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Karadzhov I, Paulillo B, Rombaut J, Koch KW, Mazumder P, Pruneri V. Mechanically-Durable Antireflective Subwavelength Nanoholes on Glass Surfaces Using Lithography-Free Fabrication. ACS APPLIED MATERIALS & INTERFACES 2024; 16:19672-19680. [PMID: 38576132 DOI: 10.1021/acsami.3c15391] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/06/2024]
Abstract
Traditional multilayer antireflection (AR) surfaces are of significant importance for numerous applications, such as laser optics, camera lenses, and eyeglasses. Recently, technological advances in the fabrication of biomimetic AR surfaces capable of delivering broadband omnidirectional high transparency combined with self-cleaning properties have opened an alternative route toward realization of multifunctional surfaces which would be beneficial for touchscreen displays or solar harvesting devices. However, achieving the desired surface properties often requires sophisticated lithography fabrication methods consisting of multiple steps. In the present work, we show the design and implementation of mechanically robust AR surfaces fabricated by a lithography-free process using thermally dewetted silver as an etching mask. Both-sided nanohole (NH) surfaces exhibit transmittance above 99% in the visible or the near-infrared ranges combined with improved angular response at an angle of incidence of up to θi = 60°. Additionally, the NHs demonstrate excellent mechanical resilience against repeated abrasion with cheesecloth due to favorable redistribution of the shearing mechanical forces, making them a viable option for touchscreen display applications.
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Affiliation(s)
- Iliyan Karadzhov
- ICFO-Institut de Ciéncies Fotóniques, Castelldefels, 08860 Barcelona, Spain
| | - Bruno Paulillo
- ICFO-Institut de Ciéncies Fotóniques, Castelldefels, 08860 Barcelona, Spain
| | - Juan Rombaut
- ICFO-Institut de Ciéncies Fotóniques, Castelldefels, 08860 Barcelona, Spain
| | - Karl W Koch
- Corning Research and Development Corporation, Sullivan Park, Corning, New York 14831, United States
| | - Prantik Mazumder
- Corning Research and Development Corporation, Sullivan Park, Corning, New York 14831, United States
| | - Valerio Pruneri
- ICFO-Institut de Ciéncies Fotóniques, Castelldefels, 08860 Barcelona, Spain
- ICREA-Institució Catalana de Recerca i Estudis Avançats, 08010 Barcelona, Spain
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Schmelz D, Jia G, Käsebier T, Plentz J, Zeitner UD. Antireflection Structures for VIS and NIR on Arbitrarily Shaped Fused Silica Substrates with Colloidal Polystyrene Nanosphere Lithography. MICROMACHINES 2023; 14:1204. [PMID: 37374789 DOI: 10.3390/mi14061204] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/30/2023] [Revised: 06/01/2023] [Accepted: 06/04/2023] [Indexed: 06/29/2023]
Abstract
Antireflective (AR) nanostructures offer an effective, broadband alternative to conventional AR coatings that could be used even under extreme conditions. In this publication, a possible fabrication process based on colloidal polystyrene (PS) nanosphere lithography for the fabrication of such AR structures on arbitrarily shaped fused silica substrates is presented and evaluated. Special emphasis is placed on the involved manufacturing steps in order to be able to produce tailored and effective structures. An improved Langmuir-Blodgett self-assembly lithography technique enabled the deposition of 200 nm PS spheres on curved surfaces, independent of shape or material-specific characteristics such as hydrophobicity. The AR structures were fabricated on planar fused silica wafers and aspherical planoconvex lenses. Broadband AR structures with losses (reflection + transmissive scattering) of <1% per surface in the spectral range of 750-2000 nm were produced. At the best performance level, losses were less than 0.5%, which corresponds to an improvement factor of 6.7 compared to unstructured reference substrates.
