Emission efficiency enhanced by reducing the concentration of residual carbon impurities in InGaN/GaN multiple quantum well light emitting diodes

Stepped upper waveguide layer for higher hole injection efficiency in GaN-based laser diodes

We propose a stepped upper waveguide layer (UWG) to improve the hole injection efficiency of GaN-based laser diodes (LDs), and investigate its effect on the performance of LDs from experiments and theoretical calculations. The experimental characterization of the LD with stepped UWG presents a decrease of 16.6% for the threshold current as well as an increase of 41.2% for the slope efficiency compared to the LD with conventional GaN UWG. Meanwhile, strong localized effects are found in the quantum wells of LD with stepped UWG and a large blue-shift in the electroluminescence (EL) spectra below the threshold by analyzing the differential efficiency and the EL spectra. The large blue shift implies a stronger polarization field in the LDs, which may affect the injection of holes. Additionally, the simulation results demonstrate that the LD with stepped UWG achieves higher hole injection efficiency by modulating the valence band, and the hole current density injected into the quantum wells reaches 6067 A/cm².

Role of Si and C Impurities in Yellow and Blue Luminescence of Unintentionally and Si-Doped GaN

Both yellow luminescence (YL) and blue luminescence (BL) bands of GaN films have been investigated for decades, but few works report the relationship between them. In this study, two sets of GaN samples grown via metalorganic chemical vapor deposition (MOCVD) were investigated. A close relationship was found between the YL and BL bands for unintentionally doped GaN and Si-doped GaN samples, both of which were grown without intentional acceptor doping. It was found that the intensity ratio of blue luminescence to yellow luminescence (I_BL/I_YL) decreases sharply with the increase in carbon impurity concentration, even though both I_BL and I_YL increase obviously. It was also found that I_BL/I_YL decreases sharply with the increase in Si doping concentration. It is suggested that the C and Si impurities play important role in linkage and competition of the blue and yellow luminescence.

Effect of hydrogen treatment temperature on the properties of InGaN/GaN multiple quantum wells

InGaN/GaN multiple quantum wells (MQWs) were grown with hydrogen treatment at well/barrier upper interface under different temperatures. Hydrogen treatment temperature greatly affects the characteristics of MQWs. Hydrogen treatment conducted at 850 °C improves surface and interface qualities of MQWs, as well as significantly enhances room temperature photoluminescence (PL) intensity. In contrast, the sample with hydrogen treatment at 730 °C shows no improvement, as compared with the reference sample without hydrogen treatment. On the basis of temperature-dependent PL characteristics analysis, it is concluded that hydrogen treatment at 850 °C is more effective in reducing defect-related non-radiative recombination centers in MQWs region, yet has little impact on carrier localization. Hence, hydrogen treatment temperature is crucial to improving the quality of InGaN/GaN MQWs.