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For: Shul RJ, Baca AG, Rieger DJ, Hou H, Pearton SJ, Ren F. Ecr Etching of GaP, GaAs, InP, and InGaAs in Cl2/Ar, Cl2/N2, BCl3/Ar, and BCl3/N2. ACTA ACUST UNITED AC 2011. [DOI: 10.1557/proc-421-245] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022]
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