Model laser damage precursors for high quality optical materials

Research on the mitigation of redeposition defects on the fused silica surface during wet etching process

The laser-induced damage of ultraviolet fused silica optics is a critical factor that limits the performance enhancement of high-power laser facility. Currently, wet etching technology based on hydrofluoric acid (HF) can effectively eliminate absorbing impurities and subsurface defects, thereby significantly enhancing the damage resistance of fused silica optics. However, with an increase in the operating fluence, the redeposition defects generated during wet etching gradually become the primary bottleneck that restricts its performance improvement. The composition and morphology of redeposition defects were initially identified in this study, followed by an elucidation of their formation mechanism. A mitigation strategy was then proposed, which combines a reduction in the generation of precipitation with an acceleration of the precipitation dissolution process. Additionally, we systematically investigated the influence of various process parameters such as extrinsic impurity, etching depth, and megasonic excitation on the mitigation of deposition defects. Furthermore, a novel multiple-step dynamic etching method was developed. Through comprehensive characterization techniques, it has been confirmed that this new etching process not only effectively mitigate redeposition defects under low fluence conditions but also exhibits significant inhibition effects on high fluence precursors. Consequently, it significantly enhances the laser damage resistance performance of fused silica optics.

A Study on the Surface Quality and Damage Properties of Single-Crystal Silicon Using Different Post-Treatment Processes

Detecting subsurface defects in optical components has always been challenging. This study utilizes laser scattering and photothermal weak absorption techniques to detect surface and subsurface nano-damage precursors of single-crystal silicon components. Based on laser scattering and photothermal weak absorption techniques, we successfully establish the relationship between damage precursors and laser damage resistance. The photothermal absorption level is used as an important parameter to measure the damage resistance threshold of optical elements. Single-crystal silicon elements are processed and post-processed optimally. This research employs dry etching and wet etching techniques to effectively eliminate damage precursors from optical components. Additionally, detection techniques are utilized to comprehensively characterize these components, resulting in the successful identification of optimal damage precursor removal methods for various polishing types of single-crystal silicon components. Consequently, this method efficiently enhances the damage thresholds of optical components.

Wide-field probing of silica laser-induced damage precursors by photoluminescence photochemical quenching

We describe a wide-field approach to probe transient changes in photoluminescence (PL) of defects on silica surfaces. This technique allows simultaneous capture of spatially resolved PL with spontaneous quenching behavior. We attribute the quenching of PL intensity to photochemical reactions of surface defects and/or subsurface fractures with ambient molecules. Such quenching curves can be accurately reproduced by our theoretical model using two quenchable defect populations with different reaction rates. The fitting parameters of our model are spatially correlated to fractures in silica where point defects and mechanical stresses are known to be present, potentially indicating regions prone to laser-induced damage growth. We believe that our approach allows rapid spatial resolved identification of damage prone morphology, providing a new pathway to fast, non-destructive predictions of laser-induced damage growth.

Tamper performance for confined laser drive applications

The shock imparted by a laser beam striking a metal surface can be increased by the presence of an optically transparent tamper plate bonded to the surface. We explore the shock produced in an aluminum slab, for a selection of tamper materials and drive conditions. The experiments are conducted with a single-pulse laser of maximum fluence up to 100 J/cm². The pressure and impulse are measured by photon doppler velocimetry, while plasma imaging is used to provide evidence of nonlinear tamper absorption. We demonstrate a pressure enhancement of 50x using simple commercially available optics. We compare results from hard dielectric glasses such as fused silica to soft plastics such as teflon tape. We discuss the mechanism of pressure saturation observed at high pulse fluence, along with some implications regarding applications. Below saturation, overall dependencies on pulse intensity and material parameters such as mechanical impedances are shown to correlate with a model by Fabbro et al.

