Nonoptical characterization of optical coatings

Mixed films of TiO(2)-SiO(2) deposited by double electron-beam coevaporation

<p>We used double electron-beam coevaporation to fabricate TiO(2)-SiO(2) mixed films. The deposition process included oxygen partial pressure, substrate temperature, and deposition rate, all of which were real-time computer controlled. The optical properties of the mixed films varied from pure SiO(2) to pure TiO(2) as the composition of the films varied accordingly. X-ray diffraction showed that the mixed films all have amorphous structure with a SiO(2) content of as low as 11%. Atomic force microscopy showed that the mixed film has a smoother surface than pure TiO(2) film because of its amorphous structure.</p><p>Linear and Bruggeman's effective medium approximation models fit the experimental data better than other models.</p>

TiO(2)-SiO(2) mixed films prepared by the fast alternating sputter method

We introduced the fast alternating sputter method and its application on deposition of TiO(2)-SiO(2) mixed films. By using fast alternating sputter, the TiO(2) and SiO(2) were completely mixed in the film, and no thinpair structure could be found by x-ray diffraction. The structure of the mixed films was amorphous in a wide composition range. The optical properties of the mixed films in the visible and near infrared changed from SiO(2)-dominant to TiO(2)-dominant as TiO(2) content in the film increased.