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Suwa M, Okazawa T, Kobayashi H. Siloxane Oligomer with Random Structure for Use in Photosensitive White Decorative Coatings. J PHOTOPOLYM SCI TEC 2021. [DOI: 10.2494/photopolymer.34.517] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Mitsuhito Suwa
- Electronic and Imaging Materials Research Laboratories, Toray Industries, Inc
| | - Toru Okazawa
- Electronic and Imaging Materials Research Laboratories, Toray Industries, Inc
| | - Hideyuki Kobayashi
- Electronic and Imaging Materials Research Laboratories, Toray Industries, Inc
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Nowacka M, Fischer C, Kowalewska A, Hebda M, Hodor K. Thermally induced phenomena leading to degradation of poly(silsesquioxane) materials. Eur Polym J 2017. [DOI: 10.1016/j.eurpolymj.2016.11.015] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/20/2022]
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Nowacka M, Kowalewska A, Makowski T. Structural studies on ladder phenylsilsesquioxane oligomers formed by polycondensation of cyclotetrasiloxanetetraols. POLYMER 2016. [DOI: 10.1016/j.polymer.2016.01.058] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/22/2022]
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