer an anisotropic pattern of discrete features into substrates with a critical dimension below 5 nm. The assembly of monodisperse, anisotropic nanocrystals (NCs) with a rhombic-plate morphology spaced by dendrimer ligands results in a well-ordered monolayer that serves as a 2D anisotropic hard mask pattern. This pattern is transferred into the underlying substrate using dry etching followed by removal of the NC mask. We exemplify this approach by fabricating an array of pillars with a rhombic cross-section and edge-to-edge spacing of 4.4 ± 1.1 nm. The fabrication approach enables broader access to patterning materials at the deep nanoscale by implementing innovative processes into well-established fabrication methods while minimizing process complexity.

Wafer-Scale LSPR Substrate: Oblique Deposition of Gold on a Patterned Sapphire Substrate

Label-free detection of biomolecules using localized surface plasmon resonance (LSPR) substrates is a highly attractive method for point-of-care (POC) testing. One of the remaining challenges to developing LSPR-based POC devices is to fabricate the LSPR substrates with large-scale, reproducible, and high-throughput. Herein, a fabrication strategy for wafer-scale LSPR substrates is demonstrated using reproducible, high-throughput techniques, such as nanoimprint lithography, wet-etching, and thin film deposition. A transparent sapphire wafer, on which SiO₂-nanodot hard masks were formed via nanoimprint lithography, was anisotropically etched by a mixed solution of H₂SO₄ and H₃PO₄, resulting in a patterned sapphire substrate (PSS). An LSPR substrate was finally fabricated by oblique deposition of Au onto the PSS, which was then applied to label-free detection of the binding events of biomolecules. To the best of our knowledge, this paper is the first report on the application of the PSS used as an LSPR template by obliquely depositing a metal.

Enhancement of Bacterial Anti−Adhesion Properties on Robust PDMS Micro−Structure Using a Simple Flame Treatment Method

Biofilm-associated infections caused by an accumulation of micro-organisms and pathogens significantly impact the environment, health risks, and the global economy. Currently, a non-biocide-releasing superhydrophobic surface is a potential solution for antibacterial purposes. This research demonstrated a well-designed robust polydimethylsiloxane (PDMS) micro-structure and a flame treatment process with improved hydrophobicity and bacterial anti-adhesion properties. After the flame treatment at 700 ± 20 °C for 15 s, unique flower-petal re-entrant nano-structures were formed on pillars (PIL-F, width: 1.87 ± 0.30 μm, height: 7.76 ± 0.13 μm, aspect ratio (A.R.): 4.14) and circular rings with eight stripe supporters (C-RESS-F, width: 0.50 ± 0.04 μm, height: 3.55 ± 0.11 μm, A.R.: 7.10) PDMS micro-patterns. The water contact angle (WCA) and ethylene glycol contact angle (EGCA) of flame-treated flat-PDMS (FLT-F), PIL–F, and C–RESS-F patterns were (133.9 ± 3.8°, 128.6 ± 5.3°), (156.1 ± 1.5°, 151.5 ± 2.1°), and (146.3 ± 3.5°, 150.7 ± 1.8°), respectively. The Escherichia coli adhesion on the C-RESS-F micro-pattern with hydrophobicity and superoleophobicity was 42.6%, 31.8%, and 2.9% less than FLT-F, PIL-F, and Teflon surfaces. Therefore, the flame-treated C-RESS-F pattern is one of the promising bacterial anti-adhesion micro-structures in practical utilization for various applications.

Constrained shrinking of nanoimprinted pre-stressed polymer films to achieve programmable, high-resolution, miniaturized nanopatterns

Nanoimprint lithography is an emerging technology to form patterns and features in the nanoscale. Production of nanoscale patterns is challenging particularly in the sub-50 nm range. Pre-stressed polymer films with embedded microscale pattern can be miniaturized by shrinking induced due to thermal stress release. However, when pre-stressed films are thermally nanoimprinted with sub-micron features and shruken, they lose all the topographical features due to material recovery. Here we report a new approach that prevents recovery and allows retention of shrunken patterns even at the scale of <50 nm. We have discovered that when the shrinking process is mechanically constrained in one direction, the thermal treatment only relieves the stress in the orthogonal direction leading to a uniaxial shrinkage in that direction while preserving the topographical features. A second step, with the constraint in the orthogonal direction leads to biaxial shrinkage and preservation of all of the topographical features. This new technique can produce well defined and high resolution nanostructures at dimensions below 50 nm. The process is programmable and the thermal treatment can be tuned to shrink features to various dimension below the original imprint which we use to produce tunable and gradient plasmonic structures.

