Fabrication of Multifocal Microlens Array by One Step Exposure Process

Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique

Due to digital micromirrors device (DMD) digital lithography limited by non-integer pixel errors, the edge smoothness of the exposed image is low and the sawtooth defects are obvious. To improve the image edge smoothness, an optimized pixel overlay method was proposed, which called the DMD digital lithography based on dynamic blur effect matching pixel overlay technology. The core of this method is that motion blur effect is cleverly introduced in the process of pixel overlap to carry out the lithography optimization experiment. The simulation and experimental results showed that the sawtooth edge was reduced from 1.666 µm to 0.27 µm by adopting the 1/2 dynamic blur effect to match pixel displacement superposition, which is far less than half of the sawtooth edge before optimization. The results indicated that the proposed method can efficiently improve the edge smoothness of lithographic patterns. We believe that the proposed optimization method can provide great help for high fidelity and efficient DMD digital lithography microfabrication.

Maskless lithography for large area patterning of three-dimensional microstructures with application on a light guiding plate

This paper presents a maskless lithography system that can perform three-dimensional (3D) ultraviolet (UV) patterning on a photoresist (PR) layer. After PR developing processes, patterned 3D PR microstructures over a large area are obtained. This maskless lithography system utilizes an UV light source, a digital micromirror device (DMD), and an image projection lens to project a digital UV image on the PR layer. The projected UV image is then mechanically scanned over the PR layer. An UV patterning scheme based on the idea of obliquely scanning and step strobe lighting (OS³L) is developed to precisely control the spatial distribution of projected UV dose, such that desired 3D PR microstructures can be obtained after PR development. Two types of concave microstructures with truncated conical and nuzzle-shaped cross-sectional profiles are experimentally obtained over a patterning area of 160 ×115 mm². These patterned microstructures are then used for replicating nickel molds and for mass-production of light-guiding plates used in back-lighting and display industry. Potential improvements and advancements of the proposed 3D maskless lithography technique for future applications will be addressed.

A Meniscus Multifocusing Compound Eye Camera Based on Negative Pressure Forming Technology

To meet the challenge of preparing a high-resolution compound eye, this paper proposes a multi-focal-length meniscus compound eye based on MEMS negative pressure molding technology. The aperture is increased, a large field of view angle of 101.14° is obtained, and the ommatidia radius of each stage is gradually increased from 250 μm to 440 μm. A meniscus structure is used to improve the imaging quality of the marginal compound eye so that its resolution can reach 36.00 lp/mm. The prepared microlenses have a uniform shape and a smooth surface, and both panoramic image stitching and moving object tracking are achieved. This technology has great potential for application in many fields, including automatic driving, machine vision, and medical endoscopy.