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For: Yoshikawa A, Oya Y, Miyauchi H, Nakahata T, Nishikawa Y, Suda T, Igarashi E, Oyaidzu M, Tokitani M, Iwakiri H, Yoshida N, Okuno K. Helium Implantation Effects on Retention Behavior of Hydrogen Isotopes in Oxygen-Contained Boron Films. Fusion Science and Technology 2017. [DOI: 10.13182/fst07-a1602] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
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