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Affiliation(s)
- David Schmelz
- Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, 07743 Jena, Germany
| | - Guobin Jia
- Leibniz Institute of Photonic Technology (Leibniz-IPHT), 07745 Jena, Germany
| | - Thomas Käsebier
- Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, 07743 Jena, Germany
| | - Jonathan Plentz
- Leibniz Institute of Photonic Technology (Leibniz-IPHT), 07745 Jena, Germany
| | - Uwe Detlef Zeitner
- Fraunhofer Institute for Applied Optics and Precision Engineering IOF, 07745 Jena, Germany
- Department of Applied Sciences and Mechatronics, Munich University of Applied Sciences, 80335 Munich, Germany
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Ali A, El-Mellouhi F, Mitra A, Aïssa B. Research Progress of Plasmonic Nanostructure-Enhanced Photovoltaic Solar Cells. NANOMATERIALS 2022; 12:nano12050788. [PMID: 35269276 PMCID: PMC8912550 DOI: 10.3390/nano12050788] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/28/2021] [Revised: 02/02/2022] [Accepted: 02/11/2022] [Indexed: 02/01/2023]
Abstract
Enhancement of the electromagnetic properties of metallic nanostructures constitute an extensive research field related to plasmonics. The latter term is derived from plasmons, which are quanta corresponding to longitudinal waves that are propagating in matter by the collective motion of electrons. Plasmonics are increasingly finding wide application in sensing, microscopy, optical communications, biophotonics, and light trapping enhancement for solar energy conversion. Although the plasmonics field has relatively a short history of development, it has led to substantial advancement in enhancing the absorption of the solar spectrum and charge carrier separation efficiency. Recently, huge developments have been made in understanding the basic parameters and mechanisms governing the application of plasmonics, including the effects of nanoparticles’ size, arrangement, and geometry and how all these factors impact the dielectric field in the surrounding medium of the plasmons. This review article emphasizes recent developments, fundamentals, and fabrication techniques for plasmonic nanostructures while investigating their thermal effects and detailing light-trapping enhancement mechanisms. The mismatch effect of the front and back light grating for optimum light trapping is also discussed. Different arrangements of plasmonic nanostructures in photovoltaics for efficiency enhancement, plasmonics’ limitations, and modeling performance are also deeply explored.
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Affiliation(s)
- Adnan Ali
- Qatar Environment and Energy Research Institute (QEERI), Hamad Bin Khalifa University (HBKU), Qatar Foundation, Doha P.O. Box 34110, Qatar; (A.A.); (F.E.-M.)
| | - Fedwa El-Mellouhi
- Qatar Environment and Energy Research Institute (QEERI), Hamad Bin Khalifa University (HBKU), Qatar Foundation, Doha P.O. Box 34110, Qatar; (A.A.); (F.E.-M.)
| | - Anirban Mitra
- Department of Physics, Indian Institute of Technology Roorkee, Roorkee 247667, India;
| | - Brahim Aïssa
- Qatar Environment and Energy Research Institute (QEERI), Hamad Bin Khalifa University (HBKU), Qatar Foundation, Doha P.O. Box 34110, Qatar; (A.A.); (F.E.-M.)
- Correspondence: or
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Lee D, Hsu MY, Tang YL, Liu SJ. Manufacture of Binary Nanofeatured Polymeric Films Using Nanosphere Lithography and Ultraviolet Roller Imprinting. MATERIALS 2021; 14:ma14071669. [PMID: 33805269 PMCID: PMC8037049 DOI: 10.3390/ma14071669] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/18/2021] [Revised: 03/26/2021] [Accepted: 03/26/2021] [Indexed: 11/16/2022]
Abstract
This paper describes the manufacture of binary nanostructured films utilizing nanosphere lithography and ultraviolet (UV) roller imprinting. To manufacture the binary nanofeatured template, polystyrene nanocolloids of two distinct dimensions (900 and 300 nm) were primarily self-assembly spun coated on a silicon substrate. A roller imprinting facility equipped with polydimethylsiloxane molds and ultraviolet radiation was employed. During the imprinting procedure, the roller was steered by a motor and compressed the ultraviolet-curable polymeric layer against the glass substrate, where the nanofeatured layer was cured by the UV light source. Binary nanofeatured films were thus obtained. The influence of distinct processing variables on the imprinting of nanofeatured films was investigated. The empirical data suggested that with appropriate processing conditions, binary nanofeatured plastic films can be satisfactorily manufactured. It also demonstrated that roller imprinting combined with ultraviolet radiation can offer an easy yet effective method to prepare binary nanofeatured films, with a miniatured processing time and enhanced part quality.
