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For: Jo JW, Kang J, Kim KT, Kang SH, Shin JC, Shin SB, Kim YH, Park SK. Nanocluster-Based Ultralow-Temperature Driven Oxide Gate Dielectrics for High-Performance Organic Electronic Devices. Materials (Basel) 2020;13:ma13235571. [PMID: 33297380 PMCID: PMC7730230 DOI: 10.3390/ma13235571] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/05/2020] [Revised: 11/28/2020] [Accepted: 12/04/2020] [Indexed: 01/13/2023]

For:	Jo JW, Kang J, Kim KT, Kang SH, Shin JC, Shin SB, Kim YH, Park SK. Nanocluster-Based Ultralow-Temperature Driven Oxide Gate Dielectrics for High-Performance Organic Electronic Devices. Materials (Basel) 2020;13:ma13235571. [PMID: 33297380 PMCID: PMC7730230 DOI: 10.3390/ma13235571] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/05/2020] [Revised: 11/28/2020] [Accepted: 12/04/2020] [Indexed: 01/13/2023]

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(The first 100,000 artilces are displayed in RCA.)