Polarization control in flexible interference lithography for nano-patterning of different photonic structures with optimized contrast

A Review: Laser Interference Lithography for Diffraction Gratings and Their Applications in Encoders and Spectrometers

The unique diffractive properties of gratings have made them essential in a wide range of applications, including spectral analysis, precision measurement, optical data storage, laser technology, and biomedical imaging. With advancements in micro- and nanotechnologies, the demand for more precise and efficient grating fabrication has increased. This review discusses the latest advancements in grating manufacturing techniques, particularly highlighting laser interference lithography, which excels in sub-beam generation through wavefront and amplitude division. Techniques such as Lloyd's mirror configurations produce stable interference fringe fields for grating patterning in a single exposure. Orthogonal and non-orthogonal, two-axis Lloyd's mirror interferometers have advanced the fabrication of two-dimensional gratings and large-area gratings, respectively, while laser interference combined with concave lenses enables the creation of concave gratings. Grating interferometry, utilizing optical interference principles, allows for highly precise measurements of minute displacements at the nanometer to sub-nanometer scale. This review also examines the application of grating interferometry in high-precision, absolute, and multi-degree-of-freedom measurement systems. Progress in grating fabrication has significantly advanced spectrometer technology, with integrated structures such as concave gratings, Fresnel gratings, and grating-microlens arrays driving the miniaturization of spectrometers and expanding their use in compact analytical instruments.

Laser Interference Lithography-A Method for the Fabrication of Controlled Periodic Structures

A microstructure determines macro functionality. A controlled periodic structure gives the surface specific functions such as controlled structural color, wettability, anti-icing/frosting, friction reduction, and hardness enhancement. Currently, there are a variety of controllable periodic structures that can be produced. Laser interference lithography (LIL) is a technique that allows for the simple, flexible, and rapid fabrication of high-resolution periodic structures over large areas without the use of masks. Different interference conditions can produce a wide range of light fields. When an LIL system is used to expose the substrate, a variety of periodic textured structures, such as periodic nanoparticles, dot arrays, hole arrays, and stripes, can be produced. The LIL technique can be used not only on flat substrates, but also on curved or partially curved substrates, taking advantage of the large depth of focus. This paper reviews the principles of LIL and discusses how the parameters, such as spatial angle, angle of incidence, wavelength, and polarization state, affect the interference light field. Applications of LIL for functional surface fabrication, such as anti-reflection, controlled structural color, surface-enhanced Raman scattering (SERS), friction reduction, superhydrophobicity, and biocellular modulation, are also presented. Finally, we present some of the challenges and problems in LIL and its applications.

Contrast Analysis of Polarization in Three-Beam Interference Lithography

This paper analyzes the effect of polarization and the incident angle on the contrasts of interference patterns in three-beam interference lithography. A non-coplanar laser interference system was set up to simulate the relationship between contrast, beam polarization, and the incident angle. Different pattern periods require different incident angles, which means different contrast losses in interference lithography. Two different polarization modes were presented to study the effects of polarization with different incident angles based on theoretical analysis simulations. In the case of the co-directional component TE polarization mode, it was demonstrated that the pattern contrast decreases with the increase in the incident angle and the contrast loss caused by the polarization angle error also grew rapidly. By changing the mode to azimuthal (TE-TE-TE) polarization, the contrast of the interference pattern can be ensured to remain above 0.97 even though the incident angle is large. In addition, TE-TE-TE mode can accept larger polarization angle errors. This conclusion provides a theoretical basis for the generation of high-contrast light fields at different incident angles, and the conclusion is also applicable to multi-beam interference lithography.

Highly resistant all-silica polarizing coatings for normal incidence applications

Several fundamental restrictions limit the implementation of microlasers in high power systems, low resistivity of coatings and compactness of elements, especially if control of polarization is necessary. Thin-film-based coatings with extremely high optical resistivity and polarizing properties for normal incidence could become a preferable solution. In this Letter, a novel multilayer approach to form all-silica polarizing coatings for normal incidence angle applications is proposed. Laser induced damage thresholds (test one-on-one) at the wavelength of 355 nm were 39J/cm² and 48.5J/cm² for the reflected and transmitted polarizations, respectively. Such elements can essentially improve tolerated radiation power and allow for production of more compact laser systems.

Wafer-scale nanopatterning using fast-reconfigurable and actively-stabilized two-beam fiber-optic interference lithography

A fast-reconfigurable and actively-stabilized fiber-optic interference lithography system is demonstrated in this paper. Employment of fiber-optic components greatly enhances the flexibility of the whole system, simplifies its optical alignment, and suppresses the interference of mechanical vibrations. Active stabilization is implemented in the system and evaluated through modeling and experiment. We demonstrate 3-inch-diameter wafer-scale patterning of 240-nm-period grating lines with a sub-50-nm linewidth and an aspect ratio over 3. Two-dimensional patterns of different geometries and dimensions are also demonstrated to show the versatility of our system. Step-and-repeat exposure is demonstrated with independently controlled patterning fields of 2×2cm² large.