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Tango N, Yamamoto K, Shirakawa M, Ou K, Goto A, Fujita M, Shiraishi Y, Fujimori T. Challenges and Progress in Defectivity for Advanced ArF Lithography Process. J PHOTOPOLYM SCI TEC 2019. [DOI: 10.2494/photopolymer.32.445] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Naohiro Tango
- Research & Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation
| | - Kei Yamamoto
- Research & Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation
| | - Michihiro Shirakawa
- Research & Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation
| | - Keiyu Ou
- Research & Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation
| | - Akiyoshi Goto
- Research & Development management headquarters, Synthetic Organic Chemistry Laboratories, FUJIFILM Corporation
| | - Mitsuhiro Fujita
- Research & Development management headquarters, Analysis Technology Center, FUJIFILM Corporation
| | - Yasuharu Shiraishi
- Research & Development management headquarters, Analysis Technology Center, FUJIFILM Corporation
| | - Toru Fujimori
- Research & Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation
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