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For: Ryu H, Kim S. Volatile Resistive Switching Characteristics of Pt/HfO2/TaOx/TiN Short-Term Memory Device. Metals 2021;11:1207. [DOI: 10.3390/met11081207] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/01/2023]
Number Cited by Other Article(s)
1
Machine Learning Methods and Sustainable Development: Metal Oxides and Multilayer Metal Oxides. METALS 2022. [DOI: 10.3390/met12050836] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/25/2022]
2
Multi-Level Resistive Switching of Pt/HfO2/TaN Memory Device. METALS 2021. [DOI: 10.3390/met11121885] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
3
Demonstration of Threshold Switching and Bipolar Resistive Switching in Ag/SnOx/TiN Memory Device. METALS 2021. [DOI: 10.3390/met11101605] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/24/2023]
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