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Affiliation(s)
- Demei Lee
- Department of Mechanical Engineering, Chang Gung University, Taoyuan 33302, Taiwan; (D.L.); (M.-Y.H.); (Y.-L.T.)
| | - Ming-Yi Hsu
- Department of Mechanical Engineering, Chang Gung University, Taoyuan 33302, Taiwan; (D.L.); (M.-Y.H.); (Y.-L.T.)
- Department of Medical Imaging and Intervention, Chang Gung Memorial Hospital-Linkou, Taoyuan 33305, Taiwan
- Department of Diagnostic Radiology, Chang Gung Memorial Hospital-Keelung, Keelung 20401, Taiwan
| | - Ya-Ling Tang
- Department of Mechanical Engineering, Chang Gung University, Taoyuan 33302, Taiwan; (D.L.); (M.-Y.H.); (Y.-L.T.)
| | - Shih-Jung Liu
- Department of Mechanical Engineering, Chang Gung University, Taoyuan 33302, Taiwan; (D.L.); (M.-Y.H.); (Y.-L.T.)
- Bone and Joint Research Center, Department of Orthopedic Surgery, Chang Gung Memorial Hospital-Linkou, Taoyuan 33305, Taiwan
- Correspondence: ; Tel.: +886-3-211-8166; Fax: +886-3-211-8558
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Yano T, Sugawara H, Taniguchi J. Moth-eye structured mold using sputtered glassy carbon layer for large-scale applications. MICRO AND NANO ENGINEERING 2020. [DOI: 10.1016/j.mne.2020.100077] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/26/2022]
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Effect of Urethane Crosslinking by Blocked Isocyanates with Pyrazole-Based Blocking Agents on Rheological and Mechanical Performance of Clearcoats. COATINGS 2020. [DOI: 10.3390/coatings10100961] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Abstract
A novel blocked isocyanate crosslinker was synthesized, and its applicability was investigated for the low-temperature curing of automotive clearcoats. Various pyrazole derivatives were prepared as blocking agents in isocyanate crosslinkers, which strongly affect the deblocking and curing properties of the urethane-bonded coating systems. The thermal curing properties of clearcoat samples containing a pyrazole-based blocked isocyanate crosslinker and polyol resin were characterized under two different temperature conditions (120 and 150 °C). The decrease in the amount of hydroxyl groups in the polyol before and after curing was expressed by the change in OH stretching frequency in the Fourier transform infrared (FT-IR) spectra. The real-time rheological storage moduli of the bulk clearcoat mixtures were measured via a rotational rheometer to determine the effect of pyrazole-based blocking agents on the curing dynamics. In addition, a rigid-body pendulum tester (RPT) was employed to investigate the curing behavior in the thin film form. The nano-indentation and the nano-scratch tests were conducted to examine the surface hardness and scratch resistance characteristics of the cured clearcoat films. The results show that a low-temperature curing system of clearcoats can be realized by tuning the curing temperature and reactivity of isocyanate crosslinkers blocked with pyrazole-based substituents.
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Plasma-Polymer-Fluorocarbon Thin Film Coated Nanostructured-Polyethylene Terephthalate Surface with Highly Durable Superhydrophobic and Antireflective Properties. Polymers (Basel) 2020; 12:polym12051026. [PMID: 32370004 PMCID: PMC7285045 DOI: 10.3390/polym12051026] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/29/2020] [Revised: 04/17/2020] [Accepted: 04/24/2020] [Indexed: 11/17/2022] Open
Abstract
Herein, an antireflection and superhydrophobic film was obtained by uniformly forming nanostructures on the surface of polyethylene terephthalate (PET) substrate using oxygen plasma without a pattern mask and coating plasma-polymer-fluorocarbon (PPFC) on the nanostructured surface by mid-range frequency sputtering. PPFC/nanostructured-PET showed a reflectance of 4.2%, which is 56% lower than that of the PET film. Haze was also improved. Nanostructured-PET exhibited a superhydrophilic surface due to plasma deformation and a superhydrophobic surface could be realized by coating PPFC on the nanostructured surface. The PPFC coating prevented the aging of polymer film nanostructures and showed excellent durability in a high-temperature and high-humidity environment. It exhibited excellent flexibility to maintain the superhydrophobic surface, even at a mechanical bending radius of 1 mm, and could retain its properties even after repeated bending for 10,000 times.
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