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Wang J, Chen F, Pan M, Xu S, Lv R, Liu J, Li Y, Fang S, Chen Y, Zhu J, Zhang D, Qian T, Yun C, Zhao K, Ding H, Wei Z. High-flux wavelength tunable XUV source in the 12-40.8 eV photon energy range with adjustable energy and time resolution for Tr-ARPES applications. OPTICS EXPRESS 2023; 31:9854-9871. [PMID: 37157547 DOI: 10.1364/oe.484088] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/10/2023]
Abstract
High-order harmonic generation (HHG) has a broad spectrum covering vacuum ultraviolet to extreme ultraviolet (XUV) bands, which is useful for applications involving material analyses at different information depths. Such an HHG light source is perfect for time- and angle-resolved photoemission spectroscopy. Here, we demonstrate a high-photon flux HHG source driven by a two-color field. Applying a fused silica compression stage to reduce the driving pulse width, we obtained a high XUV photon flux of 2 × 1012 phs/s @21.6 eV on target. We designed a classical diffraction mounted (CDM) grating monochromator that can achieve a wide range of photon energy from 12 to 40.8 eV, while the time resolution is improved by reducing the pulse front tilt after the harmonic selection. We designed a spatial filtering method to adjust the time resolution using the CDM monochromator and significantly reduced the pulse front tilt of the XUV pulses. We also demonstrate a detailed prediction of the energy resolution broadening which is caused by the space charge effect.
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Developing a Simple Scanning Probe System for Soft X-ray Spectroscopy with a Nano-focusing Mirror. E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY 2023. [DOI: 10.1380/ejssnt.2023-020] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/20/2023]
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Chen Z, Wang X, Mills JP, Du C, Kim J, Wen J, Wu YA. Two-dimensional materials for electrochemical CO 2 reduction: materials, in situ/ operando characterizations, and perspective. NANOSCALE 2021; 13:19712-19739. [PMID: 34817491 DOI: 10.1039/d1nr06196h] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Electrochemical CO2 reduction (CO2 ECR) is an efficient approach to achieving eco-friendly energy generation and environmental sustainability. This approach is capable of lowering the CO2 greenhouse gas concentration in the atmosphere while producing various valuable fuels and products. For catalytic CO2 ECR, two-dimensional (2D) materials stand as promising catalyst candidates due to their superior electrical conductivity, abundant dangling bonds, and tremendous amounts of surface active sites. On the other hand, the investigations on fundamental reaction mechanisms in CO2 ECR are highly demanded but usually require advanced in situ and operando multimodal characterizations. This review summarizes recent advances in the development, engineering, and structure-activity relationships of 2D materials for CO2 ECR. Furthermore, we overview state-of-the-art in situ and operando characterization techniques, which are used to investigate the catalytic reaction mechanisms with the spatial resolution from the micron-scale to the atomic scale, and with the temporal resolution from femtoseconds to seconds. Finally, we conclude this review by outlining challenges and opportunities for future development in this field.
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Affiliation(s)
- Zuolong Chen
- Department of Mechanical and Mechatronics Engineering, Waterloo Institute for Nanotechnology, Materials Interface Foundry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
| | - Xiyang Wang
- Department of Mechanical and Mechatronics Engineering, Waterloo Institute for Nanotechnology, Materials Interface Foundry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
| | - Joel P Mills
- Department of Mechanical and Mechatronics Engineering, Waterloo Institute for Nanotechnology, Materials Interface Foundry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
| | - Cheng Du
- Department of Mechanical and Mechatronics Engineering, Waterloo Institute for Nanotechnology, Materials Interface Foundry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
| | - Jintae Kim
- Department of Mechanical and Mechatronics Engineering, Waterloo Institute for Nanotechnology, Materials Interface Foundry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
| | - John Wen
- Department of Mechanical and Mechatronics Engineering, Waterloo Institute for Nanotechnology, Materials Interface Foundry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
| | - Yimin A Wu
- Department of Mechanical and Mechatronics Engineering, Waterloo Institute for Nanotechnology, Materials Interface Foundry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
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