The Interfacial Structure and Adhesion Mechanism of N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane and Epoxy Modified Silicone Tie-Coating to Epoxy Primer

The matching application of silicone antifouling coating and epoxy primer is a major problem in engineering. Novel epoxy-modified silicone tie-coating was prepared to tie epoxy primer and silicone antifouling coating. Firstly, N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane was mechanically mixed with bisphenol A epoxy resin to form silylated epoxy resin, then the silylated epoxy resin was uniformly mixed with hydroxy-terminated polydimethylsiloxane and a curing agent and catalyst for coating. An infrared spectrometer, differential scanning calorimeter and tensile tests were used to investigate the chemical structure, phase transition temperature and mechanical properties of the tie-coatings. The interlaminar adhesion of the matching coating system was tested and analyzed by a peel-off test and a shear test. Fracture morphology was observed by scanning using an electron microscope. The results showed that crosslinking density of the tie-coating, the elastic modulus and the tensile strength of the coating increased with an increasing epoxy content, but fracture elongation decreased. The shear strength of the matching coating system is 0.37 MPa, and it shows a good tie performance. The maximum anti-peeling rate of the tie-coating on the epoxy primer reaches 100%.

Recent advances in techniques for fabrication and characterization of nanogap biosensors: A review

Nanogap biosensors have fascinated researchers due to their excellent electrical properties. Nanogap biosensors comprise three arrays of electrodes that form nanometer-size gaps. The sensing gaps have become the major building blocks of several sensing applications, including bio- and chemosensors. One of the advantages of nanogap biosensors is that they can be fabricated in nanoscale size for various downstream applications. Several studies have been conducted on nanogap biosensors, and nanogap biosensors exhibit potential material properties. The possibilities of combining these unique properties with a nanoscale-gapped device and electrical detection systems allow excellent and potential prospects in biomolecular detection. However, their fabrication is challenging as the gap is becoming smaller. It includes high-cost, low-yield, and surface phenomena to move a step closer to the routine fabrications. This review summarizes different feasible techniques in the fabrication of nanogap electrodes, such as preparation by self-assembly with both conventional and nonconventional approaches. This review also presents a comprehensive analysis of the fabrication, potential applications, history, and the current status of nanogap biosensors with a special focus on nanogap-mediated bio- and chemical sonsors.

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.

Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography

Bio-inspired surfaces with superamphiphobic properties are well known as effective candidates for antifouling technology. However, the limitation of large-area mastering, patterning and pattern collapsing upon physical contact are the bottleneck for practical utilization in marine and medical applications. In this study, a roll-to-plate nanoimprint lithography (R2P NIL) process using Morphotonics’ automated Portis NIL600 tool was used to replicate high aspect ratio (5.0) micro-structures via reusable intermediate flexible stamps that were fabricated from silicon master molds. Two types of Morphotonics’ in-house UV-curable resins were used to replicate a micro-pillar (PIL) and circular rings with eight stripe supporters (C-RESS) micro-structure onto polycarbonate (PC) and polyethylene terephthalate (PET) foil substrates. The pattern quality and surface wettability was compared to a conventional polydimethylsiloxane (PDMS) soft lithography process. It was found that the heights of the R2P NIL replicated PIL and C-RESS patterns deviated less than 6% and 5% from the pattern design, respectively. Moreover, the surface wettability of the imprinted PIL and C-RESS patterns was found to be superhydro- and oleophobic and hydro- and oleophobic, respectively, with good robustness for the C-RESS micro-structure. Therefore, the R2P NIL process is expected to be a promising method to fabricate robust C-RESS micro-structures for large-scale anti-biofouling application.

Atomistic Investigation of Material Deformation Behavior of Polystyrene in Nanoimprint Lithography

This research investigates deformation behavior of polystyrene (PS) as a thermoplastic resist material for the thermal nanoimprint lithography (T-NIL) process. Molecular dynamics modeling was conducted on a PS substrate with dimensions 58 × 65 × 61 Å that was imprinted with a rigid, spherical indenter. The effect of indenter size, force, and imprinting duration were evaluated in terms of indentation depth, penetration depth, recovery depth, and recovery percentage of the polymer. The results show that the largest indenter, regardless of force, has the most significant impact on deformation behavior. The 40 Å indenter with a 1 µN of force caused the surface molecules to descend to the lowest point compared to the other indenters. An increase in indenter size resulted in higher penetration depth, recovery depth, and recovery percentage. Higher durations of imprint cycle (400 fs) resulted in plastic deformation of the PS material with minimal recovery (4 Å). The results of this research lay the foundation for explaining the effect of several T-NIL process parameters on virgin PS thermoplastic resist material.

