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López S, de la Fuente E, Alonso A, Pandey AK, Guilbaud O, Oliva E. Conservation of orbital angular momentum throughout amplification of high order harmonics in Ni-like krypton and silver plasmas. OPTICS EXPRESS 2023; 31:8465-8478. [PMID: 36859961 DOI: 10.1364/oe.478099] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/28/2022] [Accepted: 01/04/2023] [Indexed: 06/18/2023]
Abstract
In this article we present modelling results of the amplification of High Order Harmonics (HOH) carrying orbital angular momentum (OAM) in plasma amplifiers created from krypton gas and silver solid targets. The resulting amplified beam is characterized in terms of intensity, phase and decomposition in helical and Laguerre-Gauss modes. Results show that the amplification process conserves OAM, although some degradation is apparent. Several structures appear in the intensity and phase profiles. These structures have been characterized with our model and related to refraction and interference with the plasma self-emission. Thus, these results not only demonstrate the capability of plasma amplifiers to deliver HOH amplified beams carrying OAM but also pave the way towards using HOH carrying OAM as a probe beam to diagnose the dynamics of hot, dense plasmas.
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de La Rochefoucauld O, Dovillaire G, Harms F, Idir M, Huang L, Levecq X, Piponnier M, Zeitoun P. EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging. SENSORS 2021; 21:s21030874. [PMID: 33525501 PMCID: PMC7865934 DOI: 10.3390/s21030874] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/22/2020] [Revised: 01/15/2021] [Accepted: 01/20/2021] [Indexed: 12/27/2022]
Abstract
For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.
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Affiliation(s)
| | - Guillaume Dovillaire
- Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France; (G.D.); (F.H.); (X.L.); (M.P.)
| | - Fabrice Harms
- Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France; (G.D.); (F.H.); (X.L.); (M.P.)
| | - Mourad Idir
- Brookhaven National Laboratory, 50 Rutherford Drive, Upton, NY 11973, USA; (M.I.); (L.H.)
| | - Lei Huang
- Brookhaven National Laboratory, 50 Rutherford Drive, Upton, NY 11973, USA; (M.I.); (L.H.)
| | - Xavier Levecq
- Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France; (G.D.); (F.H.); (X.L.); (M.P.)
| | - Martin Piponnier
- Imagine Optic, 18 rue Charles de Gaulle, 91400 Orsay, France; (G.D.); (F.H.); (X.L.); (M.P.)
| | - Philippe Zeitoun
- Laboratoire d’Optique Appliquée, CNRS, ENSTA Paris, Ecole Polytechnique IP Paris, 91120 Palaiseau, France;
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Li L, Koliyadu JCP, Donnelly H, Alj D, Delmas O, Ruiz-Lopez M, de La Rochefoucauld O, Dovillaire G, Fajardo M, Zhou C, Ruan S, Dromey B, Zepf M, Zeitoun P. High numerical aperture Hartmann wave front sensor for extreme ultraviolet spectral range. OPTICS LETTERS 2020; 45:4248-4251. [PMID: 32735269 DOI: 10.1364/ol.396356] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/05/2020] [Accepted: 06/25/2020] [Indexed: 06/11/2023]
Abstract
We present a novel, to the best of our knowledge, Hartmann wave front sensor for extreme ultraviolet (EUV) spectral range with a numerical aperture (NA) of 0.15. The sensor has been calibrated using an EUV radiation source based on gas high harmonic generation. The calibration, together with simulation results, shows an accuracy beyond λ/39 root mean square (rms) at λ=32nm. The sensor is suitable for wave front measurement in the 10 nm to 45 nm spectral regime. This compact wave front sensor is high-vacuum compatible and designed for in situ operations, allowing wide applications for up-to-date EUV sources or high-NA EUV optics.
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Tissandier F, Gautier J, Goddet JP, Kabacinski A, Sebban S, Nejdl J, Kozlová M, Maynard G. Two-Color Soft X-Ray Lasing in a High-Density Nickel-like Krypton Plasma. PHYSICAL REVIEW LETTERS 2020; 124:133902. [PMID: 32302194 DOI: 10.1103/physrevlett.124.133902] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/20/2019] [Revised: 02/25/2020] [Accepted: 03/12/2020] [Indexed: 06/11/2023]
Abstract
We report evidence of strong lasing on the 4p-4s transition at 62.7 nm in nickel-like krypton occurring simultaneously with the usual 4d-4p lasing at 32.8 nm. The gain dynamics of both transitions were experimentally and numerically investigated and found comparable. The two-color amplifier was seeded by the same harmonic pulse, therefore producing a short-duration coherent two-color soft x-ray laser pulse. Both transitions offer similar prospects of pulse energy and duration and could lead to the delivery of intense and ultrashort two-color coherent soft x-ray pulses with a controllable delay.
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Affiliation(s)
- F Tissandier
- Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, 828 Boulevard des Maréchaux, F-91761 Palaiseau cedex, France
| | - J Gautier
- Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, 828 Boulevard des Maréchaux, F-91761 Palaiseau cedex, France
| | - J-P Goddet
- Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, 828 Boulevard des Maréchaux, F-91761 Palaiseau cedex, France
| | - A Kabacinski
- Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, 828 Boulevard des Maréchaux, F-91761 Palaiseau cedex, France
| | - S Sebban
- Laboratoire d'Optique Appliquée, ENSTA Paris, Ecole Polytechnique, CNRS, Institut Polytechnique de Paris, 828 Boulevard des Maréchaux, F-91761 Palaiseau cedex, France
| | - J Nejdl
- ELI-Beamlines project, Institute of Physics of the Czech Academy of Science, Na Slovance 2, 182 21 Prague 8, Czech Republic
| | - M Kozlová
- ELI-Beamlines project, Institute of Physics of the Czech Academy of Science, Na Slovance 2, 182 21 Prague 8, Czech Republic
| | - G Maynard
- Laboratoire de Physique des Gaz et des Plasmas, Université Paris Sud, CNRS, Université Paris Saclay, F-91405 Orsay Cedex, France
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