Lithographic pattern quality enhancement of DMD lithography with spatiotemporal modulated technology

Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique

Due to digital micromirrors device (DMD) digital lithography limited by non-integer pixel errors, the edge smoothness of the exposed image is low and the sawtooth defects are obvious. To improve the image edge smoothness, an optimized pixel overlay method was proposed, which called the DMD digital lithography based on dynamic blur effect matching pixel overlay technology. The core of this method is that motion blur effect is cleverly introduced in the process of pixel overlap to carry out the lithography optimization experiment. The simulation and experimental results showed that the sawtooth edge was reduced from 1.666 µm to 0.27 µm by adopting the 1/2 dynamic blur effect to match pixel displacement superposition, which is far less than half of the sawtooth edge before optimization. The results indicated that the proposed method can efficiently improve the edge smoothness of lithographic patterns. We believe that the proposed optimization method can provide great help for high fidelity and efficient DMD digital lithography microfabrication.

Genetic algorithm-based optical proximity correction for DMD maskless lithography

We present an optical proximity correction (OPC) method based on a genetic algorithm for reducing the optical proximity effect-induced pattern distortion in digital micromirror device (DMD) maskless lithography. Via this algorithm-assisted grayscale modulation of the initial mask at the pixel level, the exposure pattern can be enhanced significantly. Actual exposure experiments revealed that the rate of matching between the final exposure pattern and the mask pattern can be increased by up to 20%. This method's applicability to complex masks further demonstrates its universality for mask pattern optimization. We believe that our algorithm-assisted OPC could be highly helpful for high-fidelity and efficient DMD maskless lithography for microfabrication.

Consistent pattern printing of the gap structure in femtosecond laser DMD projection lithography

Maskless lithography technologies have been developed and played an important role in the fabrication of functional micronano devices for microelectronics, biochips and photonics. Optical projection lithography based on digital micromirror device (DMD) is an efficient maskless lithography technology that can rapidly fabricate complex structures. The precise modulation of gap width by DMD maskless optical projection lithography (MOPL) using femtosecond laser becomes important for achieving micronano structures. Herein, we have investigated the relationship between the structure morphology and the light intensity distribution at the image plane by multi-slit diffraction model and Abbe imaging principle, and optimized the gap width more accurately by modulating exposure energy. The aperture diameter of the objective lens has a substantial effect on the pattern consistency. The continuously adjustable structural gap widths of 2144 nm, 2158 nm and 1703 nm corresponding to 6, 12, 24 pixels are obtained by varying the exposure energy in the home-built MOPL system. However, the ideal gap structure cannot be obtained only by adjusting the exposure energy when the gap width is small, such as 1 or 2 pixels. Furthermore, we have proposed an alternative way to achieve fine gap structures through the structural decomposition design and precise control of exposure energy in different regions without changing the MOPL optical system. This study would provide a promising protocol for fabricating gap microstructures with controllable configuration using MOPL technique.

Microflow multi-layer diffraction optical element processed by hybrid manufacturing technology

Traditional planar diffractive optical elements (DOEs) are challenged in imaging systems due to diffraction efficiency and chromatic dispersion. In this paper, we have designed a microfluidic diffractive optical element (MFDOE), which is processed by digital micromirror device (DMD) maskless lithography (DMDML) assisted femtosecond laser direct writing (FsLDW). MFDOE is a combination of photoresist-based multi-layer harmonic diffraction surface and liquid, realizing diffraction efficiency of more than 90% in the visible band. And it shows achromatic characteristics in the two bands of 469 nm (±20 nm) and 625 nm (±20 nm). These results show that MFDOE has good imaging performance.

Method for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method

Maskless lithography based on a digital micromirror device (DMD) has the advantages of high process flexibility and a low production cost. However, due to the trade-off relationship between the pixel size and exposure area, it is challenging to achieve high resolutions and high patterning speeds at the same time, which hinders the wider application of this technology in micro- and nano-fabrication processes. In addition, micromirrors in DMDs create pixelated edges that limit the pattern quality. In this paper, we propose a novel DMD maskless lithography method to improve the pattern quality during high-speed continuous patterning by means of pulse exposure and oblique scanning processes. A unique criterion, the pixel occupancy, was devised to determine the parameters related to the pulse exposure and oblique scanning optimally. We also studied how the duty cycle of the pulse exposure affects the pattern quality. As a result, we were able to increase the scanning speed up to the speed limit considering the damage threshold of the DMD and improve the pattern quality by resolving the pixelation problem. We anticipate that this method can be used in various microfabrication fields with short product life cycles or in those that require custom designs, such as the manufacturing of PCBs, MEMS devices, and micro-optics devices, among others.

