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Tarrio C, Grantham S, Hill SB, Faradzhev NS, Richter LJ, Knurek CS, Lucatorto TB. A synchrotron beamline for extreme-ultraviolet photoresist testing. THE REVIEW OF SCIENTIFIC INSTRUMENTS 2011; 82:073102. [PMID: 21806167 DOI: 10.1063/1.3606484] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/31/2023]
Abstract
Before being used in an extreme-ultraviolet (EUV) scanner, photoresists must first be evaluated for sensitivity and tested to ensure that they will not contaminate the scanner optics. The new NIST facility described here provides data on the contamination potential of the outgas products of a candidate resist by simultaneously irradiating a multilayer optic and a nearby resist-coated wafer with EUV radiation. The facility can also be used without changing its configuration to provide accurate resist dose-to-clear measurements. Detailed, real-time information on the rate of contamination growth is given by a unique, in situ imaging ellipsometer. We will describe the optical layout, mechanical design, and capabilities of the beamline, finally presenting experimental examples of its capabilities.
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Affiliation(s)
- C Tarrio
- National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
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Higashino S, Saeki A, Okamoto K, Tagawa S, Kozawa T. Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms. J Phys Chem A 2010; 114:8069-74. [DOI: 10.1021/jp102828g] [Citation(s) in RCA: 20] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Saki Higashino
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan, Faculty of Engineering Hokkaido University, N13, W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan, and CREST-Japan Science and Technology Agency (JST), Saitama 332-0012, Japan
| | - Akinori Saeki
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan, Faculty of Engineering Hokkaido University, N13, W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan, and CREST-Japan Science and Technology Agency (JST), Saitama 332-0012, Japan
| | - Kazumasa Okamoto
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan, Faculty of Engineering Hokkaido University, N13, W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan, and CREST-Japan Science and Technology Agency (JST), Saitama 332-0012, Japan
| | - Seiichi Tagawa
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan, Faculty of Engineering Hokkaido University, N13, W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan, and CREST-Japan Science and Technology Agency (JST), Saitama 332-0012, Japan
| | - Takahiro Kozawa
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan, Faculty of Engineering Hokkaido University, N13, W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan, and CREST-Japan Science and Technology Agency (JST), Saitama 332-0012, Japan
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Ho GH, Shih YH, Kang FH, Hung JC, Shao CH, Lai YH. Photochemistry of photoresists and underlayer materials upon irradiation at 13.5nm. J Photochem Photobiol A Chem 2010. [DOI: 10.1016/j.jphotochem.2010.02.008] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2022]
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