Interaction between the mid-infrared continuous wave laser with a center wavelength of 3.8 µm and fused silica

The absorption coefficient of fused silica for a mid-infrared (IR) laser is higher than that for a near-IR laser, but smaller than that for a far-IR laser. Therefore, the energy coupling efficiency of the mid-IR laser is higher than that for the near-IR laser, while the penetration depth is higher than that for the far-IR laser. Thus, the mid-IR laser is highly efficient in mitigating damage growth. In this study, a deuterium fluoride (DF) laser with a center wavelength of 3.8 µm was used to interact with fused silica. The temperature variation, changes in the reflected and transmitted intensities of the probe light incident on the laser irradiation area, and the vaporization and melting sputtering process were analyzed. The results demonstrate that when the laser intensity was low (<1.2 kW/cm²), no significant melting was observed, and the reflection and transmission properties gradually recovered after the end of the laser irradiation process. With a further increase in the laser intensity, the sample gradually melted and vaporized. At a laser intensity above 5.1 kW/cm², the temperature of the sample increased rapidly and vapors in huge quantity evaporated from the surface of the sample. Moreover, when the laser intensity was increased to 9.5 kW/cm², the sample melted and an intense melting sputtering process was observed, and the sample was melted through.

Assessing the UV-pulse-laser-induced damage density of fused silica optics using photo-thermal absorption distribution probability curves

A photo-thermal absorption distribution probability curve based on a normal distribution model was proposed to describe the distribution of absorptive defects on fused silica surfaces under different processing conditions. Simultaneously, the maximum distribution probability absorption coefficient (MPA) and absorption distribution deviation (ADD) were used to quantitatively describe the overall absorption level and the uniformity of the absorption distribution on the fused silica surface. Based on this, the MPA (μ) and ADD (δ) were used to establish a statistical numerical relationship with the surface damage density of fused silica. The results showed that when μ ≤ 0.095 ± 0.015 and δ ≤ 0.045 ppm, the fused silica optics met the manufacturing process requirements for high laser-induced damage performance. Thus, a non-destructive approximate evaluation of the laser-induced damage density on the fused silica surface was achieved. This evaluation method provides a new, to the best of our knowledge, technology for evaluating the manufacturing process quality related to the damage performance of fused silica optics in high-power solid-state laser facilities and is an important supplement to popular destructive laser-induced damage testing methods.

Role of each step in the combined treatment of reactive ion etching and dynamic chemical etching for improving the laser-induced damage resistance of fused silica

We investigate the role of each step in the combined treatment of reactive ion etching (RIE) and dynamic chemical etching (DCE) for improving the laser-induced damage resistance of fused silica optics. We employ various surface analytical methods to identify the possible damage precursors on fused silica surfaces treated with different processes (RIE, DCE, and their combination). The results show that RIE-induced defects, including F contamination, broken Si-O bonds, luminescence defects (i.e., NBOHCs and ODCs), and material densification, are potential factors that limit the improvement of laser-induced damage resistance of the optics. Although being capable of eliminating the above factors, the DCE treatment can achieve rough optical surface with masses of exposed scratches and pits which might serve as reservoirs of the deposits such as inorganic salts, thus limiting the further improvement in damage resistance of fused silica. The study guides us to a deep understanding of the laser-induced damage process in achieving fused silica optics with enhanced resistance to laser-induced damage by the combined treatment of RIE and DCE.

A coupled model of electromagnetic and heat on nanosecond-laser ablation of impurity-containing aluminum alloy

In the emerging field of laser-driven inertial confinement fusion, Joule heating generated via electromagnetic heating of the metal frame is a critical issue. However, there are few reported models explaining thermal damage to the aluminum alloy. The aim of this study was to build a coupled model for electromagnetic radiation and heat conversion of an ultrashort laser pulse on an aluminum alloy based on Ohm's law. Additionally, the application SiO₂ films on aluminum alloy to improve the laser-induced damage threshold (LIDT) were simulated, and the effects of metal impurities in the aluminum alloy were analyzed. A model examining the relation between electromagnetic radiation and heat for a nanosecond laser irradiating an aluminum alloy was developed using a coupled model equation. The results obtained using the finite difference time domain (FDTD) algorithm can provide a theoretical basis for future improvement of the aluminum alloy LIDT.

Nanosecond laser ablation is the theoretical revealed by a coupled model of electromagnetic and heat.