Recent Progress in Simple and Cost-Effective Top-Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography

The development of a simple and cost-effective method for fabricating ≈10 nm scale nanopatterns over large areas is an important issue, owing to the performance enhancement such patterning brings to various applications including sensors, semiconductors, and flexible transparent electrodes. Although nanoimprinting, extreme ultraviolet, electron beams, and scanning probe litho-graphy are candidates for developing such nanopatterns, they are limited to complicated procedures with low throughput and high startup cost, which are difficult to use in various academic and industry fields. Recently, several easy and cost-effective lithographic approaches have been reported to produce ≈10 nm scale patterns without defects over large areas. This includes a method of reducing the size using the narrow edge of a pattern, which has been attracting attention for the past several decades. More recently, secondary sputtering lithography using an ion-bombardment technique was reported as a new method to create high-resolution and high-aspect-ratio structures. Recent progress in simple and cost-effective top-down lithography for ≈10 nm scale nanopatterns via edge and secondary sputtering techniques is reviewed. The principles, technical advances, and applications are demonstrated. Finally, the future direction of edge and secondary sputtering lithography research toward issues to be resolved to broaden applications is discussed.

Low-cost, durable master molds for thermal-NIL, UV-NIL, and injection molding

Mold cost and mold lifetime are essential concerns for mass production of micro/nano-patterned surfaces by nanoimprint lithography or micro/nanoinjection molding. Master molds are typically produced by subtractive processing using wafer-based clean room techniques. For imprint lithography, polymer copies of such molds can often be employed, but the durability of such molds is quite limited. The conditions of high temperature and pressure for injection molding require use of the durable masters created in stainless steel, nickel or other robust materials, but such approaches are challenged by the high cost of patterning these substrates and limited lifetime. Here, we report the fabrication of durable crystalline zirconium dioxide (ZrO₂) masters via a simple direct imprint technique. ZrO₂ nanoparticles (NPs) were formulated into an ink and imprinted on a variety of substrates using a solvent-assisted patterning technique and subsequently annealed to increase the mechanical durability of the mold. The hardness and modulus values of the ZrO₂ coatings reached 11 ± 2 GPa and 120 ± 10 GPa, respectively after annealing. The hard ZrO₂ mold was then employed for precision patterning of polymer surfaces by thermal and UV nanoimprinting lithography (NIL) techniques, and by injection molding. High fidelity pattern transfer continued throughout 115 000 injection molding cycles, there was no evidence of delamination, breakage or wear in the ZrO₂ mold. Our simple imprint patterning technique using ZrO₂ NPs inks enable us to fabricate robust molds with excellent thermal and mechanical properties as easily as imprinting simple polymer replicas. This simple and low-cost approach to mold preparation can enable a large variety of high throughput or large area nano-replication technologies.

Fabrication of Flexible Polymer Molds for Polymer Microstructuring by Roll-to-Roll Hot Embossing

Roll-to-roll hot embossing could revolutionize the manufacturing of multifunctional polymer films with the ability to process large area at a high rate with reduced cost. The continuous hot embossing of the films, however, has been hindered due to the lack of durable and flexible molds, which can replicate micro and nanofeatures with reliability over several embossing cycles. In this work, we demonstrate for the first time the fabrication of a flexible polymer (polyimide) mold from the commercially available sheet by a maskless photolithography approach combined with inductively coupled plasma etching and its potential application to the roll-to-roll hot embossing process. The flexible polyimide mold consisted of holes with controlled dimensions: diameter: 14 μm, spacing: 16.5 μm, and depth: 6.8 μm. The reliability of flexible polyimide mold was tested and implemented by embossing micron-sized features on a commercial thermoplastic polymer, polyamide, and thermoplastic elastomer (TPE) sheet. The polyimide mold replicated micron-sized features on polymer substrates (polyamide and TPE) with excellent fidelity and was durable even after numerous embossing cycles.

