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Zhang C, Hong N, Ji C, Zhu W, Chen X, Agrawal A, Zhang Z, Tiwald TE, Schoeche S, Hilfiker JN, Guo LJ, Lezec HJ. Robust Extraction of Hyperbolic Metamaterial Permittivity using Total Internal Reflection Ellipsometry. ACS PHOTONICS 2018; 5:10.1021/acsphotonics.8b00086. [PMID: 30997368 PMCID: PMC6463533 DOI: 10.1021/acsphotonics.8b00086] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/15/2023]
Abstract
Hyperbolic metamaterials are optical materials characterized by highly anisotropic effective permittivity tensor components having opposite signs along orthogonal directions. The techniques currently employed for characterizing the optical properties of hyperbolic metamaterials are limited in their capability for robust extraction of the complex permittivity tensor. Here we demonstrate how an ellipsometry technique based on total internal reflection can be leveraged to extract the permittivity of hyperbolic metamaterials with improved robustness and accuracy. By enhancing the interaction of light with the metamaterial stacks, improved ellipsometric sensitivity for subsequent permittivity extraction is obtained. The technique does not require any modification of the hyperbolic metamaterial sample or sophisticated ellipsometry set-up, and could therefore serve as a reliable and easy-to-adopt technique for characterization of a broad class of anisotropic metamaterials.
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Affiliation(s)
- Cheng Zhang
- Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
- Maryland Nanocenter, University of Maryland, College Park, MD, 20742, USA
| | - Nina Hong
- J. A. Woollam Co., Inc., Lincoln, NE, 68508, USA
- Corresponding Authors: (N. Hong):.; (L. J. Guo):.; (H. J. Lezec):.
| | - Chengang Ji
- Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, 48105, USA
| | - Wenqi Zhu
- Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
- Maryland Nanocenter, University of Maryland, College Park, MD, 20742, USA
| | - Xi Chen
- Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, 48105, USA
| | - Amit Agrawal
- Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
- Maryland Nanocenter, University of Maryland, College Park, MD, 20742, USA
| | - Zhong Zhang
- Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, 48105, USA
| | | | | | | | - L. Jay Guo
- Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, 48105, USA
- Corresponding Authors: (N. Hong):.; (L. J. Guo):.; (H. J. Lezec):.
| | - Henri J. Lezec
- Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA
- Corresponding Authors: (N. Hong):.; (L. J. Guo):.; (H. J. Lezec):.
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Yu CC, Lin KT, Tseng YC, Chou SY, Shao CC, Chen HL, Su WF. Plasmonic nanoparticle-film calipers for rapid and ultrasensitive dimensional and refractometric detection. Analyst 2014; 139:5103-11. [PMID: 25121142 DOI: 10.1039/c4an00186a] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
In this study, we develop an ultrasensitive nanoparticle (NP)-film caliper that functions with high resolution (angstrom scale) in response to both the dimensions and refractive index of the spacer sandwiched between the NPs and the film. The anisotropy of the plasmonic gap mode in the NP-film caliper can be characterized readily using spectroscopic ellipsometry (SE) without the need for further optical modeling. To the best of our knowledge, this paper is the first to report the use of SE to study the plasmonic gap modes in NP-film calipers and to demonstrate that SE is a robust and convenient method for analyzing NP-film calipers. The high sensitivity of this system originates from the plasmonic gap mode in the NP-film caliper, induced by electromagnetic coupling between the NPs and the film. The refractometric sensitivity of this NP-film caliper reaches up to 314 nm per RIU, which is superior to those of other NP-based sensors. The NP-film caliper also provides high dimensional resolution, down to the angstrom scale. In this study, the shift in wavelength in response to the change in gap spacing is approximately 9 nm Å(-1). Taking advantage of the ultrasensitivity of this NP-film caliper, we develop a platform for discriminating among thiol-containing amino acids.
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Affiliation(s)
- Chen-Chieh Yu
- Department of Materials Science and Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei, 10617 Taiwan, Republic of China.
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