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Sugita A, Mochiduki K, Katahira Y, Ng SH, Juodkazis S. Augmentation of surface plasmon-enhanced second harmonic generation from Au nanoprisms on SiO 2/Si: interference contribution. OPTICS EXPRESS 2022; 30:22161-22177. [PMID: 36224922 DOI: 10.1364/oe.460118] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/04/2022] [Accepted: 05/22/2022] [Indexed: 06/16/2023]
Abstract
We present an augmentation of Surface Plasmon (SP)-enhanced second harmonic generation (SHG) due to interference field enhancement in Au nanoprisms (AuNPs) on SiO2-coated Si substrates. The SiO2 spacer contributed for the optical interference and increased the coupling efficiency of the pump light with the SP polarization as well as a decoupling efficiency of the SHG waves from nonlinear polarization. The intensity of the SP-enhanced SHG signals increased 4.5-fold with respect to the AuNPs on the bare SiO2 substrate by setting the SiO2 spacer layer to the appropriate thickness. The numerical analysis revealed that the optimal SHG conversion was determined by the balance between the degree of the optical interference at the fundamental and SHG wavelengths.
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Kumagai T, To N, Balčytis A, Seniutinas G, Juodkazis S, Nishijima Y. Kirchhoff's Thermal Radiation from Lithography-Free Black Metals. MICROMACHINES 2020; 11:mi11090824. [PMID: 32872613 PMCID: PMC7570237 DOI: 10.3390/mi11090824] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 08/07/2020] [Revised: 08/27/2020] [Accepted: 08/29/2020] [Indexed: 01/21/2023]
Abstract
Lithography-free black metals composed of a nano-layered stack of materials are attractive not only due to their optical properties but also by virtue of fabrication simplicity and the cost reduction of devices based on such structures. We demonstrate multi-layer black metal layered structures with engineered electromagnetic absorption in the mid-infrared (MIR) wavelength range. Characterization of thin SiO2 and Si films sandwiched between two Au layers by way of experimental electromagnetic radiation absorption and thermal radiation emission measurements as well as finite difference time domain (FDTD) numerical simulations is presented. Comparison of experimental and simulation data derived optical properties of multi-layer black metals provide guidelines for absorber/emitter structure design and potential applications. In addition, relatively simple lithography-free multi-layer structures are shown to exhibit absorber/emitter performance that is on par with what is reported in the literature for considerably more elaborate nano/micro-scale patterned metasurfaces.
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Affiliation(s)
- Takuhiro Kumagai
- Department of Physics, Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan; (T.K.); (N.T.); (A.B.)
| | - Naoki To
- Department of Physics, Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan; (T.K.); (N.T.); (A.B.)
| | - Armandas Balčytis
- Department of Physics, Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan; (T.K.); (N.T.); (A.B.)
- Center for Physical Sciences and Technology, A. Goštauto 9, LT-01108 Vilnius, Lithuania
| | - Gediminas Seniutinas
- Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM), School of Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia; (G.S.); (S.J.)
| | - Saulius Juodkazis
- Optical Sciences Centre and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM), School of Science, Swinburne University of Technology, Hawthorn, VIC 3122, Australia; (G.S.); (S.J.)
- Institute of Advanced Sciences, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
- Tokyo Tech World Research Hub Initiative (WRHI), Tokyo Institute of Technology, School of Materials and Chemical Technology, 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8550, Japan
| | - Yoshiaki Nishijima
- Department of Physics, Electrical and Computer Engineering, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan; (T.K.); (N.T.); (A.B.)
- Institute of Advanced Sciences, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
- Correspondence:
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