Water matrix effect on UV photodegradation of perfluorooctanoic acid

Thermal- and photo-induced degradation of perfluorinated carboxylic acids: Kinetics and mechanism

Perfluorinated carboxylic acids (PFCAs) of different carbon chain lengths are chemicals of concern to human health and their removal, using conventional remediation technologies, is challenging. The present paper pursuits thermal and photo-induced degradation of PFCAs (F(CF₂)_nCOOH, n = 1-9) under various concentrations of four different acids (HNO₃, H₂SO₄, HCl, and H₃PO₄) covering a range of strong acidic to basic pH. For thermal-induced experiments, the temperature was set at 40 °C, 60 °C, and 80 °C at acid strengths of 0.04-18.4 M. Photo-induced experiments were conducted at pH 0.5, 7.0, and 13.0 under a light intensity of (150 ± 10) × 100 μW/cm². The degradation first-order rate constant (k_1, h^-1) as a function of [H⁺] was modeled by considering equilibrium of nondissociated (F(CF₂)_nCOOH, HX) and dissociated (F(CF₂)_nCOO^-, X^-) species of PFCAs (HX ⇌ X^- + H⁺, pK_a = -0.1). Species-specific rate constants, k₁^HX, reasonably described the trend of thermal and photo decay of PFCAs, where k₁^HX increased with acidity of solution and the carbon chain length of PFCAs. Mechanism of degradation of PFCAs (e.g. perfluorooctanoic acid (PFOA)) involved homolytic breakage of CC bond between alkyl and carboxyl groups, which produced radicals and subsequently decarboxylation to perfluoroheptene-1. Density functional theory (DFT) calculations supported the mechanism. The calculations indicated that a breaking of CC bond is more feasible with nondissociated HX than dissociated X^- species of PFCAs and also with increase in chain length. The potential of a combination of thermal- and photo-induced processes under acidic conditions to enhance degradation of PFOA in water is presented.

Effects of pH on photochemical decomposition of perfluorooctanoic acid in different atmospheres by 185nm vacuum ultraviolet

Perfluorooctanoic acid (PFOA), a persistent organic pollutant, receives increasing concerns due to its worldwide occurrence and resistance to most conventional treatment processes. The photochemical decomposition by 185nm vacuum ultraviolet (VUV) is one of the efficient methods for PFOA decomposition. The effects of pH on PFOA decomposition in nitrogen atmosphere or oxygen atmosphere were investigated. At its original pH (4.5) of PFOA aqueous solution, PFOA decomposed efficiently both in nitrogen and in oxygen atmosphere. However, when the pH increased to 12.0, PFOA decomposition was greatly inhibited in oxygen atmosphere, while it was greatly accelerated in nitrogen atmosphere with a very short half-life time (9min). Furthermore, fluorine atoms originally contained in PFOA molecules were almost completely transformed into fluoride ions. Two decomposition pathways have been proposed to explain the PFOA decomposition under different conditions. In acidic and neutral solutions, PFOA predominantly decomposes via the direct photolysis in both atmospheres; while in the alkaline solution and in the absence of oxygen, the decomposition of PFOA is mainly induced by hydrated electrons.

Mechanistic modeling of vacuum UV advanced oxidation process in an annular photoreactor

A novel mechanistic model that describes the vacuum UV advanced oxidation process in an annular photoreactor initiated by 172 nm and 185 nm (in combination with 253.7 nm, with and without exogenous H2O2) is presented in this paper. The model was developed from first principles by incorporating the vacuum UV-AOP kinetics into the theoretical framework of in-series continuous flow stirred tank reactors. After conducting a sensitivity analysis, model predictions were compared against experiments conducted under a variety of conditions: (a) photo-induced formation of hydrogen peroxide by water photolysis at 172 nm (for both air- and oxygen-saturated conditions); (b) photo-induced formation of hydrogen peroxide by water photolysis at 185 + 253.7 nm (in the presence of formic acid, with and without the initial addition of hydrogen peroxide); (c) direct photolysis of hydrogen peroxide by 253.7 nm; (d) degradation of formic acid by 185 + 253.7 nm (with and without initial addition of hydrogen peroxide); and (e) degradation of formic acid by 253.7 nm (with the addition of exogenous hydrogen peroxide). In all cases, the model was able to accurately predict the time-dependent profiles of hydrogen peroxide and formic acid concentrations. Two newly recognized aspects associated with water photolysis were identified through the use of the validated model. Firstly, unlike the 185 nm and 253.7 nm cases, water photolysis by the 172 nm wavelength revealed a depth of photoactive water layer an order of magnitude greater (∼230-390 μm, depending on the specific operating conditions) than the 1-log photon penetration layer (∼18 μm). To further investigate this potentially very important finding, a computational fluid dynamics model was set up to assess the role of transport mechanisms and species distributions within the photoreactor annulus. The model confirmed that short-lived hydroxyl radicals were present at a radial distance far beyond the ∼18 μm photon penetration layer. Secondly, kinetic simulations showed that the higher penetration depth of hydroxyl radicals was not caused by diffusive or convective transport phenomena but rather the effect of non-linear behavior of the complex reaction kinetics involved in the process.