Plasmonic metasurface cavity for simultaneous enhancement of optical electric and magnetic fields in deep subwavelength volume

Nanoimprint lithography for high-throughput fabrication of metasurfaces

Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties that are not found in nature. They have been widely investigated for optical applications such as holograms, wavefront shaping, and structural color printing, however, electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low productivity. Although alternative optical technologies, such as holographic lithography and plasmonic lithography, can overcome these drawbacks, such methods are still constrained by the optical diffraction limit. To break through this fundamental problem, mechanical nanopatterning processes have been actively studied in many fields, with nanoimprint lithography (NIL) coming to the forefront. Since NIL replicates the nanopattern of the mold regardless of the diffraction limit, NIL can achieve sufficiently high productivity and patterning resolution, giving rise to an explosive development in the fabrication of metasurfaces. In this review, we focus on various NIL technologies for the manufacturing of metasurfaces. First, we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of metasurfaces. We also discuss recent applications of NIL in the realization of metasurfaces. Finally, we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces.

Scalable and High-Throughput Top-Down Manufacturing of Optical Metasurfaces

Metasurfaces have shown promising potential to miniaturize existing bulk optical components thanks to their extraordinary optical properties and ultra-thin, small, and lightweight footprints. However, the absence of proper manufacturing methods has been one of the main obstacles preventing the practical application of metasurfaces and commercialization. Although a variety of fabrication techniques have been used to produce optical metasurfaces, there are still no universal scalable and high-throughput manufacturing methods that meet the criteria for large-scale metasurfaces for device/product-level applications. The fundamentals and recent progress of the large area and high-throughput manufacturing methods are discussed with practical device applications. We systematically classify various top-down scalable patterning techniques for optical metasurfaces: firstly, optical and printing methods are categorized and then their conventional and unconventional (emerging/new) techniques are discussed in detail, respectively. In the end of each section, we also introduce the recent developments of metasurfaces realized by the corresponding fabrication methods.