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Qin M, Zhao X, Fan H, Leng R, Yu Y, Li A, Gao B. Ultrafast Laser Processing for High-Aspect-Ratio Structures. NANOMATERIALS (BASEL, SWITZERLAND) 2024; 14:1428. [PMID: 39269090 PMCID: PMC11396894 DOI: 10.3390/nano14171428] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/30/2024] [Revised: 08/23/2024] [Accepted: 08/27/2024] [Indexed: 09/15/2024]
Abstract
Over the past few decades, remarkable breakthroughs and progress have been achieved in ultrafast laser processing technology. Notably, the remarkable high-aspect-ratio processing capabilities of ultrafast lasers have garnered significant attention to meet the stringent performance and structural requirements of materials in specific applications. Consequently, high-aspect-ratio microstructure processing relying on nonlinear effects constitutes an indispensable aspect of this field. In the paper, we review the new features and physical mechanisms underlying ultrafast laser processing technology. It delves into the principles and research achievements of ultrafast laser-based high-aspect-ratio microstructure processing, with a particular emphasis on two pivotal technologies: filamentation processing and Bessel-like beam processing. Furthermore, the current challenges and future prospects for achieving both high precision and high aspect ratios simultaneously are discussed, aiming to provide insights and directions for the further advancement of high-aspect-ratio processing.
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Affiliation(s)
- Muyang Qin
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
| | - Xinjing Zhao
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
| | - Hanyue Fan
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
| | - Ruizhe Leng
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
| | - Yanhao Yu
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
| | - Aiwu Li
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
| | - Bingrong Gao
- State Key Laboratory of Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun 130012, China
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Laser nano-filament explosion for enabling open-grating sensing in optical fibre. Nat Commun 2021; 12:6344. [PMID: 34732710 PMCID: PMC8566495 DOI: 10.1038/s41467-021-26671-4] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/25/2021] [Accepted: 10/15/2021] [Indexed: 11/08/2022] Open
Abstract
Embedding strong photonic stopbands into traditional optical fibre that can directly access and sense the outside environment is challenging, relying on tedious nano-processing steps that result in fragile thinned fibre. Ultrashort-pulsed laser filaments have recently provided a non-contact means of opening high-aspect ratio nano-holes inside of bulk transparent glasses. This method has been extended here to optical fibre, resulting in high density arrays of laser filamented holes penetrating transversely through the silica cladding and guiding core to provide high refractive index contrast Bragg gratings in the telecommunication band. The point‐by‐point fabrication was combined with post-chemical etching to engineer strong photonic stopbands directly inside of the compact and flexible fibre. Fibre Bragg gratings with sharply resolved π-shifts are presented for high resolution refractive index sensing from \documentclass[12pt]{minimal}
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\begin{document}$${n}_{{{{{{\rm{H}}}}}}}$$\end{document}nH = 1 to 1.67 as the nano-holes were readily wetted and filled with various solvents and oils through an intact fibre cladding. Engineered stop bands to sense an ambient environment can enable many applications. Here, the authors demonstrate well-controlled processes to open high-aspect ratio nanoholes through optical fibre for Bragg gratings in the telecomm spectrum and to enable high-resolution refractive index sensing
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Wang X, Zhang G, Li G, Lou R, Sun Z, Xie X, Li W, Cheng G. Effects of CeO 2 and Sb 2O 3 on the Nonlinear Photochemical Process in Ultrashort Laser Gaussian-Bessel Beams Irradiated Photo-Thermo-Refractive Glass. MICROMACHINES 2021; 12:mi12060615. [PMID: 34073636 PMCID: PMC8229932 DOI: 10.3390/mi12060615] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/31/2021] [Revised: 05/25/2021] [Accepted: 05/25/2021] [Indexed: 11/16/2022]
Abstract
Microfluidic chips and optical elements can be fabricated based on the nonlinear photosensitivity in photo-thermo-refractive (PTR) glass by controlling the growth of nanocrystals in the femtosecond (fs) laser-irradiated region. Here, we focus on CeO2 and Sb2O3 that play important roles in UV irradiation, experimentally investigate the effects of the dopants on the nonlinear photochemical process in PTR glass triggered by fs Gaussian-Bessel beams. The results show that the generation of Ag0 atoms and the Ag nanoparticles can be improved by CeO2 and Sb2O3 co-doping. Besides, each multivalent ion in PTR glass possibly participates in the electron transfer processes and contributes to the generation of Ag0 atoms. Finally, X-ray diffraction analysis reveals the precipitation of NaF nanocrystals with an average size of 10 to 12 nm after laser irradiation and thermal treatment, which is unrelated to the dopants.
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Affiliation(s)
- Xu Wang
- State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics of CAS, Xi’an 710119, China; (X.W.); (G.L.); (R.L.); (X.X.)
