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Hadibrata W, Wei H, Krishnaswamy S, Aydin K. Inverse Design and 3D Printing of a Metalens on an Optical Fiber Tip for Direct Laser Lithography. NANO LETTERS 2021; 21:2422-2428. [PMID: 33720738 DOI: 10.1021/acs.nanolett.0c04463] [Citation(s) in RCA: 27] [Impact Index Per Article: 6.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
An inverse-designed metalens is proposed, designed, and fabricated on an optical fiber tip via a 3D direct laser-writing technique through two-photon polymerization. A computational inverse-design method based on an objective-first algorithm was used to design a thin circular grating-like structure to transform the parallel wavefront into a spherical wavefront at the near-infrared range. With a focal length about 8 μm at an operating wavelength of 980 nm and an optimized focal spot at the scale of 100 nm, our proposed metalens platform is suitable for two-photon direct laser lithography. We demonstrate the use of the fabricated metalens in a direct laser lithography system. The proposed platform, which combines the 3D printing technique and the computational inverse-design method, shows great promise for the fabrication and integration of multiscale and multiple photonic devices with complex functionalities.
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Affiliation(s)
- Wisnu Hadibrata
- Department of Electrical and Computer Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Heming Wei
- Center for Smart Structures and Materials, Department of Mechanical Engineering, Northwestern University, Evanston, Illinois 60208, United States
- Key Laboratory of Specialty Fiber Optics and Optical Access Networks, Joint International Research Laboratory of Specialty Fiber Optics and Advanced Communication, Shanghai University, Shanghai 200444, China
| | - Sridhar Krishnaswamy
- Center for Smart Structures and Materials, Department of Mechanical Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Koray Aydin
- Department of Electrical and Computer Engineering, Northwestern University, Evanston, Illinois 60208, United States
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Ouyang X, Liu T, Zhang Y, He J, He Z, Zhang AP, Tam HY. Ultrasensitive optofluidic enzyme-linked immunosorbent assay by on-chip integrated polymer whispering-gallery-mode microlaser sensors. LAB ON A CHIP 2020; 20:2438-2446. [PMID: 32484485 DOI: 10.1039/d0lc00240b] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/11/2023]
Abstract
Optical whispering-gallery-mode (WGM) microcavities offer great promise in ultrasensitive biosensors because of their unique ability to enable resonant recirculation of light to achieve strong light-matter interactions in microscale volumes. However, it remains a challenge to develop cost-effective, high-performance WGM microcavity-based biosensing devices for practical disease diagnosis applications. In this paper, we present an optofluidic chip that is integrated with directly-printed, high-quality-factor (Q) polymer WGM microlaser sensors for ultrasensitive enzyme-linked immunosorbent assay (ELISA). Optical 3D μ-printing technology based on maskless ultraviolet lithography is developed to rapidly fabricate high-Q suspended-disk WGM microcavities. After deposition with a thin layer of optical gain material, low-threshold WGM microlasers are fabricated and then integrated together with optical fibres upon a microfluidic chip to achieve an optofluidic device. With flexible microfluidic technology, on-chip, integrated, WGM microlasers are further modified in situ with biomolecules on surface for highly selective biomarker detection. It is demonstrated that such an optofluidic biochip can measure horseradish peroxidase (HRP)-streptavidin, which is a widely used catalytic molecule in ELISA, via chromogenic reaction at the concentration level of 0.3 ng mL-1. Moreover, it enables on-chip optofluidic ELISA of the disease biomarker vascular endothelial growth factor (VEGF) at the extremely low concentration level of 17.8 fg mL-1, which is over 2 orders of magnitude better than the ability of current commercial ELISA kits.
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Affiliation(s)
- Xia Ouyang
- Photonics Research Centre, Department of Electrical Engineering, The Hong Kong Polytechnic University, Hong Kong, SAR, China.
