Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

Light by design: emerging frontiers in ultrafast photon sciences and light–matter interactions

Photon sciences and technologies establish the building blocks for myriad scientific and engineering frontiers in life and energy sciences. Because of their overarching functionality, the developmental roadmap and opportunities underpinned by photonics are often semiotically mediated by the delineation of subject areas of application. In this perspective article, we map current and emerging linkages between three intersecting areas of research stewarded by advanced photonics technologies, namely light by design, outlined as (a) quantum and structured photonics, (b) light–matter interactions in accelerators and accelerator-based light sources, and (c) ultrafast sciences and quantum molecular dynamics. In each section, we will concentrate on state-of-the-art achievements and present prospective applications in life sciences, biochemistry, quantum optics and information sciences, and environmental and chemical engineering, all founded on a broad range of photon sources and methodologies. We hope that this interconnected mapping of challenges and opportunities seeds new concepts, theory, and experiments in the advancement of ultrafast photon sciences and light–matter interactions. Through this mapping, we hope to inspire a critically interdisciplinary approach to the science and applications of light by design.

Single-shot large field of view Fourier transform holography with a picosecond plasma-based soft X-ray laser

It is challenging to obtain nanoscale resolution images in a single ultrafast shot because a large number of photons, greater than 10¹¹, are required in a single pulse of the illuminating source. We demonstrate single-shot high resolution Fourier transform holography over a broad 7 µm diameter field of view with ∼ 5 ps temporal resolution. The experiment used a plasma-based soft X-ray laser operating at 18.9 nm wavelength with nearly full spatial coherence and close to diffraction-limited divergence implemented utilizing a dual-plasma amplifier scheme. A Fresnel zone plate with a central aperture is used to efficiently generate the object and reference beams. Rapid numerical reconstruction by a 2D Fourier transform allows for real-time imaging. A half-pitch spatial resolution of 62 nm was obtained. This single-shot nanoscale-resolution imaging technique will allow for real-time ultrafast imaging of dynamic phenomena in compact setups.

Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source

A self-contained electro-optical module for scanning extreme ultraviolet (EUV) reflection microscopy at 13.5 nm wavelength has been developed. The system has been designed to work with stand-alone commercially available EUV high harmonic generation (HHG) sources through the implementation of narrowband harmonic selecting multilayers and off-axis elliptical short focal length zoneplates. The module has been successfully integrated into an EUV mask scanning microscope achieving diffraction limited imaging performance (84 nm point spread function).

Actinic microscope for extreme ultraviolet lithography photomask inspection and review

Two dual-configuration extreme ultraviolet (EUV, 13.5nm wavelength) optical designs are described as a means to overcome principal EUV photomask metrology challenges. Semiconductor industry-wide efforts to define performance requirements and create standalone tools that can be used to discover, review, and accurately locate phase, amplitude, and mask pattern defects are described. The reference designs co-optimize low and high magnification configurations for orthogonal chief ray planes to avoid inspection and review trade-offs and emulate the aerial image of a lithography scanner.

Optical modeling of Fresnel zoneplate microscopes

Defect free masks remain one of the most significant challenges facing the commercialization of extreme ultraviolet (EUV) lithography. Progress on this front requires high-performance wavelength-specific metrology of EUV masks, including high-resolution and aerial-image microscopy performed near the 13.5 nm wavelength. Arguably the most cost-effective and rapid path to proliferating this capability is through the development of Fresnel zoneplate-based microscopes. Given the relative obscurity of such systems, however, modeling tools are not necessarily optimized to deal with them and their imaging properties are poorly understood. Here we present a modeling methodology to analyze zoneplate microscopes based on commercially available optical modeling software and use the technique to investigate the imaging performance of an off-axis EUV microscope design. The modeling predicts that superior performance can be achieved by tilting the zoneplate, making it perpendicular to the chief ray at the center of the field, while designing the zoneplate to explicitly work in that tilted plane. Although the examples presented here are in the realm of EUV mask inspection, the methods described and analysis results are broadly applicable to zoneplate microscopes in general, including full-field soft-x-ray microscopes routinely used in the synchrotron community.