The Effect of Cathodic Arc Guiding Magnetic Field on the Growth of (Ti0.36Al0.64)N Coatings

Simulation of Magnetic-Field-Induced Ion Motion in Vacuum Arc Deposition for Inner Surfaces of Tubular Workpiece

A simulation of magnetic-field-induced ion motion in vacuum arc deposition for the inner surfaces of a tubular workpiece was performed. An auxiliary magnetic field was set to guide the motion of ions inside a pipe, with different magnetic flux densities and ion emission parameters. The results showed the trajectories, deposition ratio and depth of the ions can be controlled via a magnetic field. Within a certain range, the deposition ratio of the ions increases with magnetic flux density. When the magnetic flux density reached a certain value, both the trajectories and deposition ratio of the ions exhibited an obvious periodicity. The depth at which the ions were deposited decreased as an exponential function of the magnetic flux density and ion emission radius, respectively. With an increase in the emission angle, the deposition depth decreased linearly. A numerical model was proposed to express the distribution of the deposition depth. In addition, the deposition ratio and depth are improved with a magnetic field in an environment with a certain density of neutral gas.