Strained Silicon Photonics

Surface acoustic waves for acousto-optic modulation in buried silicon nitride waveguides

We theoretically investigate the use of Rayleigh surface acoustic waves (SAWs) for refractive index modulation in optical waveguides consisting of amorphous dielectrics. Considering low-loss Si₃N₄ waveguides with a standard core cross-section of 4.4×0.03 μm² size, buried 8-μm deep in a SiO₂ cladding, we compare surface acoustic wave generation in various different geometries via a piezo-active, lead zirconate titanate film placed on top of the surface and driven via an interdigitized transducer (IDT). Using numerical solutions of the acoustic and optical wave equations, we determine the strain distribution of the SAW under resonant excitation. From the overlap of the acoustic strain field with the optical mode field, we calculate and maximize the attainable amplitude of index modulation in the waveguide. For the example of a near-infrared wavelength of 840 nm, a maximum shift in relative effective refractive index of 0.7x10^-3 was obtained for TE polarized light, using an IDT period of 30-35 μm, a film thickness of 2.5-3.5 μm, and an IDT voltage of 10 V. For these parameters, the resonant frequency is in the range of 70-85 MHz. The maximum shift increases to 1.2x10^-3, with a corresponding resonant frequency of 87 MHz, when the height of the cladding above the core is reduced to 3 μm. The relative index change is about 300 times higher than in previous work based on non-resonant proximity piezo-actuation, and the modulation frequency is about 200 times higher. Exploiting the maximum relative index change of 1.2×10^-3 in a low-loss, balanced Mach-Zehnder modulator should allow full-contrast modulation in devices as short as 120 μm (half-wave voltage length product = 0.24 Vcm).

Second-order nonlinear optical properties of eight-membered centrosymmetric cyclic borasiloxanes

SHG efficiencies of eight-membered centrosymmetric cyclic borasiloxanes arise form distorted silicon atom, strong electron withdrawing group and non-covalent interactions in crystal packing.

On the influence of interface charging dynamics and stressing conditions in strained silicon devices

The performance of strained silicon devices based on the deposition of a top silicon nitride layer with high stress have been thoroughly analyzed by means of simulations and experimental results. Results clearly indicate that the electro-optic static response is basically governed by carrier effects. A first evidence is the appearance of a variable optical absorption with the applied voltage that should not occur in case of having a purely electro-optic Pockels effect. However, hysteresis and saturation effects are also observed. We demonstrate that such effects are mainly due to the carrier trapping dynamics at the interface between the silicon and the silicon nitride and their influence on the silicon nitride charge. This theory is further confirmed by analyzing identical devices but with the silicon nitride cladding layer optimized to have intrinsic stresses of opposite sign and magnitude. The latter is achieved by a post annealing process which produces a defect healing and consequently a reduction of the silicon nitride charge. Raman measurements are also carried out to confirm the obtained results.

Wavelength dependence of Pockels effect in strained silicon waveguides

We investigate the influence of the wavelength, within the 1.3μm-1.63μm range, on the second-order optical nonlinearity in silicon waveguides strained by a silicon nitride (Si₃N ₄) overlayer. The effective second-order optical susceptibility χxxy(2)¯ evolutions have been determined for 3 different waveguide widths 385 nm, 435 nm and 465 nm and it showed higher values for longer wavelengths and narrower waveguides. For wWG = 385 nm and λ = 1630 nm, we demonstrated χxxy(2)¯ as high as 336 ± 30 pm/V. An explanation based on the strain distribution within the waveguide and its overlap with optical mode is then given to justify the obtained results.

Electro-optic light modulation and THz generation in locally plasma-activated silicon nanophotonic devices

Silicon is not an electro-optic material by itself but the required second-order optical nonlinearity can be induced by breaking the inversion symmetry of the crystal lattice. Recently, an attractive approach has been demonstrated based on a surface-activation in a CMOS-compatible HBr dry etching process. In this work, we further investigate and quantify the second-order nonlinearity induced by this process. Using THz near-field probing we demonstrate that this simple and versatile process can be applied to locally equip silicon nanophotonic chips with micro-scale areas of electro-optic activity. The realization of a first fully integrated Mach-Zehnder modulator device - based on this process - is applied to quantify the nonlinearity to an effective χ((2)) of 9 ± 1 pm/V. Analysis of the thermal stability of the induced nonlinearity reveals post-processing limitations and paths for further efficiency improvements.

Investigation of local strain distribution and linear electro-optic effect in strained silicon waveguides

We present detailed investigations of the local strain distribution and the induced second-order optical nonlinearity within strained silicon waveguides cladded with a Si₃N₄ strain layer. Micro-Raman Spectroscopy mappings and electro-optic characterization of waveguides with varying width w(WG) show that strain gradients in the waveguide core and the effective second-order susceptibility χ(2)(yyz) increase with reduced w(WG). For 300 nm wide waveguides a mean effective χ(2)(yyz) of 190 pm/V is achieved, which is the highest value reported for silicon so far. To gain more insight into the origin of the extraordinary large optical second-order nonlinearity of strained silicon waveguides numerical simulations of edge induced strain gradients in these structures are presented and discussed.

Strain induced bandgap and refractive index variation of silicon

We present a study of the influence of high strain on the bandgap and the refractive index of silicon. The results of photoluminescence show that with the strain applied, the silicon bandgap can be adjusted to 0.84 eV and the refractive index of silicon increases significantly. 1.4% change of refractive index of silicon was observed. The strain-induced bandgap shrinkage and absorption coefficient change of silicon are considered as the main cause of the significant refractive index change. The present work indicates that the application of strain is promising to control the refractive index of silicon in devices so that applications such as compensation of thermal effect in optical devices can be achieved.