Single-Mode Polymer Ridge Waveguide Integration of Organic Thin-Film Laser

Overcoming oxygen inhibition in UV photolithography for the fabrication of low-loss polymer waveguides

Perfluorinated acrylate polymer materials exhibit low absorption loss at 1310 and 1550 nm, but molecular oxygen inhibits their photocuring. We propose a novel, to our knowledge, UV photolithography method incorporating a pre-exposure process for fabricating low-loss perfluorinated acrylate polymer waveguides. During the pre-exposure process, a partially cured thin layer forms on the core layer, effectively overcoming oxygen inhibition in subsequent lithography. Furthermore, the functional group contents of the polymerized materials were characterized by a Raman spectrometer to analyze the development reaction under the pre-exposure layer. Utilizing this improved method, we fabricated a straight waveguide with a length of 21 cm. The experiments showed that the propagation losses are 0.14 dB/cm at 1310 nm and 0.51 dB/cm at 1550 nm. The inter-channel cross talk for a core pitch of 250 µm was measured as low as -49 dB at 1310 nm. Error-free NRZ data transmission over this waveguide at 25 Gb/s was achieved, showcasing the potential in optical interconnect and communication applications.

Design and manufacture of an all-polymeric integrated multimode interferometer for visible photonics

This work demonstrates an integrated multimode interferometer (MMI) based on a fully polymeric platform and optimized for visible range operation. The dimensions of a 2×2 MMI are first calculated analytically and simulated using finite elements method. The devices are manufactured using two layers of negative tone photoresists. The top layer is patterned by e-beam lithography demonstrating the adaptability of this material, naturally designed to respond to UV radiation. Fabrication tolerance was smaller than 100 nm. Devices were optically characterized with a 635 nm input source and the best performance for a 3 dB power splitter was found at an interferometric cavity dimension of 10.5 × 190.68 µm. Other interferometric lengths were characterized to establish a process design kit that allows future use of this platform in more complex photonic integrated circuits architectures.

Organic Dye-Doped PMMA Lasing

Organic thin-film lasers gain interest as potential light sources for application in diverse fields. With the current development, they hold variety of benefits such as: low-cost, high-performance, and color-tunability. Meanwhile, the production is not complicated because both the resonator and the gain medium can be assembled by solution-processable organic materials. To our knowledge, information about using poly(methyl methacrylate) (PMMA) as a matrix for organic dye lasers was insubstantial. Herein, the feasibility of using organic dye-doped PMMA as an organic dye laser was tested. Six different sample designs were introduced to find out the best sample model. The most optimum result was displayed by the sample design, in which the gain medium was sandwiched between the substrate and the photoresist layer with grating structure. The impact of dye concentration and grating period on peak wavelength was also investigated, which resulted in a shift of 6 nm and 25 nm, respectively. Moreover, there were in total six various organic dyes that could function well with PMMA to collectively perform as ‘organic dye lasers’, and they emitted in the range of 572 nm to 609 nm. Besides, one of the samples was used as a sensor platform. For instance, it was used to detect the concentration of sugar solutions.