The Phase Evolution and Photocatalytic Properties of a Ti-TiO2 Bilayer Thin Film Prepared Using Thermal Oxidation

Special Issue “Functional Oxide Thin Films and Nanostructures: Growth, Properties, and Applications”

It has been almost three years since we enthusiastically accepted the offer to be guest editors for this Special Issue of Coatings, entitled “Functional Oxide Thin Films and Nanostructures: Growth, Properties, and Applications” [...]

Insight on Photocatalytic and Photoinduced Antimicrobial Properties of ZnO Thin Films Deposited by HiPIMS through Thermal Oxidation

Zinc oxide thin films have been developed through thermal oxidation of Zinc thin films grown by high impulse power magnetron sputtering (HiPIMS). The influence of various sputtering power on thin film structural, morphological, photocatalytic, and antimicrobial properties was investigated. X-ray diffraction (XRD) analysis confirmed that the crystalline phase of ZnO thin films consists of a hexagonal wurtzite structure. Increasing the sputtering power will lead to intrinsic stress on thin films that promote whisker formation. In this study, whiskers were successfully developed on the thin films without precursors/catalysts and not thermally treated over the Zn melting point. This finding showed that the film phase structure and morphology are significantly affected by sputtering power. It was found that ZnO thin films exhibit high photocatalytic performance under UV irradiation (89.91%) of methylene blue after 300 min of irradiation. The antimicrobial activity on ZnO thin films showed significant inhibition activity (p < 0.05) against E. coli, S. aureus, and C. albicans. However, the whisker formation on ZnO thin films is not accessible to enhance photocatalytic and antimicrobial activity. This study demonstrates that the HiPIMS method through the thermal oxidation process can promote a good performance of ZnO thin films as photocatalyst and antimicrobial agents.

A Study on the Characteristic and Antibacterial Activity of Ti3Ox Thin Films

A pure Ti target in Ar/O2 gas mixture was used to synthesize Ti3Ox thin film on a glass substrate by Reactive High-Power Impulse Magnetron Sputtering (HiPIMS) under different sputtering power (2 and 2.5 kW). The influence of HiPIMS parameters on thin films’ structural, morphological, chemical composition, optical and photocatalytic, and antibacterial properties was investigated. In this study, Ti3Ox thin films can be synthesized using the HiPIMS method without the post-annealing process. Two co-existence phases (hexagonal Ti3O and base-centered monoclinic Ti3O5 phases) existed on the Ti3Ox films. It is found that the peak intensity of (006) Ti3O hexagonal slightly increased as the sputtering power increased from 2 to 2.5 kW. The Ti3Ox thin-film bandgap values were 3.36 and 3.50 eV for 2 and 2.5 kW, respectively. The Ti3Ox films deposited at 2.5 kW showed good photocatalytic activity under UV light irradiation, with a higher methylene blue dye degradation rate than TiO2 thin films. The antibacterial study on Ti3Ox thin films exhibited a high inhibition percentage against E. coli and S. aureus. This study demonstrates that Ti3Ox thin films can promote high photocatalytic and antibacterial activity.