Effects of combined process of reactive ion etching and dynamic chemical etching on UV laser damage resistance and surface quality of fused silica optics

We investigate the interest of combined process of reactive ion etching (RIE) and dynamic chemical etching (DCE) as a final step after polishing to improve the laser damage resistance of fused silica optics at the wavelength of 355 nm. The investigation is carried out on the polished fused silica optics by changing the RIE depth while keeping the DCE depth fixed. We evidence that the combined etching process can effectively remove the damage precursors on the fused silica surface and thus improve its laser-induced damage threshold exceeding the level of the deep HF-etched surface. The effects of the combined etching depth on the surface roughness and surface error are also studied systematically. We show that the combined shallow etching can achieve better overall surface quality. Deeper etching will cause surface quality degradation of the fused silica optics, which is believed to be associated with the chemical etching during the combined process. Given that HF acid processing will degrade the surface quality of fused silica optics, the combined shallow etching appears as a pertinent alternative to HF-based deep etching.

Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics

The surface laser damage performance of fused silica optics is related to the distribution of surface defects. In this study, we used chemical etching assisted by ultrasound and magnetorheological finishing to modify defect distribution in a fused silica surface, resulting in fused silica samples with different laser damage performance. Non-destructive test methods such as UV laser-induced fluorescence imaging and photo-thermal deflection were used to characterize the surface defects that contribute to the absorption of UV laser radiation. Our results indicate that the two methods can quantitatively distinguish differences in the distribution of absorptive defects in fused silica samples subjected to different post-processing steps. The percentage of fluorescence defects and the weak absorption coefficient were strongly related to the damage threshold and damage density of fused silica optics, as confirmed by the correlation curves built from statistical analysis of experimental data. The results show that non-destructive evaluation methods such as laser-induced fluorescence and photo-thermal absorption can be effectively applied to estimate the damage performance of fused silica optics at 351 nm pulse laser radiation. This indirect evaluation method is effective for laser damage performance assessment of fused silica optics prior to utilization.

Thermally ruggedized ITO transparent electrode films for high power optoelectronics

We present two strategies to minimize laser damage in transparent conductive films. The first consists of improving heat dissipation by selection of substrates with high thermal diffusivity or by addition of capping layer heatsinks. The second is reduction of bulk energy absorption by lowering free carrier density and increasing mobility, while maintaining film conductance with thicker films. Multi-pulse laser damage tests were performed on tin-doped indium oxide (ITO) films configured to improve optical lifetime damage performance. Conditions where improvements were not observed are also described. When bulk heating is not the dominant damage process, discrete defect-induced damage limits damage behavior.

Particle damage sources for fused silica optics and their mitigation on high energy laser systems

High energy laser systems are ultimately limited by laser-induced damage to their critical components. This is especially true of damage to critical fused silica optics, which grows rapidly upon exposure to additional laser pulses. Much progress has been made in eliminating damage precursors in as-processed fused silica optics (the advanced mitigation process, AMP3), and very high damage resistance has been demonstrated in laboratory studies. However, the full potential of these improvements has not yet been realized in actual laser systems. In this work, we explore the importance of additional damage sources-in particular, particle contamination-for fused silica optics fielded in a high-performance laser environment, the National Ignition Facility (NIF) laser system. We demonstrate that the most dangerous sources of particle contamination in a system-level environment are laser-driven particle sources. In the specific case of the NIF laser, we have identified the two important particle sources which account for nearly all the damage observed on AMP3 optics during full laser operation and present mitigations for these particle sources. Finally, with the elimination of these laser-driven particle sources, we demonstrate essentially damage free operation of AMP3 fused silica for ten large optics (a total of 12,000 cm² of beam area) for shots from 8.6 J/cm² to 9.5 J/cm² of 351 nm light (3 ns Gaussian pulse shapes). Potentially many other pulsed high energy laser systems have similar particle sources, and given the insight provided by this study, their identification and elimination should be possible. The mitigations demonstrated here are currently being employed for all large UV silica optics on the National Ignition Facility.

Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces

In this Letter, an effective combined process of reaction ion etching (RIE) and dynamic chemical etching (DCE) is applied for significantly improving the damage resistance of fused silica optics, while minimizing the removal amount. By optimizing the combination process and removal depth, a near-perfect optical surface of fused silica with relatively low roughness (<0.7  nm) is created with 1 μm RIE pretreatment and 3 μm DCE retreatment. In this case, the sample has a 2.4 times enhanced 0% probability damage threshold compared to the original sample. We show that the optimized combining process with a low removal amount is superior to a conventional HF-based etching process with a high removal amount in enhancing damage resistance and controlling the surface shape and roughness of fused silica. The results advance our understanding of a key factor influencing the RIE-DCE matching relationship and can lead to further optimization of associated applications, ranging from material processing to high-power laser systems.

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica

Surface damage precursor evolution has great influence on laser-induced damage threshold improvement of fused silica surface during Ion beam etching. In this work, a series of ion sputtering experiment are carried out to obtain the evolutions of damage precursors (dot-form microstructures, Polishing-Induced Contamination, Hertz scratches, and roughness). Based on ion sputtering theory, surface damage precursor evolutions are analyzed. The results show that the dot-form microstructures will appear during ion beam etching. But as the ion beam etching depth goes up, the dot-form microstructures can be mitigated. And ion-beam etching can broaden and passivate the Hertz scratches without increasing roughness value. A super-smooth surface (0.238nm RMS) can be obtained finally. The relative content of Fe and Ce impurities both significantly reduce after ion beam etching. The laser-induced damage threshold of fused silica is improved by 34% after ion beam etching for 800nm. Research results can be a reference on using ion beam etching process technology to improve laser-induced damage threshold of fused silica optics.

Laser-induced Hertzian fractures in silica initiated by metal micro-particles on the exit surface

Laser-induced Hertzian fractures on the exit surface of silica glass are found to result from metal surface-bound micro particles. Two types of metal micro-spheres are studied (stainless-steel and Al) using ultraviolet laser light. The fracture initiation probability curve as a function of fluence is obtained, resulting in an initiation threshold fluence of 11.1 ± 4.7 J/cm² and 16.5 ± 4.5 J/cm² for the SS and Al particles, accordingly. The modified damage density curve is calculated based on the fracture probability. The calculated momentum coupling coefficient linking incident laser fluence to the resulting plasma pressure is found to be similar for both particles: 32.6 ± 15.4 KN/J and 28.1 ± 10.4 KN/J for the SS and Al cases accordingly.

Detailed subsurface damage measurement and efficient damage-free fabrication of fused silica optics assisted by ion beam sputtering

Formation of subsurface damage has an inseparable relationship with microscopic material behaviors. In this work, our research results indicate that the formation process of subsurface damage often accompanies with the local densification effect of fused silica material, which seriously influences microscopic material properties. Interestingly, we find ion beam sputtering (IBS) is very sensitive to the local densification, and this microscopic phenomenon makes IBS as a promising technique for the detection of nanoscale subsurface damages. Additionally, to control the densification effect and subsurface damage during the fabrication of high-performance optical components, a combined polishing technology integrating chemical-mechanical polishing (CMP) and ion beam figuring (IBF) is proposed. With this combined technology, fused silica without subsurface damage is obtained through the final experimental investigation, which demonstrates the feasibility of our proposed method.

Reaction ion etching process for improving laser damage resistance of fused silica optical surface

Laser induced damage of fused silica optics occurs primarily on optical surface or subsurface resulting from various defects produced during polishing/grinding process. Many new kinds of surface treatment processes are explored to remove or control the defects on fused silica surface. In this study, we report a new application of reaction ion etching (RIE)-based surface treatment process for manufacture of high quality fused silica optics. The influence of RIE processes on laser damage resistance as a function of etching depth and the evolution of typical defects which are associated with laser damage performance were investigated. The results show that the impurity element defects and subsurface damage on the samples surface were efficiently removed and prevented. Pure silica surface with relatively single-stable stoichiometry and low carbon atomic concentration was created during the etching. The laser damage resistance of the etched samples increased dramatically. The increase of roughness and ODC point defect with deeper etching are believed to be the main factors to limit further increase of the damage resistance of fused silica. The study is expected to contribute to the development of fused silica optics with high resistance to laser induced degradation in the future.