Rapid trapping and tagging of microparticles in controlled flow by in situ digital projection lithography

Real-time and fast trapping and tagging of microfeatures, such as microparticles and cells, are of great significance for biomedical research. In this work, we propose a novel in situ digital projection lithography technology that integrates real-time, in situ generation of digital masks for particle processing and fluid control into conventional DMD-based projection lithography. With the help of image recognition technology, we rapidly resolve the information of the microparticle profile or channel location, combining the selection of existing masks of different shapes, thus enabling in situ generation of user-customized micro-trap arrays and microfilter arrays for particle trapping and tagging. The success in trapping and filtering single particles, particle arrays, and cells has indicated the promising prospects of this novel technology for broad applications in microfluidics, single-cell analysis, and early-stage disease diagnostics.

Correction of a digital micromirror device lithography system for fabrication of a pixelated liquid crystal micropolarizer array

The combination of a digital micromirror device (DMD) lithography system and a rotatable polarizer provides a simple and convenient method to achieve the pixelated liquid crystal micropolarizer (LCMP) array for polarization imaging. In this paper, two crucial problems restricting the high-precision fabrication of LCMP array are pointed out and settled: the dislocation of LCMP pixels caused by parallelism error of the rotating polarizer and the grid defect caused by the gap between micromirrors. After correction, the maximum deviation of the fabricated LCMP pixels was reduced from 3.23 µm to 0.11 µm and the grid defect is eliminated. The correction method reported here lays a good foundation for the fine processing of liquid crystal devices with arbitrary photoalignment structure by using the DMD system.

Maximizing energy utilization in DMD-based projection lithography

In digital micromirror device (DMD)-based projection photolithography, the throughput largely depends on the effectiveness of the laser energy utilization, which is directly correlated to the diffraction efficiency of DMD. Here, to optimize the DMD diffraction efficiency and thus the laser energy utilization, we calculate the diffraction efficiencies E_diffraction of DMD with various pitch sizes at wavelengths ranging from 200 nm to 800 nm, using the two-dimensional blazed grating diffraction theory. Specifically, the light incident angle is optimized for 343 nm laser and 7.56 μm pitch-size DMD, and the maximum single-order diffraction efficiency E_diffraction is increased from 40% to 96%. Experimentally, we use the effective energy utilization η_eff= E_{diffraction,(m,n)}/Σ[E_{diffraction,(m,n)}] at the entrance pupil plane of the objective to verify the effectiveness of the optimized illumination angle in a lithography illumination system with parallel beams of two wavelengths (343 nm and 515 nm). The η_eff of a "blaze" order at a 34° angle of incidence can be optimized up to 88%. The experimental results are consistent with the tendency of the calculated results, indicating that this optimization model can be used to improve the energy utilization of projection lithography with the arbitrarily designable wavelengths and the DMD's pitch size.

Polarization-modulated grating interferometer by conical diffraction

The grating interferometer in the Littrow configuration uses quarter wave plates (QWPs) to modulate the polarization in the measurement system to determine the autocollimation optical path. Fabrication errors and mounting errors of the QWPs lead to phase changes in the grating interferometer that generate measurement errors. As an alternative, we propose a grating interferometer that produces conical diffraction. Using the grating instead of QWPs to modulate the beam's polarization bypasses this source of error. A 45 mm range experiment was performed that yielded a repeated measurement error of 40 nm. Experiments show that the system has a simple structure and good repeatability and is capable of high-precision displacement measurements.

Measurement and compensation of a stitching error in a DMD-based step-stitching photolithography system

The step-stitching issue occurring in digital micromirror device (DMD)-based step lithography, which refers to overlapping and misalignment, has dramatically influenced the overall accuracy of the exposed patterns. To address this technical challenge, this paper proposes a testing method to resolve the system tolerance parameters, inclination angle with 0.060^∘±0.003^∘, and magnification with 3.60399±0.00020, which induce the stitching problem. With these two parameters, a compensation strategy on motion is implemented to precisely control the step distance of the stage so that the edge-to-edge stitching error is reduced to about 0.150 µm and the corner-to-corner stitching error is less than 0.500 µm. The changes of the linewidth induced by the displacement error due to the stage control accuracy and illumination nonuniformity caused by the light source are simulated and analyzed, and the image preprocessing method based on a gradual grayscale mask is employed to improve the quality of stitching. Using this method, the linewidth difference is controlled to be within 0.150 µm. After finishing all the corrections and imaging preprocessing, the transverse error has become almost invisible, and the longitudinal error has been reduced by 97.72%. Experimental results demonstrate that the improved stitching accuracy could achieve high-fidelity devices.