Design and Fabrication of a Hybrid Diffractive Optical Device for Multiple-Line Generation over a Wide Angle

Fabrication of hybrid optical line generator by direct machining

In this study, a mold of a line generator consisting of a cylindrical lens array with a triangular diffractive grating was ultra-precision diamond machined with Moore 350FG 5-axis ultra-precision machine. The design and the simulation of the hybrid structure were performed using ray tracing and exact electromagnetic theory. The machined hybrid lens structure was replicated to a UV-curable polymer and was then characterized and tested. The optical measurements show that the hybrid element works as designed.

Image quality enhancement and computation acceleration of 3D holographic display using a symmetrical 3D GS algorithm

The 3D Gerchberg-Saxton (GS) algorithm can be used to compute a computer-generated hologram (CGH) to produce a 3D holographic display. But, using the 3D GS method, there exists a serious distortion in reconstructions of binary input images. We have eliminated the distortion and improved the image quality of the reconstructions by a maximum of 486%, using a symmetrical 3D GS algorithm that is developed based on a traditional 3D GS algorithm. In addition, the hologram computation speed has been accelerated by 9.28 times, which is significant for real-time holographic displays.

Diffractive phase-shift lithography photomask operating in proximity printing mode

A phase shift proximity printing lithographic mask is designed, manufactured and tested. Its design is based on a Fresnel computer-generated hologram, employing the scalar diffraction theory. The obtained amplitude and phase distributions were mapped into discrete levels. In addition, a coding scheme using sub-cells structure was employed in order to increase the number of discrete levels, thus increasing the degree of freedom in the resulting mask. The mask is fabricated on a fused silica substrate and an amorphous hydrogenated carbon (a:C-H) thin film which act as amplitude modulation agent. The lithographic image is projected onto a resist coated silicon wafer, placed at a distance of 50 microm behind the mask. The results show a improvement of the achieved resolution--linewidth as good as 1.5 microm--what is impossible to obtain with traditional binary masks in proximity printing mode. Such achieved dimensions can be used in the fabrication of MEMS and MOEMS devices. These results are obtained with a UV laser but also with a small arc lamp light source exploring the partial coherence of this source.

Silicone microlenses and interference gratings

Interference gratings, plano-convex microlenses, and spherical microlenses have been made in silicone. Lenses were fabricated by the melting method. Two substrates have been tried: glass and Teflon. The latter substrate lets us fabricate low-f-number lenses. We made spherical microlenses by placing pieces of silicone near a thermal source and studied resolution of the lenses by investigating the images they gave of a test chart. We made low-spatial-frequency gratings by recording interference patterns and studied parameters involved in the recording. A study of the profile of the gratings and lenses was done with a mechanical surface analyzer.