1
|
Vasileiou T, Llorens JM, Buencuerpo J, Ripalda JM, Izzo D, Summerer L. Light absorption enhancement and radiation hardening for triple junction solar cell through bioinspired nanostructures. BIOINSPIRATION & BIOMIMETICS 2021; 16:056010. [PMID: 34102615 DOI: 10.1088/1748-3190/ac095b] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/19/2021] [Accepted: 06/08/2021] [Indexed: 06/12/2023]
Abstract
Multi-junction solar cells constitute the main source of power for space applications. However, exposure of solar cells to the space radiation environment significantly degrades their performance across the mission lifetime. Here, we seek to improve the radiation hardness of the triple junction solar cell, GaInP/Ga(In)As/Ge, by decreasing the thickness of the more sensitive middle junction. Thin junctions facilitate the collection of minority carriers and show slower degradation due to defects. However, thinning the junction decreases the absorption, and consequently, the expected photocurrent. To compensate for this loss, we examined two bioinspired surface patterns that exhibit anti-reflective and light-trapping properties: (a) the moth-eye structure which enables vision in poorly illuminated environments and (b) the patterns of the hard cell of a unicellular photosynthetic micro-alga, the diatoms. We parametrize and optimize the biomimetic structures, aiming to maximize the absorbed light by the solar cell while achieving significant reduction in the middle junction thickness. The density of the radiation-induced defects is independent of the junction thickness, as we demonstrate using Monte Carlo simulations, allowing the direct comparison of different combinations of middle junction thicknesses and light trapping structures. We incorporate the radiation effects into the solar cell model as a decrease in minority carrier lifetime and an increase in surface recombination velocity, and we quantify the gain in efficiency for different combinations of junction thickness and the light-trapping structure at equal radiation damage. Solar cells with thin junctions compensated by the light-trapping structures offer a promising approach to improve solar cell radiation hardness and robustness, with up to 2% higher end-of-life efficiency than the commonly used configuration at high radiation exposure.
Collapse
Affiliation(s)
- Thomas Vasileiou
- Advanced Concepts Team, European Space Research and Technology Centre (ESTEC), 2201AZ Noordwijk, The Netherlands
| | - José M Llorens
- Instituto de Micro y Nanotecnología, IMN-CNM, CSIC (CEI UAM + CSIC) Isaac Newton, 8, E-28760, Tres Cantos, Madrid, Spain
| | - Jerónimo Buencuerpo
- Instituto de Micro y Nanotecnología, IMN-CNM, CSIC (CEI UAM + CSIC) Isaac Newton, 8, E-28760, Tres Cantos, Madrid, Spain
| | - José M Ripalda
- Instituto de Micro y Nanotecnología, IMN-CNM, CSIC (CEI UAM + CSIC) Isaac Newton, 8, E-28760, Tres Cantos, Madrid, Spain
| | - Dario Izzo
- Advanced Concepts Team, European Space Research and Technology Centre (ESTEC), 2201AZ Noordwijk, The Netherlands
| | - Leopold Summerer
- Advanced Concepts Team, European Space Research and Technology Centre (ESTEC), 2201AZ Noordwijk, The Netherlands
| |
Collapse
|
2
|
Abstract
The solar photovoltaic (PV) cell is a prominent energy harvesting device that reduces the strain in the conventional energy generation approach and endorses the prospectiveness of renewable energy. Thus, the exploration in this ever-green field is worth the effort. From the power conversion efficiency standpoint of view, PVs are consistently improving, and when analyzing the potential areas that can be advanced, more and more exciting challenges are encountered. One such crucial challenge is to increase the photon availability for PV conversion. This challenge is solved using two ways. First, by suppressing the reflection at the interface of the solar cell, and the other way is to enhance the optical pathlength inside the cell for adequate absorption of the photons. Our review addresses this challenge by emphasizing the various strategies that aid in trapping the light in the solar cells. These strategies include the usage of antireflection coatings (ARCs) and light-trapping structures. The primary focus of this study is to review the ARCs from a PV application perspective based on various materials, and it highlights the development of ARCs from more than the past three decades covering the structure, fabrication techniques, optical performance, features, and research potential of ARCs reported. More importantly, various ARCs researched with different classes of PV cells, and their impact on its efficiency is given a special attention. To enhance the optical pathlength, and thus the absorption in solar PV devices, an insight about the advanced light-trapping techniques that deals with the concept of plasmonics, spectral modification, and other prevailing innovative light-trapping structures approaching the Yablonovitch limit is discussed. An extensive collection of information is presented as tables under each core review section. Further, we take a step forward to brief the effects of ageing on ARCs and their influence on the device performance. Finally, we summarize the review of ARCs on the basis of structures, materials, optical performance, multifunctionality, stability, and cost-effectiveness along with a master table comparing the selected high-performance ARCs with perfect AR coatings. Also, from the discussed significant challenges faced by ARCs and future outlook; this work directs the researchers to identify the area of expertise where further research analysis is needed in near future.
Collapse
|
3
|
Buencuerpo J, Steiner MA, Tamboli AC. Optically-thick 300 nm GaAs solar cells using adjacent photonic crystals. OPTICS EXPRESS 2020; 28:13845-13860. [PMID: 32403851 DOI: 10.1364/oe.391737] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/05/2020] [Accepted: 04/09/2020] [Indexed: 06/11/2023]
Abstract
Ultra-thin photovoltaics offer the potential for increasing efficiency while minimizing costs. However, a suitable light trapping strategy is needed to reach the optically thick regime for otherwise thin-film structures. III-V materials can benefit from simple adjacent light trapping structures, if correctly designed. Here we present three strategies for a 300 nm thick GaAs cell using front photonic crystals, back photonic crystals, and both front and back combined, predicting a maximum photocurrent, Jsc=29.9 mA/cm2 under the radiative limit, including an enhanced absorption in the Urbach-tail. We analyze the increased absorption isolating the Fabry-Perot resonances, the single pass absorption and the scattered contribution from the incident light.
