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Fujimori S. The Molded Mask Method: The Origin of Nanoimprint Lithography. J PHOTOPOLYM SCI TEC 2016. [DOI: 10.2494/photopolymer.29.849] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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