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Guodong Zhang
- Electronic Information College, Northwestern Polytechnical University, Xi’an 710072, China;
| | - Guangying Li
- State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics of CAS, Xi’an 710119, China; (X.W.); (G.L.); (R.L.); (X.X.)
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Rui Lou
- State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics of CAS, Xi’an 710119, China; (X.W.); (G.L.); (R.L.); (X.X.)
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Zhe Sun
- Abbe Center of Photonics, Institute of Optics and Quantum Electronics, Friedrich Schiller University, Max Wien Platz 1, 07743 Jena, Germany;
| | - Xiaoping Xie
- State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics of CAS, Xi’an 710119, China; (X.W.); (G.L.); (R.L.); (X.X.)
- University of Chinese Academy of Sciences, Beijing 100049, China
| | - Weinan Li
- State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics of CAS, Xi’an 710119, China; (X.W.); (G.L.); (R.L.); (X.X.)
- Correspondence: (W.L.); (G.C.)
| | - Guanghua Cheng
- Electronic Information College, Northwestern Polytechnical University, Xi’an 710072, China;
- Correspondence: (W.L.); (G.C.)
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Zou Z, Guo Z, Huang Q, Yue T, Liu J, Chen X. Precision EDM of Micron-Scale Diameter Hole Array Using in-Process Wire Electro-Discharge Grinding High-Aspect-Ratio Microelectrodes. MICROMACHINES 2020; 12:mi12010017. [PMID: 33375306 PMCID: PMC7823375 DOI: 10.3390/mi12010017] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/14/2020] [Revised: 12/16/2020] [Accepted: 12/23/2020] [Indexed: 11/16/2022]
Abstract
Micro-electrical discharge machining (micro-EDM) is a good candidate for processing micro-hole arrays, which are critical features of micro-electro-mechanical systems (MEMS), diesel injector nozzles, inkjet printheads and turbine blades, etc. In this study, the wire vibration of the wire electro-discharge grinding (WEDG) system has been analyzed theoretically, and, accordingly, an improved WEDG method was developed to fabricate micron-scale diameter and high-aspect-ratio microelectrodes for the in-process micro-EDM of hole array with hole diameter smaller than 20 μm. The improved method has a new feature of a positioning device to address the wire vibration problem, and thus to enhance microelectrodes fabrication precision. Using this method, 14 μm diameter microelectrodes with less than 0.4 μm deviation and an aspect ratio of 142, which is the largest aspect ratio ever reported in the literature, were successfully fabricated. These microelectrodes were then used to in-process micro-EDM of hole array in stainless steel. The effects of applied voltage, current and pulse frequency on hole dimensional accuracy and microelectrode wear were investigated. The optimal processing parameters were selected using response-surface experiments. To improve machining accuracy, an in-process touch-measurement compensation strategy was applied to reduce the cumulative compensation error of the micro-EDM process. Using such a system, micro-hole array (2 × 80) with average entrance diameter 18.91 μm and average exit diameter 17.65 μm were produced in 50 μm thickness stainless steel sheets, and standard deviations of hole entrance and exit sides of 0.44 and 0.38 μm, respectively, were achieved.
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Affiliation(s)
- Zhixiang Zou
- State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment, Guangdong University of Technology, Guangzhou 510006, China; (Z.Z.); (Z.G.); (Q.H.)
- Guangzhou Key Laboratory of Nontraditional Machining and Equipment, Guangdong University of Technology, Guangzhou 510006, China
| | - Zhongning Guo
- State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment, Guangdong University of Technology, Guangzhou 510006, China; (Z.Z.); (Z.G.); (Q.H.)
- Guangzhou Key Laboratory of Nontraditional Machining and Equipment, Guangdong University of Technology, Guangzhou 510006, China
| | - Qinming Huang
- State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment, Guangdong University of Technology, Guangzhou 510006, China; (Z.Z.); (Z.G.); (Q.H.)
- Guangzhou Key Laboratory of Nontraditional Machining and Equipment, Guangdong University of Technology, Guangzhou 510006, China
| | - Taiman Yue
- The Advanced Manufacturing Technology Research Centre, Department of Industrial and Systems Engineering, The Hong Kong Polytechnic University, Hung Hom, Hong Kong, China;
| | - Jiangwen Liu
- State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment, Guangdong University of Technology, Guangzhou 510006, China; (Z.Z.); (Z.G.); (Q.H.)
- Guangzhou Key Laboratory of Nontraditional Machining and Equipment, Guangdong University of Technology, Guangzhou 510006, China
- Correspondence: (J.L.); (X.C.)
| | - Xiaolei Chen
- State Key Laboratory of Precision Electronic Manufacturing Technology and Equipment, Guangdong University of Technology, Guangzhou 510006, China; (Z.Z.); (Z.G.); (Q.H.)
- Guangzhou Key Laboratory of Nontraditional Machining and Equipment, Guangdong University of Technology, Guangzhou 510006, China
- Correspondence: (J.L.); (X.C.)
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