Collapse
|
4
|
Xie S, Wan X, Yang B, Zhang W, Wei X, Zhuang S. Design and Fabrication of Wafer-Level Microlens Array with Moth-Eye Antireflective Nanostructures. NANOMATERIALS (BASEL, SWITZERLAND) 2019; 9:E747. [PMID: 31096627 PMCID: PMC6567065 DOI: 10.3390/nano9050747] [Citation(s) in RCA: 15] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/12/2019] [Revised: 05/09/2019] [Accepted: 05/10/2019] [Indexed: 11/26/2022]
Abstract
Wafer-level packaging (WLP) based camera module production has attracted widespread industrial interest because it offers high production efficiency and compact modules. However, suppressing the surface Fresnel reflection losses is challenging for wafer-level microlens arrays. Traditional dielectric antireflection (AR) coatings can cause wafer warpage and coating fractures during wafer lens coating and reflow. In this paper, we present the fabrication of a multiscale functional structure-based wafer-level lens array incorporating moth-eye nanostructures for AR effects, hundred-micrometer-level aspherical lenses for camera imaging, and a wafer-level substrate for wafer assembly. The proposed fabrication process includes manufacturing a wafer lens array metal mold using ultraprecise machining, chemically generating a nanopore array layer, and replicating the multiscale wafer lens array using ultraviolet nanoimprint lithography. A 50-mm-diameter wafer lens array is fabricated containing 437 accurate aspherical microlenses with diameters of 1.0 mm; each lens surface possesses nanostructures with an average period of ~120 nm. The microlens quality is sufficient for imaging in terms of profile accuracy and roughness. Compared to lenses without AR nanostructures, the transmittance of the fabricated multiscale lens is increased by ~3% under wavelengths of 400-750 nm. This research provides a foundation for the high-throughput and low-cost industrial application of wafer-level arrays with AR nanostructures.
Collapse
Affiliation(s)
- Shuping Xie
- Engineering Research Center of Optical Instrument and System, The Ministry of Education, University of Shanghai for Science and Technology, Shanghai 200093, China.
- Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China.
| | - Xinjun Wan
- Engineering Research Center of Optical Instrument and System, The Ministry of Education, University of Shanghai for Science and Technology, Shanghai 200093, China.
- Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China.
| | - Bo Yang
- Engineering Research Center of Optical Instrument and System, The Ministry of Education, University of Shanghai for Science and Technology, Shanghai 200093, China.
- Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China.
| | - Wei Zhang
- Engineering Research Center of Optical Instrument and System, The Ministry of Education, University of Shanghai for Science and Technology, Shanghai 200093, China.
- Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China.
| | - Xiaoxiao Wei
- Engineering Research Center of Optical Instrument and System, The Ministry of Education, University of Shanghai for Science and Technology, Shanghai 200093, China.
- Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China.
| | - Songlin Zhuang
- Engineering Research Center of Optical Instrument and System, The Ministry of Education, University of Shanghai for Science and Technology, Shanghai 200093, China.
- Ministry of Education and Shanghai Key Laboratory of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China.
| |
Collapse
|
5
|
Nano-cones for broadband light coupling to high index substrates. Sci Rep 2016; 6:38682. [PMID: 27924859 PMCID: PMC5141501 DOI: 10.1038/srep38682] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/04/2016] [Accepted: 11/14/2016] [Indexed: 11/30/2022] Open
Abstract
The moth-eye structure has been proposed several times as an antireflective coating to replace the standard optical thin films. Here, we experimentally demonstrate the feasibility of a dielectric moth-eye structure as an antireflective coating for high-index substrates, like GaAs. The fabricated photonic crystal has Si3N4 cones in a square lattice, sitting on top of a TiO2 index matching layer. This structure attains 1.4% of reflectance power losses in the operation spectral range of GaAs solar cells (440–870 nm), a 12.5% relative reduction of reflection power losses in comparison with a standard bilayer. The work presented here considers a fabrication process based on laser interference lithography and dry etching, which are compatible with solar cell devices. The experimental results are consistent with scattering matrix simulations of the fabricated structures. In a broader spectral range (400–1800 nm), the simulation estimates that the nanostructure also significantly outperforms the standard bilayer coating (3.1% vs. 4.5% reflection losses), a result of interest for multijunction tandem solar cells.
Collapse
|
6
|
Buencuerpo J, Llorens JM, Zilio P, Raja W, Cunha J, Alabastri A, Zaccaria RP, Martí A, Versloot T. Light-trapping in photon enhanced thermionic emitters. OPTICS EXPRESS 2015; 23:A1220-A1235. [PMID: 26406751 DOI: 10.1364/oe.23.0a1220] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
A series of photonic crystal structures are optimized for a photon enhanced thermionic emitter. With realistic parameter values to describe a p-type GaAs device we find an efficiency above 10%. The light-trapping structures increases the performance by 2% over an optimal bilayer anti-reflective coating. We find a device efficiency very close to the case of a Lambertian absorber, but below its maximum performance. To prevent an efficiency below 10% the vacuum gap must be dimensioned according to the concentration factor of the solar irradiance.
Collapse
|