Intrafilm separation of solgel film under nanosecond irradiation

We have observed large-scale intrafilm separation after the irradiation of solgel film with a single Nd:YAG pulse (1064 nm, 12 ns) in air. The irradiated but undamaged surface or the surface after intrafilm separation is densified. These damage features are distinctly different from the scalding surface of the electron beam evaporation coating or the ripple structures on the rear surface of fused silica, which indicates the extreme pressure gradients at the free surface-film interface. The submicrometer size melted cavity in the center of damage site is related with the nanoscale absorber. A phenomenological description that combines the defect-induced incubation phase and laser-supported surface breakdown wave is used to explain the damage process.

Characterization of laser-induced plasmas associated with energetic laser cleaning of metal particles on fused silica surfaces

Time-resolved plasma emission spectroscopy was used to characterize the energy coupling and temperature rise associated with single, 10-ns pulsed laser ablation of metallic particles bound to transparent substrates. Plasma associated with Fe(I) emission lines originating from steel microspheres was observed to cool from >24,000 to ~15,000 K over ~220 ns as τ(-0.28), consistent with radiative losses and adiabatic gas expansion of a relatively free plasma. Simultaneous emission lines from Si(II) associated with the plasma etching of the SiO(2) substrate were observed yielding higher plasma temperatures, ~35,000 K, relative to the Fe(I) plasma. The difference in species temperatures is consistent with plasma confinement at the microsphere-substrate interface as the particle is ejected, and is directly visualized using pump-probe shadowgraphy as a function of pulsed laser energy.

Defect analysis of UV high-reflective coatings used in the high power laser system

By considering the rapid change of standing-wave electric-field and assuming the interface defect distribution, an improved model is developed to analyze the defect density distribution and assess the damage performance of high-reflective coatings. Two kinds of high-reflective coatings deposited by e-beam evaporation (EBE) and ion beam sputtering (IBS) techniques are analyzed with this method. The lower overall damage threshold is the major feature for the coatings deposited by IBS method according to the defect parameters extracted from the model. Typical damage morphologies of coatings are also measured and analyzed. The assumption of interface defects is supported by the damage behavior. The damage mechanisms of two high-reflective coatings are attributed to the formation of molten pool and mechanical ejection. The influence of the incident angle on the damage probability is also considered and numerically calculated. The defect analysis model improved here is suitable for high-reflective coatings.

Mitigation of organic laser damage precursors from chemical processing of fused silica

Increases in the laser damage threshold of fused silica have been driven by the successive elimination of near-surface damage precursors such as polishing residue, fractures, and inorganic salts. In this work, we show that trace impurities in ultrapure water used to process fused silica optics may be responsible for the formation of carbonaceous deposits. We use surrogate materials to show that organic compounds precipitated onto fused silica surfaces form discrete damage precursors. Following a standard etching process, solvent-free oxidative decomposition using oxygen plasma or high-temperature thermal treatments in air reduced the total density of damage precursors to as low as <50 cm(-2). Finally, we show that inorganic compounds are more likely to cause damage when they are tightly adhered to a surface, which may explain why high-temperature thermal treatments have been historically unsuccessful at removing extrinsic damage precursors from fused silica.

High fluence laser damage precursors and their mitigation in fused silica

The use of any optical material is limited at high fluences by laser-induced damage to optical surfaces. In many optical materials, the damage results from a series of sources which initiate at a large range of fluences and intensities. Much progress has been made recently eliminating silica surface damage due to fracture-related precursors at relatively low fluences (i.e., less than 10 J/cm(2), when damaged by 355 nm, 5 ns pulses). At higher fluence, most materials are limited by other classes of damage precursors which exhibit a strong threshold behavior and high areal density (>10(5) cm(-2)); we refer to these collectively as high fluence precursors. Here, we show that a variety of nominally transparent materials in trace quantities can act as surface damage precursors. We show that by minimizing the presence of precipitates during chemical processing, we can reduce damage density in silica at high fluence by more than 100 times while shifting the fluence onset of observable damage by about 7 J/cm(2). A better understanding of the complex chemistry and physics of cleaning, rinsing, and drying will likely lead to even further improvements in the damage performance of silica and potentially other optical materials.