Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio

Mirrors for Space Telescopes: Degradation Issues

Mirrors are a subset of optical components essential for the success of current and future space missions. Most of the telescopes for space programs ranging from earth observation to astrophysics and covering the whole electromagnetic spectrum from x-rays to far-infrared are based on reflective optics. Mirrors operate in diverse and harsh environments that range from low-earth orbit to interplanetary orbits and deep space. The operational life of space observatories spans from minutes (sounding rockets) to decades (large observatories), and the performance of the mirrors within the mission lifetime is susceptible to degrading, resulting in a drop in the instrument throughput, which in turn affects the scientific return. Therefore, the knowledge of potential degradation mechanisms, how they affect mirror performance, and how to prevent them is of paramount importance to ensure the long-term success of space telescopes. In this review, we report an overview of current mirror technology for space missions with a focus on the importance of the degradation and radiation resistance of coating materials. Special attention is given to degradation effects on mirrors for far and extreme UV, as in these ranges the degradation is enhanced by the strong absorption of most contaminants.

Y2O3 optical constants between 5 nm and 50 nm

We report optical constants of e-beam evaporated yttrium oxide Y2O3 thin films as determined from angle-dependent reflectance measurements at wavelengths from 5 to 50 nm. Samples were measured using synchrotron radiation at the Advanced Light Source. The experimental reflectance data were fit to obtain values for the index of refraction and thin film roughness. We compare our computed constants with those of previous researchers and those computed using the independent atom approximation from the CXRO website. We found that the index of refraction near 36 nm is much lower than previous data from Tomiki as reported by Palik. The real part of the optical constants is about 10% to 15% below CXRO values for wavelengths between 17 nm and 30 nm. Films were also characterized chemically, structurally, and optically by ellipsometry and atomic force microscopy.

EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development

The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.

In situ reflectance and optical constants of ion-beam-sputtered SiC films in the 58.4 to 149.2 nm region

The reflectance of freshly deposited SiC thin films is measured in situ for what we believe is the first time. SiC was deposited by means of ion-beam sputtering. Reflectance was measured as a function of the incidence angle in the far and extreme ultraviolet wavelengths from 58.4 to 149.2 nm. In situ measurements allowed obtaining the intrinsic reflectance of SiC films, which is somewhat larger than what had been measured for samples exposed to the atmosphere. Reflectance measurements were used to determine the optical constants of the material in the same spectral range. We compare our data to those of the literature corresponding to SiC films deposited by different techniques and exposed to the atmosphere. In situ determined optical constants will allow a more accurate design of multilayers containing ion-beam-sputtered SiC layers.

Polarization-ratio reflectance measurements in the extreme ultraviolet

We demonstrate a technique for determining optical constants of materials in the extreme UV from the ratio of p-polarized to s-polarized reflectance. The measurements are based on laser-generated high-order harmonics, which have easily rotatable linear polarization but that are prone to brightness fluctuations and systematic drifts during measurement. Rather than measure the absolute reflectance, we extract the optical constants of a material from the ratio of p-polarized to s-polarized reflectance at multiple incident angles. This has the advantage of dividing out long-term fluctuations and possible systematic errors. We show that the reflectance ratio is as sensitive as the absolute reflectance to material optical properties.