Fabrication of hexagonal compound eye microlens array using DMD-based lithography with dose modulation

Hexagonal diffractive optical elements

Diffractive optical elements (DOEs) have widespread applications in optics, ranging from point spread function engineering to holographic display. Conventionally, DOE design relies on Cartesian simulation grids, resulting in square features in the final design. Unfortunately, Cartesian grids provide an anisotropic sampling of the plane, and the resulting square features can be challenging to fabricate with high fidelity using methods such as photolithography. To address these limitations, we explore the use of hexagonal grids as a new grid structure for DOE design and fabrication. In this study, we demonstrate wave propagation simulation using an efficient hexagonal coordinate system and compare simulation accuracy with the standard Cartesian sampling scheme. Additionally, we have implemented algorithms for the inverse DOE design. The resulting hexagonal DOEs, encoded with wavefront information for holograms, are fabricated and experimentally compared to their Cartesian counterparts. Our findings indicate that employing hexagonal grids enhances holographic imaging quality. The exploration of new grid structures holds significant potential for advancing optical technology across various domains, including imaging, microscopy, photography, lighting, and virtual reality.

Rapid prototyping of high-resolution large format microfluidic device through maskless image guided in-situ photopolymerization

Microfluidic devices have found extensive applications in mechanical, biomedical, chemical, and materials research. However, the high initial cost, low resolution, inferior feature fidelity, poor repeatability, rough surface finish, and long turn-around time of traditional prototyping methods limit their wider adoption. In this study, a strategic approach to a deterministic fabrication process based on in-situ image analysis and intermittent flow control called image-guided in-situ maskless lithography (IGIs-ML), has been proposed to overcome these challenges. By using dynamic image analysis and integrated flow control, IGIs-ML provides superior repeatability and fidelity of densely packed features across a large area and multiple devices. This general and robust approach enables the fabrication of a wide variety of microfluidic devices and resolves critical proximity effect and size limitations in rapid prototyping. The affordability and reliability of IGIs-ML make it a powerful tool for exploring the design space beyond the capabilities of traditional rapid prototyping.

Broadband angular dispersion compensation for digital micromirror devices

In this Letter, we present a compact broadband angular dispersion compensation method for digital micromirror devices (DMDs) and ultrashort pulse lasers, which effectively extends the conventional single-wavelength compensation design to a wide wavelength range of 300 nm. First, a parametric model was developed for the dispersion compensation unit, consisting of a transmission grating and a 4f telescope sub-unit, to guide the selection of components and parameter optimization for broadband applications. In the experiments, we designed a single slit-based metrology system to measure and quantify the compensated angular dispersion of a Ti:sapphire femtosecond laser with a pulse width of 75 fs. The results indicate that our method can reduce the angular dispersion to 0.04°, i.e., pulse widening less than 20 fs, over a wavelength range of 750-1050 nm. To demonstrate this, the DMD system was used as a multi-wavelength beam shaper to reconstruct a wavefront that contains the "CUHK" pattern and the results confirmed its ability to provide effective broadband angular dispersion compensation. This means the DMD can be used in different applications that employ a broadband light source, e.g., wavelength tunable femtosecond laser, attosecond laser, supercontinuum laser, and multi-color LED.

Convex silica microlens arrays via femtosecond laser writing

We report fabrication of silica convex microlens arrays with controlled shape, size, and curvature by femtosecond laser direct writing. A backside etching in dye solution was utilized for laser machining high-fidelity control of material removal and real-time surface cleaning from ablation debris. Thermal annealing was applied to reduce surface roughness to 3 nm (rms). The good optical performance of the arrays was confirmed by focusing and imaging tests. Complex 3D micro-optical elements over a footprint of $ 100 \times 100\;\unicode{x00B5}{{\rm m}^2} $100×100µm² were ablated within 1 h (required for practical applications). A material removal speed of $ 120\;\unicode{x00B5}{{\rm m}^3}/{\rm s} $120µm³/s ($ 6 \times {10^5} \;{{\rm nm}^3}/{\rm pulse} $6×10⁵nm³/pulse) was used, which is more than an order of magnitude higher compared to backside etching using a mask projection method. The method is applicable for fabrication of micro-optical components on transparent hard materials.

Intensity modulation based optical proximity optimization for the maskless lithography

The undesirable optical proximity effect (OPE) that appeared in the digital micro-mirrors device (DMD) based maskless lithography directly influences the final exposure pattern and decreases the lithography quality. In this manuscript, a convenient method of intensity modulation applied for the maskless lithography is proposed to optimize such an effect. According to the pulse width modulation based image recognition of DMD, we replaced the digital binary mask with a special digital grayscale mask to modulate the UV intensity distribution to be closer to the expectation in a way of point-by-point modification. The exposure result applying the grayscale mask has a better consistency with the design pattern than that for the case in which the original binary mask is used. The effectiveness of this method was analyzed by the image subtraction technique. Experimental data revealed that the matching rate between the exposure pattern and the mask pattern has been improved from 78% to 91%. Besides, more experiments have been conducted to verify the validity of this method for the optical proximity optimization and its potential in the high-fidelity DMD based maskless lithography.

User-defined microstructures array fabricated by DMD based multistep lithography with dose modulation

A flexible and efficient strategy, digital micromirror devices (DMD) based multistep lithography (DMSL), is proposed to fabricate arrays of user-defined microstructures. Through the combination of dose modulation, flexible pattern generation of DMD, and high-resolution step movement of piezoelectrical stage (PZS), this method enables prototyping a board range of 2D lattices with periodic/nonperiodic spatial distribution and arbitrary shapes and the critical feature size is down to 600 nm. We further explore the use of DMSL to fabricate microlens array by combining with the thermal reflowing process. The square shape and hexagonal shape microlens with customized distribution are realized and characterized. The results indicate that the proposed DMSL can be a significant role in the microfabrication techniques for manufacturing functional microstructures array.

Microlens arrays with adjustable aspect ratio fabricated by electrowetting and their application to correlated color temperature tunable light-emitting diodes

We develop a facile, fast, and cost-effective method based on the electrowetting effect to fabricate concave microlens arrays (MLA) with a tunable height-to-radius ratio, namely aspect ratio (AR). The electric parameters including voltage and frequency are demonstrated to play an important role in the MLA forming process. With the optimized frequency of 5 Hz, the AR of MLA are tuned from 0.057 to 0.693 for an increasing voltage from 0 V to 180 V. The optical properties of the MLA, including their transmittance and light diffusion capability, are investigated by spectroscopic measurements and ray-tracing simulations. We show that the overall transmittance can be maintained above around 90% over the whole visible range, and that an AR exceeding 0.366 is required to sufficiently broaden the transmitted light angular distribution. These properties enable to apply the developed MLA films to correlated-color-temperature (CCT)-tunable light-emitting-diodes (LEDs) to enhance their angular color uniformity (ACU). Our results show that the ACU of CCT-tunable LEDs is significantly improved while preserving almost the same lumen output, and that the MLA with the highest AR exhibits the best ACU performance.