Aftab S, Khan MF, Gautam P, Noh H, Eom J. MoTe
2 van der Waals homojunction p-n diode with low resistance metal contacts.
NANOSCALE 2019;
11:9518-9525. [PMID:
31049514 DOI:
10.1039/c8nr10526j]
[Citation(s) in RCA: 8] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Although many studies have focused on transition metal dichalcogenide heterojunction p-n diodes, homojunction p-n diodes still require more extensive study. We present a van der Waals p-MoTe2/n-MoTe2 homojunction p-n diode with low resistance metal contacts. Such two-dimensional homojunction devices with low contact resistance can be used in various applications in the electronics industry. The device structure consists of stacked nanoflakes of p-MoTe2 and n-MoTe2. In this investigation, we implement a deep ultraviolet light-driven doping technique in a N2 gas environment to modulate the carrier concentration in a multilayered p-MoTe2 flake, which is consequently inverted to n-MoTe2. The deep ultraviolet light-driven doping provides environmental stability in the treated devices. We use ohmic metal contacts for the homojunction p-n diode and achieve excellent gate-dependent rectifying behavior with a rectification ratio of up to 104. Contrary to heterojunctions, the ideality factor is found to be 1.05 for the zero gate bias, indicative of good interface quality at the p-MoTe2/n-MoTe2 junction, owing to low charge trapping sites at the homojunction interface. In addition, low-temperature measurements are performed to determine the barrier height for different gate biases. This study contributes to research on van der Waals homojunction p-n diodes, which show much potential for nanoelectronic and optoelectronic devices.
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