Double-Sided Anti-Reflection Nanostructures on Optical Convex Lenses for Imaging Applications

High-Identical Numerical Aperture, Multifocal Microlens Array through Single-Step Multi-Sized Hole Patterning Photolithography

Imaging applications based on microlens arrays (MLAs) have a great potential for the depth sensor, wide field-of-view camera and the reconstructed hologram. However, the narrow depth-of-field remains the challenge for accurate, reliable depth estimation. Multifocal microlens array (Mf-MLAs) is perceived as a major breakthrough, but existing fabrication methods are still hindered by the expensive, low-throughput, and dissimilar numerical aperture (NA) of individual lenses due to the multiple steps in the photolithography process. This paper reports the fabrication method of high NA, Mf-MLAs for the extended depth-of-field using single-step photolithography assisted by chemical wet etching. The various lens parameters of Mf-MLAs are manipulated by the multi-sized hole photomask and the wet etch time. Theoretical and experimental results show that the Mf-MLAs have three types of lens with different focal lengths, while maintaining the uniform and high NA irrespective of the lens type. Additionally, we demonstrate the multi-focal plane image acquisition via Mf-MLAs integrated into a microscope.

Three-Dimensional Grids of Optimized Ti-Compounds on Si for Ultra-Wideband Optical Absorption

Typically, the optical applications of silicon (Si) are limited to wavelengths below ∼1100 nm. However, there is significant research on Si surface modification, which tries to extend the optical properties of Si further into the infrared (IR) region. In this work, we present an ultra-wideband complementary metal-oxide-semiconductor (CMOS)-biocompatible Si-based optical absorber with a hydrophobic surface. It consists of patterned three-dimensional grid-like structures of optimized compounds of titanium (Ti) on n-type Si (n-Si). Here, the Ti-compounds on Si were formed by subsequent deposition of patterned Ti and annealing. Moreover, we have shown that there are two possible Ti-compounds formed on Si, depending on the thickness of Ti deposited and the annealing time. The composition and the corresponding absorbance spectra for the two possibilities of Ti-compounds on n-Si, that is, Ti-O/Ti-O-Si/Ti-Si/n-Si (type 1) and Ti-O/Ti-O-Si/n-Si (type 2), were confirmed using an X-ray photoelectron spectroscopy depth profiler and ultraviolet-visible-near-infrared spectrometer. We also illustrate how type 1 improves the absorption of radiation in the IR region. Further, we experimentally demonstrate that our fabricated absorber has an average reflectance (R) of <25% and an average absorbance of approximately 60% for wavelengths ranging from 200 to 3300 nm. The average % R for wavelengths from 400 to 1500 nm is <10%. The surface hydrophobicity for the fabricated absorbers was confirmed using a water contact angle (WCA) measurement system with WCAs >100°, which makes the surface hydrophobic.

Reversibly Erasable Broadband Omnidirectional Antireflection Coatings Inspired by Inclined Conical Structures on Blue-Tailed Forest Hawk Dragonfly Wings

Blue-tailed forest hawk dragonfly (Orthetrum triangulare) wings, covered with inclined conical structures, are studied for their high transparency and low reflectance for large viewing angles. However, limited by existing technologies, the exquisite inclined structures are not replicated easily or applied adequately. Here, we combine a shear-induced self-assembly approach and a colloidal lithography technology to create omnidirectional antireflection structures that are inspired by dragonfly wings. Nonclose-packed colloid crystals are spin-coated and serve as structural templates in a plasma etching procedure to pattern subwavelength inclined conical structures directly on shape memory polymer-coated substrates. The dependence of the antireflection functionality on the shape and inclination of conical structures is systematically investigated in this research. Compared with a featureless substrate, the structure-covered substrate can display an approximately 8% higher average transmittance in the visible wavelength range at normal incidence and even approximately 23% higher average transmittance as the incident angle increases to 75°. Moreover, the reconfigurable structures composed of shape memory polymers can be repeatedly deformed and recovered as a result of external stimuli at ambient conditions, and the corresponding broadband omnidirectional antireflection functionality is therefore reversibly erased and restored.

Hybrid Nanostructured Antireflection Coating by Self-Assembled Nanosphere Lithography

Broadband antireflection (AR) coatings are essential elements for improving the photocurrent generation of photovoltaic modules or the enhancement of visibility in optical devices. In this paper, we report a hybrid nanostructured antireflection coating combination that is a clean and efficient method for fabricating a nanostructured antireflection coating (ARC). A multilayer thin-film was introduced between the ARC and substrate to solve the significant problem of preparing nanostructured ARCs on different substrates. In this way, we rebuilt a gradient refractive index structure and optimize the antireflective property by simply adjusting the moth-eye structure and multilayers. Subwavelength-structured cone arrays were directly patterned using a self-assembled single-layer polystyrene (PS) nanosphere array as an etching mask. Nanostructure coatings exhibited excellent broadband and wide-angle antireflective properties. The bottom-up preparation process and hybrid structural combination have the potential to significantly enhance the broadband and wide-angle antireflective properties for a number of optical systems that require high transparency, which is promising for reducing the manufacturing cost of nanostructured AR coatings.