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Number Cited by Other Article(s)
1
Hamaguchi H, Wada M, Yasuda H, Kawaguchi K, Ueda J, Kuriyama K. High Resolution Patterning of Functional Inks using Wettability and Repellency Control Method and Its Application to Electronic Devices. J PHOTOPOLYM SCI TEC 2020. [DOI: 10.2494/photopolymer.33.381] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
2
Igari T, Imamura K, Yasumura K, Iwasa T, Sakakibara K, Yamaguchi K. Synthesis of Photodegradable Surface Modifiers Based on Phosphonic Acid for Introducing Functional Groups onto a Substrate and Application for Patterned Deposition of Gold Nano-Particulate Ink. BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN 2019. [DOI: 10.1246/bcsj.20180391] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/02/2023]
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