Towards Scalable Large-Area Pulsed Laser Deposition

A practical guide to pulsed laser deposition

Nanoscale thin films are widely implemented across a plethora of technological and scientific areas, and form the basis for many advancements that have driven human progress, owing to the high degree of functional tunability based on the chemical composition. Pulsed laser deposition is one of the multiple physical vapour deposition routes to fabricate thin films, employing laser energy to eject material from a target in the form of a plasma. A substrate, commonly a single-crystal oxide, is placed in the path of the plume and acts as a template for the arriving species from the target to coalesce and self-assemble into a thin film. This technique is tremendously useful to produce crystalline films, due to the wide range of atmospheric conditions and the extent of possible chemical complexity of the target. However, this flexibility results in a high degree of complexity, oftentimes requiring rigorous optimisation of the growth parameters to achieve high quality crystalline films with desired composition. In this tutorial review, we aim to reduce the complexity and the barrier to entry for the controlled growth of complex oxides by pulsed laser deposition. We present an overview of the fundamental and practical aspects of pulsed laser deposition, discuss the consequences of tailoring the growth parameters on the thin film properties, and describe in situ monitoring techniques that are useful in gaining a deeper understanding of the properties of the resultant films. Particular emphasis is placed on the general relationships between the growth parameters and the consequent structural, chemical and functional properties of the thin films. In the final section, we discuss the open questions within the field and possible directions to further expand the utility of pulsed laser deposition.

PLD plasma plume analysis: a summary of the PSI contribution

We report on the properties of laser-induced plasma plumes generated by ns pulsed excimer lasers as used for pulsed laser deposition to prepare thin oxide films. A focus is on the time and spatial evolution of chemical species in the plasma plume as well as the mechanisms related to the plume expansion. The overall dynamics of such a plume is governed by the species composition in particular if three or more elements are involved. We studied the temporal evolution of the plume, the composition of the chemical species in the plasma, as well as their electric charge. In particular, ionized species can have an important influence on film growth. Likewise, the different oxygen sources contributing to the overall oxygen content of an oxide film are presented and discussed. Important for the growth of oxide thin films is the compositional transfer of light element such as oxygen or Li. We will show and discuss how to monitor these light elements using plasma spectroscopy and plasma imaging and outline some consequences of our experimental results.

SUPPLEMENTARY INFORMATION

The online version contains supplementary material available at 10.1007/s00339-023-06408-4.

SAW Hydrogen Sensors with Pd/SnO2 Layers

Pd/SnO₂ bilayers for surface acoustic wave (SAW) sensors were obtained using pulsed laser deposition (PLD). Bilayers were made at several deposition pressures in order to observe the influence of the morphology of the sensitive films on the response of the sensors. The morphological properties were analyzed by scanning electron microscopy (SEM). The SnO₂ monolayers were initially deposited on quartz substrates at 100, 400 and 700 mTorr, to observe their morphology at these pressures. The Pd/SnO₂ bilayer depositions were made at 100 and 700 mTorr. The sensors realized with these sensitive films were tested at different hydrogen concentrations, in the range of 0.2-2%, at room temperature. In order to establish selectivity, tests for hydrogen, nitrogen, oxygen and carbon dioxide were carried out with SnO₂-700, Pd-100/SnO₂-700 and Pd-700/SnO₂-700 sensors. The sensor with the most porous sensitive film (both films deposited at 700 mTorr) had the best results: a sensitivity of 0.21 Hz/ppm and a limit of detection (LOD) of 142 ppm. The morphology of the SnO₂ film is the one that has the major influence on the sensor results, to the detriment of the Pd morphology. The use of Pd as a catalyst for hydrogen improved the sensitivity of the film considerably and the selectivity of the sensors for hydrogen.

On the Deposition Process of Ceramic Layer Thin Films for Low-Carbon Steel Pipe Protection

Ceramic thin films with variable thicknesses have been used in many applications. In order to protect the petroleum transportation pipes against the harmful H₂S action, two ceramic materials as thin layers are proposed. In this article, pulsed laser deposition (PLD) of ceramic layers by in situ time-resolved optical techniques is investigated. Two ceramic materials were used as targets and real-time monitoring of the PLD process was realized via ICCD fast camera imaging and optical emission spectroscopy. The space–time displacement of the ceramic emissions was analyzed in order to determine the plasma structure and respective kinetic energies. Spectral-resolved investigation allowed the determination of plasma species individual velocities (in the first case: 43 km/s for C ionic species, 11 km/s for Si, from 25 to 5 km/s for atomic species; in the second case: 32 km/s for C ionic species, 11 km/s for W species, and 15 and 53 km/s for neutral species). SEM and AFM techniques were implemented to analyze the resulting ceramic layers showing homogeneous surfaces with characteristic material droplets. The ablation crater also reveals selective ablation during the deposition process. EDX results show that Al/Si is retained in the thin films similar to the target composition.

On the Dynamics of Transient Plasmas Generated by Nanosecond Laser Ablation of Several Metals

The dynamics of transient plasma generated by UV ns-laser ablation of selected metals (Co, Cu, Ag, Bi) were investigated by the Langmuir Probe method in angle- and time-resolved modes. Multiple ionic and electronic structures were seen for all plasmas with some corresponding to anions or nanoparticle-dominated structures. The addition of an Ar atmosphere energetically confined the plasma and increased the charge density by several orders of magnitude. For pressure ranges exceeding 0.5 Pa fast ions were generated in the plasma as a result of Ar ionization and acceleration in the double layer defining the front of the plasma plume. Several correlations between the target nature plasma properties were attempted. The individual plasma structure expansion velocity increases with the melting point and decreases with the atomic mass while the corresponding charged particle densities decrease with the melting point, evidencing the relationship between the volatility of the sample and the overall abated mass.