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Yuan D, Liu B, Zhu Z, Guo Y, Cheng C, Chen H, Gu M, Xu M, Chen L, Liu J, Ouyang X. Directional Control and Enhancement of Light Output of Scintillators by Using Microlens Arrays. ACS APPLIED MATERIALS & INTERFACES 2020; 12:29473-29480. [PMID: 32510919 DOI: 10.1021/acsami.0c06779] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Scintillators play an important role in the field of nuclear radiation detection, such as nuclear medical imaging, dark matter detection, nuclear physics experiments, and national security. However, the light extraction efficiency of a scintillator with a high refractive index is severely restricted because of the total internal reflection. In this paper, microlens arrays have been applied onto the surface of a cerium-doped lutetium-yttrium oxyorthosilicate scintillator to improve the light extraction efficiency and to control the directivity of the light output. Compared to that of a reference sample, a 3.26-fold enhancement with an emission angle of 45° has been obtained by using microlens arrays with optimal parameters. It was also found that the enhancement ratio can be affected by the refractive index of the microlens, the spacing of individual microlens. The control mechanism of microlens arrays is revealed by a combination of simulations and experiments. X-ray imaging characteristics exhibit an improved gray scale amplitude without any loss of the spatial resolution. The present results suggest that the application of microlens arrays to scintillators is beneficial to the field of nuclear radiation detection.
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Affiliation(s)
- Di Yuan
- Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P.R. China
| | - Bo Liu
- Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P.R. China
| | - Zhichao Zhu
- Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P.R. China
| | - Yaozhen Guo
- Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P.R. China
| | - Chuanwei Cheng
- Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P.R. China
| | - Hong Chen
- Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P.R. China
| | - Mu Gu
- Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, School of Physics Science and Engineering, Tongji University, Shanghai 200092, P.R. China
| | - Mengxuan Xu
- State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an 710024, P.R. China
| | - Liang Chen
- State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an 710024, P.R. China
| | - Jinliang Liu
- State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an 710024, P.R. China
| | - Xiaoping Ouyang
- State Key Laboratory of Intense Pulsed Radiation Simulation and Effect, Northwest Institute of Nuclear Technology, Xi'an 710024, P.R. China
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Tseng HY, Chen YH, Chen RY, Yang H. Reversibly Erasable Broadband Omnidirectional Antireflection Coatings Inspired by Inclined Conical Structures on Blue-Tailed Forest Hawk Dragonfly Wings. ACS APPLIED MATERIALS & INTERFACES 2020; 12:10883-10892. [PMID: 32031777 DOI: 10.1021/acsami.0c00823] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Blue-tailed forest hawk dragonfly (Orthetrum triangulare) wings, covered with inclined conical structures, are studied for their high transparency and low reflectance for large viewing angles. However, limited by existing technologies, the exquisite inclined structures are not replicated easily or applied adequately. Here, we combine a shear-induced self-assembly approach and a colloidal lithography technology to create omnidirectional antireflection structures that are inspired by dragonfly wings. Nonclose-packed colloid crystals are spin-coated and serve as structural templates in a plasma etching procedure to pattern subwavelength inclined conical structures directly on shape memory polymer-coated substrates. The dependence of the antireflection functionality on the shape and inclination of conical structures is systematically investigated in this research. Compared with a featureless substrate, the structure-covered substrate can display an approximately 8% higher average transmittance in the visible wavelength range at normal incidence and even approximately 23% higher average transmittance as the incident angle increases to 75°. Moreover, the reconfigurable structures composed of shape memory polymers can be repeatedly deformed and recovered as a result of external stimuli at ambient conditions, and the corresponding broadband omnidirectional antireflection functionality is therefore reversibly erased and restored.
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Affiliation(s)
- Hsin-Yu Tseng
- Department of Chemical Engineering, National Chung Hsing University, 145 Xingda Road, Taichung City 40227, Taiwan
| | - Yu-Han Chen
- Department of Chemical Engineering, National Chung Hsing University, 145 Xingda Road, Taichung City 40227, Taiwan
| | - Ru-Yu Chen
- Department of Chemical Engineering, National Chung Hsing University, 145 Xingda Road, Taichung City 40227, Taiwan
| | - Hongta Yang
- Department of Chemical Engineering, National Chung Hsing University, 145 Xingda Road, Taichung City 40227, Taiwan
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