Tan X, Dong X, Zhang F, Huang C, Zhang Y. Structure engineering of nickel silicate/carbon composite with boosted electrochemical performances for hybrid supercapacitors.
J Colloid Interface Sci 2024;
674:67-78. [PMID:
38909595 DOI:
10.1016/j.jcis.2024.06.142]
[Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/02/2024] [Revised: 06/17/2024] [Accepted: 06/19/2024] [Indexed: 06/25/2024]
Abstract
In the wake of the carbon-neutral era, the exploration of innovative materials for energy storage and conversion has garnered increasing attention. While nickel silicates have been a focal point in energy storage research, their application in supercapacitors (SCs) has been relatively underreported due to poor conductivity. A newly designed architecture, designated as rGO@NiSiO@NiO/C (abbreviated for reduced graphene oxide (rGO), nickel silicate (NiSiO), nickel oxide/carbon (NiO/C)), has been developed to enhance the electrochemical performance of NiSiO. The incorporation of inner rGO provides structural support for NiSiO, enhancing conductivity, while the outer NiO/C layer not only boosts conductivity but also safeguards NiSiO from structural degradation and electrolyte dissolution. This architecture eliminates multi-phase mixtures, facilitating rapid electron/mass transfer kinetics and accelerating electrochemical reactions, resulting in exceptional electrochemical properties. The rGO@NiSiO@NiO/C architecture achieves a specific capacitance of 324F·g-1 at 0.5 A·g-1, with a superb cycle performance of ∼ 91 % after 10,000 cycles, surpassing state-of-the-art nickel silicates. Furthermore, the hybrid supercapacitor (HSC) device incorporating the rGO@NiSiO@NiO/C electrode attains an areal capacitance of 159 mF·cm-2 at 2.5 mA·cm-2, a retention ratio of ∼ 98 % after 10,000 cycles, and an energy density of 0.68 Wh·m-2 (26.7 Wh·kg-1) at 3.4 W·m-2 (343.8 W·kg-1). This study presents a layer-by-layer approach for constructing transition metal silicates/C architectures to enhance their electrochemical performance.
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