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For: Ryu H, Kim S. Irregular Resistive Switching Behaviors of Al2O3-Based Resistor with Cu Electrode. Metals 2021;11:653. [DOI: 10.3390/met11040653] [Citation(s) in RCA: 11] [Impact Index Per Article: 3.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/23/2023]
Number Cited by Other Article(s)
1
Panisilvam J, Lee HY, Byun S, Fan D, Kim S. Two-dimensional material-based memristive devices for alternative computing. NANO CONVERGENCE 2024;11:25. [PMID: 38937391 PMCID: PMC11211314 DOI: 10.1186/s40580-024-00432-7] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/01/2024] [Accepted: 06/14/2024] [Indexed: 06/29/2024]
2
Machine Learning Methods and Sustainable Development: Metal Oxides and Multilayer Metal Oxides. METALS 2022. [DOI: 10.3390/met12050836] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/25/2022]
3
Multi-Level Resistive Switching of Pt/HfO2/TaN Memory Device. METALS 2021. [DOI: 10.3390/met11121885] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
4
Demonstration of Threshold Switching and Bipolar Resistive Switching in Ag/SnOx/TiN Memory Device. METALS 2021. [DOI: 10.3390/met11101605] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/24/2023]
5
Volatile Resistive Switching Characteristics of Pt/HfO2/TaOx/TiN Short-Term Memory Device. METALS 2021. [DOI: 10.3390/met11081207] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/01/2023]
6
Gradually Modified Conductance in the Self-Compliance Region of an Atomic-Layer-Deposited Pt/TiO2/HfAlOx/TiN RRAM Device. METALS 2021. [DOI: 10.3390/met11081199] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/02/2023]
7
Improved Synaptic Device Properties of HfAlOx Dielectric on Highly Doped Silicon Substrate by Partial Reset Process. METALS 2021. [DOI: 10.3390/met11050772] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
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