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For: Fukuda E, Endoh T, Ishikawa T, Izunome K, Kamijo K, Miyashita M, Sakamoto T, Kageshima H. Influence of Oxygen Concentration of Si Wafer Surface in Si Emission on Nano Ordered Three-Dimensional Structure Devices. e-J Surf Sci Nanotech 2017;15:127-34. [DOI: 10.1380/ejssnt.2017.127] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/20/2022]
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Erratum: Influence of Oxygen Concentration of Si Wafer Surface in Si Emission on Nano Ordered Three-Dimensional Structure Devices [e-J. Surf. Sci. Nanotech. Vol. 15, pp. 127-134 (2017)]. E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY 2018. [DOI: 10.1380/ejssnt.2018.375] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/20/2022]
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