Replication of a Tissue Microenvironment by Thermal Scanning Probe Lithography

Thermal scanning probe lithography (t-SPL) is a nanofabrication technique in which an immobilized thermolabile resist, such as polyphthalaldehyde (PPA), is locally vaporized by a heated atomic force microscope tip. Compared with other nanofabrication techniques, such as soft lithography and nanoimprinting lithography, t-SPL is more efficient and convenient as it does not involve time-consuming mask productions or complicated etching procedures, making it a promising candidate technique for the fast prototyping of nanoscale topographies for biological studies. Here, we established the direct use of PPA-coated surfaces as a cell culture substrate. We showed that PPA is biocompatible and that the deposition of allylamine by plasma polymerization on a silicon wafer before PPA coating can stabilize the immobilization of PPA in aqueous solutions. When seeded on PPA-coated surfaces, human mesenchymal stem cells (MSC) adhered, spread, and proliferated in a manner indistinguishable from cells cultured on glass surfaces. This allowed us to subsequently use t-SPL to generate nanotopographies for cell culture experiments. As a proof of concept, we analyzed the surface topography of bovine tendon sections, previously shown to induce morphogenesis and differentiation of MSC, by means of atomic force microscopy, and then "wrote" topographical data on PPA by means of t-SPL. The resulting substrate, matching the native tissue topography on the nanoscale, was directly used for MSC culture. The t-SPL substrate induced similar changes in cell morphology and focal adhesion formation in the MSC compared to native tendon sections, suggesting that t-SPL can rapidly generate cell culture substrates with complex and spatially accurate topographical signals. This technique may greatly accelerate the prototyping of models for the study of cell-matrix interactions.

Perfluoropolyether (PFPE) Intermediate Molds for High-Resolution Thermal Nanoimprint Lithography

Among soft lithography techniques, Thermal Nanoimprint Lithography (NIL) is a high-throughput and low-cost process that can be applied to a broad range of thermoplastic materials. By simply applying the appropriate pressure and temperature combination, it is possible to transfer a pattern from a mold surface to the chosen material. Usually, high-resolution and large-area NIL molds are difficult to fabricate and expensive. Furthermore, they are typically made of silicon or other hard materials such as nickel or quartz for preserving their functionality. Nonetheless, after a large number of imprinting cycles, they undergo degradation and become unusable. In this paper, we introduce and characterize an innovative two-step NIL process based on the use of a perfluoropolyether (PFPE) intermediate mold to replicate sub-100 nm features from a silicon mold to the final thermoplastic material. We compare PFPE elastomeric molds with molds made of the standard polydimethylsiloxane (PDMS) elastomer, which demonstrates better resolution and fidelity of the replica process. By using PFPE intermediate molds, the nanostructured masters are preserved and the throughput of the process is significantly enhanced.

Evaluation of replicas manufactured in a 3D-printed nanoimprint unit

Nanoimprint lithography has become a useful tool to prepare elements containing nanoscale features at quite reasonable cost, especially if the fabrication elements are created in the own laboratory. We have designed and fabricated a whole nanoimprint manufacturing system and analyzed the resulting surfaces using ad hoc packages developed on an open-software AFM image analysis suite. To complete the work, a number of polymers have been thoroughly studied in order to select the best material for this implementation. It turned out that the best alternative was not always the same, but depended on the application. A comparative study of the polymers, which takes into account the values and dispersion of numerous sample parameters, has been carried out. As a large number of samples was prepared, an automatized procedure for characterization of nanoimprint surfaces had to be set up. The procedure includes figures of merit for comparative purposes. Materials without the requirement of a solvent were found to be superior for most nanoimprint applications. A large dispersion of the samples was found.

Duplex-imprinted nano well arrays for promising nanoparticle assembly

A large area nano-duplex-imprint technique is presented in this contribution using natural cicada wings as stamps. The glassy wings of the cicada, which are abundant in nature, exhibit strikingly interesting nanopillar structures over their membrane. This technique, with excellent performance despite the nonplanar surface of the wings, combines both top-down and bottom-up nanofabrication techniques. It transitions micro-nanofabrication from a cleanroom environment to the bench. Two different materials, dicing tape with an acrylic layer and a UV optical adhesive, are used to make replications at the same time, thus achieving duplex imprinting. The promise of a large volume of commercial manufacturing of these nanostructure elements can be envisaged through this contribution to speeding up the fabrication process and achieving a higher throughput. The contact angle of the replicated nanowell arrays before and after oxygen plasma was measured. Gold nanoparticles (50 nm) were used to test how the nanoparticles behaved on the untreated and plasma-treated replica surface. The experiments show that promising nanoparticle self-assembly can be obtained.